Resist composition, method of forming resist pattern, polymeric compound, compound

Patent metadata

Field	Value
Publication number	US-9778567-B2
Application number	US-201414540239-A
Country	US
Kind code	B2
Filing date	Nov 13, 2014
Priority date	Nov 15, 2013
Publication date	Oct 3, 2017
Grant date	Oct 3, 2017

Abstract

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-0) shown below (wherein V 11 represents an aliphatic cyclic group with or without a substituent; R 1 represents a lactam-containing cyclic group or a sultam-containing cyclic group; Y 1 represents an oxygen atom (—O—), an ester bond (—C(═O)—O—) or a single bond; and W 2 represents a group formed by a polymerization reaction of a polymerizable group-containing group).

First claim

What is claimed is:

1. A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, wherein
the resist composition comprises a base component (A) which exhibits changed solubility in a developing solution under action of acid, and an acid generator component (B),
and the base component (A) comprises a polymeric compound (A1) comprising a structural unit (a0) represented by general formula (a0-1-1) shown below and a structural unit (a1) containing an acid decomposable group that exhibits increased polarity by the action of acid, wherein the amount of the polymeric compound (A1) based on the total weight of the component (A) is 50% by weight or more:

wherein A″ represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms with or without an oxygen atom or a sulfur atom; R 1 represents a lactam-containing cyclic group or a sultam-containing cyclic group selected from the group consisting of a group represented by general formulae (a0-r0-1) to (a0-r0-4); and W 2 represents a group which is formed by a polymerization reaction of a group containing a polymerizable group:

wherein each Ra′ 01 independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, —COOR″, —OC(═O)R″, a hydroxyalkyl group or a cyano group; R″ represents a hydrogen atom or an alkyl group; A″ represents an oxygen atom, a sulfur atom, or an alkylene group of 1 to 5 carbon atoms with or without an oxygen atom or a sulfur atom; Rb represents a hydrogen atom or a hydrocarbon group; and * represents a valence bond.

2. A method of forming a resist pattern, comprising:
forming a resist film using the resist composition of claim 1 ;
exposing the resist film; and
developing the resist film to form a resist pattern.

3. A polymeric compound comprising a structural unit (a0) represented by general formula (a0-1-1) shown below and a structural unit (a1) containing an acid decomposable group that exhibits increased polarity by the action of acid:

wherein A″ represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms with or without an oxygen atom or a sulfur atom; R 1 represents a sultam-containing cyclic group selected from the group consisting of a group represented by general formulae (a0-r0-1) or (a0-r0-2); and W 2 represents a group which is formed by a polymerization reaction of a group containing a polymerizable group:

wherein each Ra′ 01 independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, —COOR″, —OC(═O)R″, a hydroxyalkyl group or a cyano group; R″ represents a hydrogen atom or an alkyl group; A″ represents an oxygen atom, a sulfur atom, or an alkylene group of 1 to 5 carbon atoms with or without an oxygen atom or a sulfur atom; Rb represents a hydrogen atom or a hydrocarbon group; and * represents a valence bond.

4. A compound represented by general formula (I) shown below:

wherein A″ represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms with or without an oxygen atom or a sulfur atom; R 1 represents a sultam-containing cyclic group selected from the group consisting of a group represented by general formulae (a0-r0-1) or (a0-r0-2); and R 2 represents a polymerizable group-containing group:

wherein each Ra′ 01 independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, —COOR″, —OC(═O)R″, a hydroxyalkyl group or a cyano group; R″ represents a hydrogen atom or an alkyl group; A″ represents an oxygen atom, a sulfur atom, or an alkylene group of 1 to 5 carbon atoms with or without an oxygen atom or a sulfur atom; Rb represents a hydrogen atom or a hydrocarbon group; and * represents a valence bond.

Assignees

• Tokyo Ohka Kogyo Co Ltd

Inventors

• Arai Masatoshi
• Utsumi Yoshiyuki

Classifications

• C08F220/387

  and containing nitrogen and oxygen · CPC title

• G03F7/0397 Primary

  the macromolecular compound having an alicyclic moiety in a side chain · CPC title

• C08F220/36

  containing oxygen in addition to the carboxy oxygen {, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate} · CPC title

• C08F2220/1858

  Chemistry & Metallurgy · mapped topic

• C08F2220/283

  Chemistry & Metallurgy · mapped topic