Xylylenediamine composition and method for producing polyamide resin

US9777115B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9777115-B2
Application numberUS-201415032031-A
CountryUS
Kind codeB2
Filing dateOct 29, 2014
Priority dateOct 31, 2013
Publication dateOct 3, 2017
Grant dateOct 3, 2017

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  1. Title

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  2. Abstract

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided are [1] a xylylenediamine composition containing xylylenediamine and a pyridine compound (A) having at least one substituent including an amino group, wherein the content of the pyridine compound (A) is 0.001 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine; and [2] a method for producing a polyamide resin including the steps of introducing a pyridine compound (A) having at least one substituent including an amino group, a diamine including xylylenediamine (but excluding a diamine corresponding to the above-mentioned pyridine compound (A)), and a dicarboxylic acid into a reaction system and performing a polycondensation reaction, wherein the amount of the pyridine compound (A) to be introduced is 0.001 to 0.1 parts by mass based on 100 parts by mass of xylylenediamine.

First claim

Opening claim text (preview).

The invention claimed is: 1. A xylylenediamine composition comprising xylylenediamine and a pyridine compound (A) having at least one substituent including an amino group, wherein the content of the pyridine compound (A) is 0.001 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine; wherein the pyridine compound (A) has two substituents including an amino group, the pyridine compound (A) comprising at least one of bis(aminomethyl)pyridine represented by the following formula (a) and diaminopyridine represented by the following formula (b): 2. The xylylenediamine composition according to claim 1 , wherein the xylylenediamine is m-xylylenediamine, p-xylylenediamine, or a mixture thereof. 3. The xylylenediamine composition according to claim 1 , wherein the xylylenediamine is m-xylylenediamine. 4. The xylylenediamine composition according to claim 1 , wherein the content of xylylenediamine is 99.5% by mass or more. 5. The xylylenediamine composition according to claim 1 , which is used for a raw material for polyamide resin. 6. A method for producing a polyamide resin comprising the steps of introducing a pyridine compound (A) having at least one substituent including an amino group, a diamine comprising xylylenediamine (but excluding a diamine corresponding to the pyridine compound (A)), and a dicarboxylic acid into a reaction system and performing a polycondensation reaction, wherein the amount of the pyridine compound (A) to be introduced is 0.001 to 0.1 parts by mass based on 100 parts by mass of xylylenediamine; wherein the pyridine compound (A) has two substituents including an amino group, the pyridine compound (A) comprising at least one of bis(aminomethyl)pyridine represented by the following formula (a) and diaminopyridine represented by the following formula (b): 7. The method for producing a polyamide resin according to claim 6 , wherein the dicarboxylic acid is at least one selected from an aliphatic dicarboxylic acid having 4 to 20 carbon atoms, terephthalic acid, and isophthalic acid. 8. The method for producing a polyamide resin according to claim 6 , wherein the content of xylylenediamine in the xylylenediamine-containing diamine is 70 mol % or more, and the content of the aliphatic dicarboxylic acid having 4 to 20 carbon atoms in the dicarboxylic acid is 50 mol % or more. 9. The method for producing a polyamide resin according to claim 7 , wherein the aliphatic dicarboxylic acid having 4 to 20 carbon atoms is at least one selected from adipic acid and sebacic acid. 10. The method for producing a polyamide resin according to claim 6 , wherein the xylylenediamine is m-xylylenediamine, p-xylylenediamine, or a mixture thereof. 11. The method for producing a polyamide resin according to claim 6 , wherein the xylylenediamine is m-xylylenediamine. 12. The method for producing a polyamide resin according to claim 6 , further comprising a step of solid-phase polymerization.

Assignees

Inventors

Classifications

  • C08G69/265Primary

    from at least two different diamines or at least two different dicarboxylic acids · CPC title

  • Preparatory processes · CPC title

  • C08G69/26Primary

    derived from polyamines and polycarboxylic acids · CPC title

  • Solid state polycondensation · CPC title

  • Polyamides derived from polyamines and polycarboxylic acids (C08L77/10 takes precedence) · CPC title

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What does patent US9777115B2 cover?
Provided are [1] a xylylenediamine composition containing xylylenediamine and a pyridine compound (A) having at least one substituent including an amino group, wherein the content of the pyridine compound (A) is 0.001 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine; and [2] a method for producing a polyamide resin including the steps of introducing a pyridine compound (A)…
Who is the assignee on this patent?
Mitsubishi Gas Chemical Co
What technology area does this patent fall under?
Primary CPC classification C08G69/265. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 03 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).