Polyimide precursor, polyimide, polyimide film, varnish, and substrate

Patent metadata

Field	Value
Publication number	US-9783640-B2
Application number	US-201314428581-A
Country	US
Kind code	B2
Filing date	Sep 13, 2013
Priority date	Sep 18, 2012
Publication date	Oct 10, 2017
Grant date	Oct 10, 2017

Abstract

A polyimide precursor comprising at least one repeating unit represented by the following chemical formula (5):

in which A 3 is a divalent group of an aromatic diamine or an aliphatic diamine, from which amino groups have been removed; and X 3 and Y 3 are each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkylsilyl group having 3 to 9 carbon atoms, and/or at least one repeating unit represented by the following chemical formula (6):

in which A 3 is a divalent group of an aromatic diamine or an aliphatic diamine, from which amino groups have been removed; and X 4 and Y 4 are each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkylsilyl group having 3 to 9 carbon atoms.

First claim

The invention claimed is:

1. A polyimide precursor comprising at least one repeating unit represented by the following chemical formula (1):

wherein A 1 is a divalent group of an aromatic diamine or an aliphatic diamine, from which amino groups have been removed; and X1 and Y1 are each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkylsilyl group having 3 to 9 carbon atoms,
wherein the total content of the repeating units represented by the chemical formula (1) is 63 mol % or more based on the total repeating units.

2. The polyimide precursor according to claim 1 , wherein the polyimide precursor comprises at least one repeating unit of the chemical formula (1) in which A1 is a group represented by the following chemical formula (2):

wherein m 1 and n 1 are integers of 0 or more, and m 1 independently represents 0 to 3 and n 1 independently represents 0 to 3; V 1 , U 1 and T 1 each independently represent at least one selected from the group consisting of hydrogen atom, methyl group and trifluoromethyl group; and Z 1 and W 1 each independently represent direct bond, or at least one selected from the group consisting of groups represented by the formulas: —NHCO—, —CONH—, —COO— and —OCO—.

3. The polyimide precursor according to claim 2 , wherein the polyimide precursor comprises at least two of repeating units of the chemical formula (1) in which A 1 is a group represented by the chemical formula (2).

4. A varnish comprising the polyimide precursor according to claim 1 .

5. A polyimide film obtained using a varnish comprising the polyimide precursor according to claim 1 .

6. A polyimide precursor comprising at least one repeating unit represented by the following chemical formula (3):

wherein A 2 is a divalent group of an aromatic diamine or an aliphatic diamine, from which amino groups have been removed; and X 2 and Y 2 are each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkylsilyl group having 3 to 9 carbon atoms,
wherein the total content of the repeating units represented by the chemical formula (3) is 37 mol % or more based on the total repeating units.

7. The polyimide precursor according to claim 6 , wherein the polyimide precursor comprises at least one repeating unit of the chemical formula (3) in which A 2 is a group represented by the following chemical formula (4):

wherein m 2 and n 2 are integers of 0 or more, and m 2 independently represents 0 to 3 and n 2 independently represents 0 to 3; V 2 , U 2 and T 2 each independently represent at least one selected from the group consisting of hydrogen atom, methyl group and trifluoromethyl group; and Z 2 and W 2 each independently represent direct bond, or at least one selected from the group consisting of groups represented by the formulas: —NHCO—, —CONH—, —COO— and —OCO—.

8. The polyimide precursor according to claim 7 , wherein the polyimide precursor comprises at least two of repeating units of the chemical formula (3) in which A 2 is a group represented by the chemical formula (4).

9. A varnish comprising the polyimide precursor according to claim 6 .

10. A polyimide film obtained using a varnish comprising the polyimide precursor according to claim 6 .

11. A polyimide precursor comprising at least one of repeating units represented by the following chemical formula (5) and the following chemical formula (6):

wherein A 3 is a divalent group of an aromatic diamine or an aliphatic diamine, from which amino groups have been removed; and X 3 and Y 3 are each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkylsilyl group having 3 to 9 carbon atoms,

wherein A 3 is a divalent group of an aromatic diamine or an aliphatic diamine, from which amino groups have been removed; and X 4 and Y 4 are each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkylsilyl group having 3 to 9 carbon atoms,
wherein the total content of the repeating units represented by the chemical formula (5) and the chemical formula (6) is 83 mol % or more based on the total repeating units.

12. The polyimide precursor according to claim 11 , wherein the polyimide precursor comprises at least one repeating unit of the chemical formula (5) in which A 3 is a group represented by the following chemical formula (7) and/or at least one repeating unit of the chemical formula (6) in which A 3 is a group represented by the following chemical formula (7):

wherein m 3 and n 3 are integers of 0 or more, and m 3 independently represents 0 to 3 and n 3 independently represents 0 to 3; V 3 , U 3 and T 3 each independently represent at least one selected from the group consisting of hydrogen atom, methyl group and trifluoromethyl group; and Z 3 and W 3 each independently represent direct bond, or at least one selected from the group consisting of groups represented by the formulas: —NHCO—, —CONH—, —COO— and —OCO—.

13. The polyimide precursor according to claim 12 , wherein the polyimide precursor comprises at least two of repeating units of the chemical formula (5) or the chemical formula (6) in which A 3 is a group represented by the chemical formula (7).

14. The polyimide precursor according to claim 11 , wherein the total content of the repeating units represented by the chemical formula (5) is 50 mol % or more based on the total repeating units, and the total content of the repeating units represented by the chemical formula (6) is 30 mol % or more based on the total repeating units.

15. A varnish comprising the polyimide precursor according to claim 11 .

16. A polyimide film obtained using a varnish comprising the polyimide precursor according to claim 11 .

17. A polyimide comprising at least one repeating unit represented by the following chemical formula (8):

wherein B 1 is a divalent group of an aromatic diamine or an aliphatic diamine, from which amino groups have been removed,
wherein the total content of the repeating units represented by the chemical formula (8) is 63 mol % or more based on the total repeating units.

18. The polyimide according to claim 17 , wherein the polyimide comprises at least one repeating unit of the chemical formula (8) in which B 1 is a group represented by the following chemical formula (9):

wherein m 4 and n 4 are integers of 0 or more, and m 4 independently represents 0 to 3 and n 4 independently represents 0 to 3; V 4 , U 4 and T 4 each independently represent at least one selected from the group consisting of hydrogen atom, methyl group and trifluoro

Assignees

• Ube Industries

Inventors

• Oka Takuya
• Kohama Yukinori
• Watanabe Yoshiyuki
• Hisano Nobuharu

Classifications

• C08G73/1064

  containing sulfur · CPC title

• C08G73/1085 Primary

  Polyimides with diamino moieties or tetracarboxylic segments containing heterocyclic moieties · CPC title

• C08G73/1078

  wholly aromatic in the diamino moiety · CPC title

• C08G73/10

  Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors · CPC title

• C08G73/1039 Primary

  comprising halogen-containing substituents · CPC title