System for manufacturing semiconductor device

US9793093B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9793093-B2
Application numberUS-201615185166-A
CountryUS
Kind codeB2
Filing dateJun 17, 2016
Priority dateJan 10, 2014
Publication dateOct 17, 2017
Grant dateOct 17, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A semiconductor device manufacturing system includes: a PL evaluation apparatus that evaluates wavelengths of photoluminescent light produced by individual optical modulators on a single semiconductor wafer; an electron beam drawing apparatus that draws patterns of diffraction gratings of laser sections that adjoin respective optical modulators on the wafer; and a calculation section that receives the wavelengths of the photoluminescent light from the PL evaluation apparatus, calculates densities of respective diffraction gratings so that differences between the wavelengths of the photoluminescent light and oscillating wavelengths of the laser sections become a constant, and sends the densities calculated to the electron beam drawing apparatus for drawing respective diffraction grating patterns on the respective laser sections.

First claim

Opening claim text (preview).

What is claimed is: 1. A semiconductor device manufacturing system comprising: a PL evaluation apparatus that evaluates wavelengths of photoluminescent light produced by individual optical modulators of a plurality of optical modulators on a wafer; an electron beam drawing apparatus that draws patterns of diffraction gratings of laser sections adjoining respective optical modulators of the plurality of optical modulators; and a calculation section that receives the wavelengths of the photoluminescent light from the PL evaluation apparatus, calculates densities of respective diffraction gratings so that difference values between the wavelengths of the photoluminescent light and oscillating wavelengths of the laser sections become predetermined values, and sends the densities calculated to the electron beam drawing apparatus for drawing respective diffraction grating patterns on the respective laser sections.

Assignees

Inventors

Classifications

  • p-doping · CPC title

  • The laser chip comprising special buffer layers, e.g. dislocation prevention or reduction · CPC title

  • with a well layer based on InGa(Al)P, e.g. red laser · CPC title

  • H01S5/0014Primary

    Measuring characteristics or properties thereof (measuring techniques per se G01J, G01K, G01N, G01R) · CPC title

  • for microworking, e. g. etching of gratings or trimming of electrical components · CPC title

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What does patent US9793093B2 cover?
A semiconductor device manufacturing system includes: a PL evaluation apparatus that evaluates wavelengths of photoluminescent light produced by individual optical modulators on a single semiconductor wafer; an electron beam drawing apparatus that draws patterns of diffraction gratings of laser sections that adjoin respective optical modulators on the wafer; and a calculation section that recei…
Who is the assignee on this patent?
Mitsubishi Electric Corp
What technology area does this patent fall under?
Primary CPC classification H01S5/0014. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 17 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).