Self-aligned high voltage LDMOS

Patent metadata

Field	Value
Publication number	US-9780207-B2
Application number	US-201514983583-A
Country	US
Kind code	B2
Filing date	Dec 30, 2015
Priority date	Dec 30, 2015
Publication date	Oct 3, 2017
Grant date	Oct 3, 2017

Abstract

Devices and methods for forming a device are disclosed. The method includes providing a crystalline-on-insulator substrate having a bulk substrate and a surface substrate separated by a buried insulator layer. The surface substrate is defined with a device region. A transistor having a gate is formed in the device region. A first diffusion region is formed adjacent to a first side of the gate and a second diffusion region is formed adjacent to and displaced away from a second side of the gate. At least a first drift isolation region is formed in the surface substrate adjacent to and underlaps the second side of the gate. A drift well is formed in the surface substrate encompassing the first drift isolation region. A device isolation region surrounding the device region is formed in the surface substrate. The device isolation region includes a second depth which is deeper than a first depth of the first drift isolation region.

First claim

What is claimed is:

1. A method of forming a device comprising:
providing a crystalline-on-insulator substrate having a bulk substrate and a surface substrate separated by a buried insulator layer, the surface substrate is defined with a device region;
forming a hard mask layer on the surface substrate;
patterning the hard mask layer to form at least a first hard mask opening;
forming a first drift isolation trench in the surface substrate using the patterned hard mask with the first hard mask opening, wherein the first drift isolation trench traverses along a channel width direction and comprises a first depth which extends partially through the surface substrate;
after forming the first drift isolation trench, implanting dopants into portion of the surface substrate adjacent to sidewalls and bottom of the first drift isolation trench using the hard mask layer and the first drift isolation trench as an implant mask, wherein the dopants comprises first polarity type dopants;
diffusing and activating the dopants in the portion of the surface substrate adjacent to the sidewalls and the bottom of the first drift isolation trench to form a self-aligned drift well using a high temperature process, wherein the drift well is self-aligned to the first isolation trench;
patterning the same hard mask layer to form a second hard mask opening;
forming a device isolation trench surrounding the device region in the surface substrate using the patterned hard mask with the second hard mask opening, wherein the device isolation trench comprises a second depth which extends to a bottom of the surface substrate;
filling the drift and device isolation trenches with isolation material to form a first drift isolation region and a device isolation region;
forming a transistor of a first polarity type having a gate in the device region; and
forming a first diffusion region adjacent to a first side of the gate and forming a second diffusion region adjacent to and displaced away from a second side of the gate.

2. The method of claim 1 wherein diffusing and activating the dopants comprises forming an isolation trench liner lining the drift and device isolation trenches.

3. The method of claim 1 wherein forming the self-aligned drift well comprises:
performing a first implant to form a first polarity type intermediately doped region at the bottom of the first drift isolation trench; and
performing a second implant to form lightly doped first polarity type regions on sidewalls of the first drift isolation trench.

4. The method of claim 3 wherein the first implant is a vertical implant and the second implant is a quad angle implant.

5. The method of claim 3 wherein forming the drift well comprises performing a halo implant to form halo regions having second polarity type dopants at corners of the first drift isolation trench.

6. The method of claim 1 comprising providing a soft mask over the hard mask and fills the first drift isolation trench prior to forming the device isolation trench, wherein the soft mask protects the first drift isolation trench during formation of the device isolation trench.

7. The method of claim 1 wherein the gate overlaps a portion of the first drift isolation region.

8. The method of claim 7 comprising forming a plurality of contact plugs, wherein the contact plugs are coupled to the gate and first and second diffusion regions of the transistor and wherein the contact plug coupled to the gate is formed over area of the gate which overlaps the first drift isolation region to reduce parasitic resistance on gate and to improve radio frequency (RF) performance.

9. The method of claim 1 wherein forming at least the first drift isolation trench in the surface substrate comprising:
forming a second drift isolation trench in the surface substrate, wherein the second drift isolation trench traverses along a channel length direction and comprises the first depth which extends partially through the surface substrate; and comprising
forming a body contact region having second polarity type dopants, wherein the body contact region is formed on the surface substrate and abuts the second drift isolation region, and the body contact region connects with a device well by portion of the surface substrate beneath the second drift isolation region.

10. The method of claim 9 wherein the first drift isolation region isolates the second diffusion region from the second side of the gate and the second drift isolation region isolates the body contact region from the first and second diffusion regions in the surface substrate.

11. A method for forming a device comprising:
providing a crystalline-on-insulator substrate having a bulk substrate and a surface substrate separated by a buried insulator layer, the surface substrate is defined with a device region;
forming a transistor of a first polarity type having a gate in the device region;
forming a first diffusion region adjacent to a first side of the gate and forming a second diffusion region adjacent to and displaced away from a second side of the gate;
forming a drift isolation region which traverses along a channel width direction in the surface substrate adjacent to and underlaps the second side of the gate;
after forming the drift isolation region, implanting dopants into portion of the surface substrate adjacent to sidewalls and bottom of the drift isolation region, wherein the dopants comprises first polarity type dopants;
diffusing and activating the dopants in the portion of the surface substrate adjacent to the sidewalls and the bottom of the drift isolation region to form a self-aligned drift well, wherein the drift well encompasses the drift isolation region; and
forming a device isolation region surrounding the device region in the surface substrate, wherein the device isolation region comprises a second depth which is deeper than a first depth of the drift isolation region.

12. The method of claim 11 wherein the drift isolation region which comprises the first depth extends partially through the surface substrate and terminates a distance away from a bottom of the surface substrate, and the device isolation region which comprises the second depth extends to the bottom of the surface substrate.

13. The method of claim 11 wherein forming at least the drift isolation region and forming the device isolation region comprise:
forming a hard mask layer on the surface substrate;
patterning the hard mask layer to form at least a first hard mask opening;
forming a drift isolation trench in the surface substrate using the patterned hard mask with the first hard mask opening;
patterning the same hard mask layer to form a second hard mask opening; and
forming a device isolation trench surrounding the device region in the surface substrate using the patterned hard mask with the second hard mask opening.

14. The method of claim 13 comprising providing a soft mask over the hard mask and fills the drift isolation trench prior to forming the device isolation trench, wherein the soft mask protects the drift isolation trench during formation of the device isolation trench.

15. The method of claim 11 implanting first polarity type dopants into portion of the surface substrate comprises using the hard mask and the drift isolation trench as an implant mask.

16. The method of claim 15 comprising forming a trench liner lining the drift and device isolation trenches using a high temperature process, wherein the high temperature process diffuses and activates the dopants to form the drift well which is self-aligned to the device region and und

Assignees

• Globalfoundries Sg Pte Ltd

Inventors

• Li Liming
• Zhang Shaoqiang
• Verma Purakh Raj
• Xiao Han

Classifications

• H10P30/222

  characterised by the angle between the ion beam and the crystal planes or the main crystal surface (characterised by the angle between the ion beam and the mask H10P30/221) · CPC title

• H10W20/069

  by forming self-aligned vias or self-aligned contact plugs · CPC title

• H10W10/181

  Semiconductor-on-insulator [SOI] isolation regions, e.g. buried oxide regions of SOI wafers · CPC title

• H10W10/061

  using SOI processes together with lateral isolation, e.g. combinations of SOI and shallow trench isolations · CPC title

• H10W10/17

  formed using trench refilling with dielectric materials, e.g. shallow trench isolations · CPC title