Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and thin film based devices and products made therefrom

Patent metadata

Field	Value
Publication number	US-9783882-B2
Application number	US-201414482251-A
Country	US
Kind code	B2
Filing date	Sep 10, 2014
Priority date	May 4, 2007
Publication date	Oct 10, 2017
Grant date	Oct 10, 2017

Abstract

In various embodiments, a sputtering target initially formed by ingot metallurgy or powder metallurgy and rejuvenated by, e.g., cold spray, is utilized in sputtering processes to produce metallic thin films.

First claim

We claim:

1. A method of thin film deposition, the method comprising:
providing within a sputtering chamber a rejuvenated sputtering target comprising:
a first region initially formed by ingot metallurgy or powder metallurgy and comprising a sputtering-target material, the sputtering-target material (i) comprising a metal and (ii) having a first grain size, and
separated from the first region by a distinct boundary line, a second region (i) comprising the metal and (ii) having a second grain size finer than the first grain size; and

sputtering using the rejuvenated sputtering target to produce a thin film comprising the metal.

2. The method of claim 1 , further comprising introducing a reactive gas within the sputtering chamber while sputtering using the rejuvenated sputtering target, the thin film comprising a reaction product of the metal and the reactive gas.

3. The method of claim 2 , wherein the reactive gas comprises at least one of oxygen, nitrogen, or a silicon-containing gas.

4. The method of claim 1 , wherein the metal is selected from the group consisting of niobium, tantalum, tungsten, molybdenum, zirconium, titanium, and alloys thereof.

5. The method of claim 1 , wherein the metal comprises at least one of chromium, vanadium, magnesium, tin, lead, aluminum, zinc, copper, rhodium, silver, gold, cobalt, iron, ruthenium, rhenium, gallium, indium, or antimony.

6. The method of claim 1 , wherein at least a portion of the distinct boundary line corresponds to a contour of a recessed furrow within the rejuvenated sputtering target.

7. The method of claim 1 , wherein (i) the first region of the rejuvenated sputtering target has a first crystalline microstructure, and (ii) the second region of the rejuvenated sputtering target has a second crystalline microstructure more random than the first crystalline microstructure.

8. The method of claim 1 , wherein the first and second regions of the rejuvenated sputtering target consist essentially of the metal.

9. The method of claim 1 , wherein the rejuvenated sputtering target comprises a backing plate upon which the first region is disposed.

10. The method of claim 1 , wherein the second region of the rejuvenated sputtering target has a uniformly random texture.

11. The method of claim 1 , wherein the second region of the rejuvenated sputtering target is substantially free of grain-size banding and texture banding.

12. The method of claim 1 , wherein the second grain size is less than 44 microns.

13. The method of claim 1 , wherein the second grain size is less than 10 microns.

14. A method of thin film deposition, the method comprising:
providing within a sputtering chamber a rejuvenated sputtering target formed by a method comprising:
providing a first sputtering target initially formed by ingot metallurgy or powder metallurgy and comprising a sputtering-target material, the sputtering-target material (i) comprising a metal, (ii) defining a recessed furrow therein, and (iii) having a first grain size, and
spray-depositing a powder within the furrow to form a layer therein, the layer (i) comprising the metal and (ii) having a second grain size finer than the first grain size,
wherein spray-depositing the powder within the furrow forms a distinct boundary line between the layer and the sputtering-target material; and

sputtering using the rejuvenated sputtering target to produce a thin film comprising the metal.

15. The method of claim 14 , further comprising introducing a reactive gas within the sputtering chamber while sputtering using the rejuvenated sputtering target, the thin film comprising a reaction product of the metal and the reactive gas.

16. The method of claim 15 , wherein the reactive gas comprises at least one of oxygen, nitrogen, or a silicon-containing gas.

17. The method of claim 14 , wherein the metal is selected from the group consisting of niobium, tantalum, tungsten, molybdenum, zirconium, titanium, and alloys thereof.

18. The method of claim 14 , wherein the metal comprises at least one of chromium, vanadium, magnesium, tin, lead, aluminum, zinc, copper, rhodium, silver, gold, cobalt, iron, ruthenium, rhenium, gallium, indium, or antimony.

19. The method of claim 14 , wherein at least a portion of the recessed furrow was produced by use of the first sputtering target prior to formation of the rejuvenated sputtering target.

20. The method of claim 14 , wherein (i) the sputtering-target material has a first crystalline microstructure, and (ii) the layer has a second crystalline microstructure more random than the first crystalline microstructure.

21. The method of claim 14 , wherein the layer has a uniformly random texture.

22. The method of claim 14 , wherein the layer is substantially free of grain-size banding and texture banding.

23. The method of claim 14 , wherein the second grain size is less than 44 microns.

24. The method of claim 14 , wherein the second grain size is less than 10 microns.

Assignees

• Starck H C Inc
• Starck H C Inc
• Starck H C Gmbh

Inventors

• Miller Steven A
• Kumar Prabhat
• Wu Richard
• Sun Shuwei
• Zimmermann Stefan
• Schmidt-Park Olaf

Classifications

• C23C14/14

  Metallic material, boron or silicon · CPC title

• B22F1/052

  characterised by a mixture of particles of different sizes or by the particle size distribution · CPC title

• C23C14/08

  Oxides (C23C14/10 takes precedence) · CPC title

• C23C14/3414 Primary

  Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title

• C23C24/04

  Impact or kinetic deposition of particles · CPC title