Resist composition and method for producing resist pattern

Patent metadata

Field	Value
Publication number	US-9791776-B2
Application number	US-201213441032-A
Country	US
Kind code	B2
Filing date	Apr 6, 2012
Priority date	Apr 7, 2011
Publication date	Oct 17, 2017
Grant date	Oct 17, 2017

Abstract

A resist composition contains (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I),

wherein R 1 and R 2 , m and n, R 3 and R 4 , X 1 , R 5 and Z1 + are defined in the specification.

First claim

What is claimed is:

1. A resist composition comprising
(A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, and having a structural unit represent by the formula (a1-1) or the formula (a1-2),
(B) an acid generator represented by the formula (II), and
(D) a compound represented by the formula (I),

wherein R 1 and R 2 in each occurrence independently represent a C 1 to C 12 hydrocarbon group, a C 1 to C 6 alkoxyl group, a C 2 to C 7 acyl group, a C 2 to C 7 acyloxy group, a C 2 to C 7 alkoxycarbonyl group, a nitro group or a halogen atom;
m and n independently represent an integer of 0 to 4;

wherein R 3 and R 4 independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group;
X 1 represents an C 1 to C 17 divalent saturated hydrocarbon group, and one or more hydrogen atom contained in the divalent saturated hydrocarbon group may be replaced by a fluorine atom, one or more —CH 2 — contained in the divalent saturated hydrocarbon group may be replaced by —O— or —CO—;
R 5 represents a group having cyclic ether structure;
Z1 + represents an organic cation; and
which further comprises a solvent,

in each formula, L a1 and L a2 independently represent *—O— or *—O—(CH 2 ) k1 —CO—O—, k1 represents an integer of 1 to 7, * represents a bond to the carbonyl group;
R a4 and R a5 independently represent a hydrogen atom or a methyl group;
R a6 and R a7 independently represent a C 1 to C 8 alkyl group or a C 3 to C 10 alicyclic hydrocarbon group;
m1 represents an integer 0 to 14;
n1 represents an integer 0 to 10; and
n1′ represents an integer 0 to 3,
wherein R 5 in the formula (II) is a group represented by the formula (IIA) or the formula (IIE),

wherein s1 is 1 or 2
t1 represents an integer of 0 to 2,
provided that s1+t1 is 2 to 3;
s11 represents an integer of 1 to 4,
t11 represents an integer of 0 to 2;
s12 is 1 or 2,
t12 represents an integer of 0 to 2,
provided that s12+t12 is 2 to 3;
R 6 in each occurrence represents a C 1 to C 12 saturated hydrocarbon group, a C 6 to C 18 aromatic hydrocarbon group, or two R 6 are bonded together to form a ring, and one or more hydrogen atoms contained in the saturated hydrocarbon group, the aromatic hydrocarbon group and the ring may be replaced by a C 1 to C 6 alkyl group or a nitro group, and one or more —CH 2 — contained in the saturated hydrocarbon group and ring may be replaced by —O—;
u1 represents an integer of 0 to 8;
R 7 and R 8 in each occurrence independently represent a hydroxy group, a halogen atom, a C 1 to C 6 alkyl group, a C 1 to C 6 alkoxyl group, a C 1 to C 6 hydroxy alkyl group, a C 2 to C 7 acyl group, a C 2 to C 7 acyloxy group or a C 2 to C 7 acylamino group, or two of R 7 and/or R 8 may be bonded together to form a single bond or a ring;
u2 and u3 independently represent an integer of 0 to 16; and
* represents a bond to X 1 .

2. A method for producing a resist pattern comprising steps of;
(1) applying the resist composition of claim 1 onto a substrate;
(2) drying the applied composition to form a composition layer;
(3) exposing the composition layer;
(4) heating the exposed composition layer, and
(5) developing the heated composition layer.

Assignees

• Ichikawa Koji
• Yasue Takahiro
• Mukai Yuichi
• Sumitomo Chemical Co

Inventors

• Ichikawa Koji
• Yasue Takahiro
• Mukai Yuichi

Classifications

• G03F7/0397

  the macromolecular compound having an alicyclic moiety in a side chain · CPC title

• G03F7/0046 Primary

  with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title

• G03F7/092

  characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means · CPC title

• G03F7/029

  Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur · CPC title

• G03F7/0392

  the macromolecular compound being present in a chemically amplified positive photoresist composition · CPC title