3-acyloxymethyl-3-butenyl carboxylate compound and method for producing 4-alkyl-3-methylenebutyl carboxylate
US-9499468-B2 · Nov 22, 2016 · US
Phenyl (meth)acrylate production method and phenyl (meth)acrylate composition
US9783480B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9783480-B2 |
| Application number | US-201615284750-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 4, 2016 |
| Priority date | Oct 30, 2013 |
| Publication date | Oct 10, 2017 |
| Grant date | Oct 10, 2017 |
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Abstract
Official abstract text for this publication.
Provided is a method that can produce phenyl(meth)acrylate inexpensively and at high yields. The phenyl(meth)acrylate production method of the present invention reacts (meth)acrylic acid with carbonic acid diphenyl. Further, the phenyl(meth)acrylate composition of the present invention contains 90-99.999 wt % phenyl(meth)acrylate and 0.001-10% carbonic acid diphenyl. Or, the phenyl(meth)acrylate composition of the present invention contains 90-99.999 wt % phenyl(meth)acrylate and 0.001-10 wt % of a specified compound.
First claim
Opening claim text (preview).
What is claimed is: 1. A phenyl (meth)acrylate composition, comprising: phenyl (meth)acrylate in a range of 90 mass % to 99.999 mass %; and diphenyl carbonate in a range of 0.001 mass % to 10 mass %. 2. The phenyl (meth)acrylate composition according to claim 1 , comprising: phenyl (meth)acrylate in a range of 95 mass % to 99.999 mass %; and diphenyl carbonate in a range of 0.001 mass % to 5 mass %. 3. The phenyl (meth)acrylate composition according to claim 1 , comprising: phenyl (meth)acrylate in a range of 98 mass % to 99.999 mass %; and diphenyl carbonate in a range of 0.001 mass % to 2 mass %. 4. The phenyl (meth)acrylate composition according to claim 1 , comprising: phenyl (meth)acrylate in a range of 99 mass % to 99.999 mass %; and diphenyl carbonate in a range of 0.001 mass % to 1 mass %. 5. The phenyl (meth)acrylate composition according to claim 1 , comprising: phenyl (meth)acrylate in a range of 99.5 mass % to 99.999 mass %; and diphenyl carbonate in a range of 0.001 mass % to 0.5 mass %. 6. The phenyl (meth)acrylate composition according to claim 1 , wherein the total mass of phenyl (meth)acrylate and diphenyl carbonate is 100 mass % of the phenyl (meth)acrylate composition. 7. The phenyl (meth)acrylate composition according to claim 2 , wherein the total mass of phenyl (meth)acrylate and diphenyl carbonate is 100 mass % of the phenyl (meth)acrylate composition. 8. The phenyl (meth)acrylate composition according to claim 3 , wherein the total mass of phenyl (meth)acrylate and diphenyl carbonate is 100 mass % of the phenyl (meth)acrylate composition. 9. The phenyl (meth)acrylate composition according to claim 4 , wherein the total mass of phenyl (meth)acrylate and diphenyl carbonate is 100 mass % of the phenyl (meth)acrylate composition. 10. The phenyl (meth)acrylate composition according to claim 5 , wherein the total mass of phenyl (meth)acrylate and diphenyl carbonate is 100 mass % of the phenyl (meth)acrylate composition.
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Classifications
Use of additives, e.g. for stabilisation · CPC title
Acrylic acid esters; Methacrylic acid esters · CPC title
- C07C67/11Primary
being mineral ester groups · CPC title
- C07C57/42Primary
having unsaturation outside the rings · CPC title
by reacting carboxylic acids or symmetrical anhydrides with ester groups or with a carbon-halogen bond (preparation from carboxylic acid halides C07C67/14) · CPC title
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- What does patent US9783480B2 cover?
- Provided is a method that can produce phenyl(meth)acrylate inexpensively and at high yields. The phenyl(meth)acrylate production method of the present invention reacts (meth)acrylic acid with carbonic acid diphenyl. Further, the phenyl(meth)acrylate composition of the present invention contains 90-99.999 wt % phenyl(meth)acrylate and 0.001-10% carbonic acid diphenyl. Or, the phenyl(meth)acrylat…
- Who is the assignee on this patent?
- Mitsubishi Chem Corp
- What technology area does this patent fall under?
- Primary CPC classification C07C67/11. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Oct 10 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).