Repairing holes in images

US9785856B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9785856-B2
Application numberUS-201615056687-A
CountryUS
Kind codeB2
Filing dateFeb 29, 2016
Priority dateFeb 29, 2016
Publication dateOct 10, 2017
Grant dateOct 10, 2017

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A method for image processing that includes: obtaining a mask of a connected component (CC) from an image; generating a stroke width transform (SWT) image based on the mask; calculating multiple stroke width parameters for the mask based on the SWT image; identifying a hole in the CC of the mask; calculating a stroke width estimate for the hole based on the stroke width values of pixels in the SWT image surrounding the hole; generating a comparison of the stroke width estimate for the hole with a limit based on the multiple stroke width parameters for the mask; and generating a revised mask by filling the hole in response to the comparison.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for image processing using a computer processor, comprising: obtaining a mask of a connected component (CC) from an image; generating, by the computer processor, a first stroke width transform (SWT) image based on the mask; calculating a plurality of stroke width parameters for the mask based on the first SWT image; identifying a first hole in the CC of the mask; calculating a stroke width estimate for the first hole based on a plurality of stroke width values of a plurality of pixels in the first SWT image surrounding the first hole; generating a first comparison of the stroke width estimate for the first hole with a limit based on the plurality of stroke width parameters for the mask; and generating, by the computer processor, a revised mask by filling the first hole in response to the first comparison. 2. The method of claim 1 , comprising: identifying second hole in the CC of the mask; and calculating a stroke width estimate for the second hole based on the first SWT image, wherein generating the revised mask further comprises filling the second hole in response to the stroke width estimate for the second hole being less than the limit. 3. The method of claim 1 , comprising: identifying a second hole in the CC of the mask; generating a second SWT image based on the revised mask; calculating a plurality of stroke width parameters for the revised mask based on the second SWT image; calculating a stroke width estimate for the second hole based on the second SWT image; generating a second comparison of the stroke width estimate for the second hole with a limit based on the plurality of stroke width parameters for the revised mask; and filling the second hole in the revised mask in response to the second comparison. 4. The method of claim 3 , wherein the second SWT is generated in response to an area of the filled holes exceeding a filled holes threshold. 5. The method of claim 1 , wherein: the plurality of stroke width parameters comprises a mean stroke width and a standard deviation; the limit is a summation of a scaled version of the mean stroke width and a scaled version of the standard deviation; and the stroke width estimate for the first hole is a mean of the plurality of stroke width values of the plurality of pixels in the first SWT image surrounding the first hole. 6. The method of claim 5 , wherein the scaled version and the mean stroke width are scaled by the same scaling factor of 0.73. 7. The method of claim 1 , further comprising: identifying a second hole in the CC of the mask; calculating an area of the second hole; determining a ratio of the area of the second hole to an area of the CC exceeds a threshold area ratio; and keeping the second hole unfilled in response to the ratio exceeding the threshold area ratio. 8. The method of claim 1 , further comprising: generating an auxiliary mask of the first hole; dilating the auxiliary mask by one pixel; and obtaining the plurality of stroke width values by executing an intersection operation of the auxiliary mask with the first SWT image after dilating the auxiliary mask. 9. The method of claim 1 , further comprising: performing optical character recognition on the revised mask, wherein the CC corresponds to a hand-drawn stroke on a writing board in the image. 10. A non-transitory computer readable medium (CRM) storing computer readable program code embodied therein that, when executed by a computer processor: obtains a mask of a connected component (CC) from an image; generates a first stroke width transform (SWT) image based on the mask; calculates a plurality of stroke width parameters for the mask based on the first SWT image; identifies a first hole in the CC of the mask; calculates a stroke width estimate for the first hole based on a plurality of stroke width values of a plurality of pixels in the first SWT image surrounding the first hole; generates a first comparison of the stroke width estimate for the first hole with a limit based on the plurality of stroke width parameters for the mask; and generates a revised mask by filling the first hole in response to the first comparison. 11. The non-transitory CRM of claim 10 , further storing computer readable program code embodied therein that, when executed by the computer processor: identifies second hole in the CC of the mask; and calculates a stroke width estimate for the second hole based on the first SWT image, wherein generating the revised mask further comprises filling the second hole in response to the stroke width estimate for the second hole being less than the limit. 12. The non-transitory CRM of claim 10 , further storing computer readable program code embodied therein that, when executed by the computer processor: identifies a second hole in the CC of the mask; generates a second SWT image based on the revised mask; calculates a plurality of stroke width parameters for the revised mask based on the second SWT image; calculates a stroke width estimate for the second hole based on the second SWT image; generates a second comparison of the stroke width estimate for the second hole with a limit based on the plurality of stroke width parameters for the revised mask; and fills the second hole in the revised mask in response to the second comparison. 13. The non-transitory CRM of claim 10 , wherein: the plurality of stroke width parameters comprises a mean stroke width and a standard deviation; the limit is a summation of a scaled version of the mean stroke width and a scaled version of the standard deviation; and the stroke width estimate for the first hole is a mean of the plurality of stroke width values of the plurality of pixels in the first SWT image surrounding the first hole. 14. The non-transitory CRM of claim 10 , further storing computer readable program code embodied therein that, when executed by the computer processor: identifies a second hole in the CC of the mask; calculates an area of the second hole; determines a ratio of the area of the second hole to an area of the CC exceeds a threshold area ratio; and keeps the second hole unfilled in response to the ratio exceeding the threshold area ratio. 15. The non-transitory CRM of claim 10 , further storing computer readable program code embodied therein that, when executed by the computer processor: generates an auxiliary mask of the first hole; dilates the auxiliary mask by one pixel; and obtains the plurality of stroke width values by executing an intersection operation of the auxiliary mask with the first SWT image after dilating the auxiliary mask. 16. A system for image processing, comprising: a memory storing a mask of a connected component (CC) from an image; and a computer processor connected to the memory that: identifies a first hole in the CC of the mask; generates a first stroke width transform (SWT) image based on the mask; calculates a plurality of stroke width parameters for the mask based on the first SWT image; calculates a stroke width estimate for the first hole based on a plurality of stroke width values of a plurality of pixels in the first SWT image surrounding the first hole; generates a first comparison of the stroke width estimate for the first hole with a limit based on the plurality of stroke width parameters for the mask; and generates a revised mask by filling the first hole in response to the first comparison. 17. The system of claim 16 , wherein the computer processor also: generates an auxiliary mask of the first hole; d

Assignees

Inventors

Classifications

  • by analysing segments intersecting the pattern · CPC title

  • by deriving mathematical or geometrical properties from the whole image · CPC title

  • by analysing connectivity, e.g. edge linking, connected component analysis or slices · CPC title

  • Segmentation of character regions · CPC title

  • Local feature extraction by analysis of parts of the pattern, e.g. by detecting edges, contours, loops, corners, strokes or intersections; Connectivity analysis, e.g. of connected components · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9785856B2 cover?
A method for image processing that includes: obtaining a mask of a connected component (CC) from an image; generating a stroke width transform (SWT) image based on the mask; calculating multiple stroke width parameters for the mask based on the SWT image; identifying a hole in the CC of the mask; calculating a stroke width estimate for the hole based on the stroke width values of pixels in the …
Who is the assignee on this patent?
Konica Minolta Laboratory Usa Inc
What technology area does this patent fall under?
Primary CPC classification G06K9/34. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Oct 10 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).