Surface-treatment method of cathode active material and cathode active material formed therefrom

Patent metadata

Field	Value
Publication number	US-9776879-B2
Application number	US-201314050990-A
Country	US
Kind code	B2
Filing date	Oct 10, 2013
Priority date	May 3, 2011
Publication date	Oct 3, 2017
Grant date	Oct 3, 2017

Abstract

The present invention provides a method for treating the particle surface of a cathode active material for a lithium secondary battery, the method comprising (a) preparing a cathode active material having a lithium compound; (b) generating a plasma from a gas comprising at least one of a fluorine-containing gas and a phosphorus-containing gas as a part of a reactive gas; and (c) removing lithium impurities present on the particle surface of the cathode active material with the plasma. In accordance with the present invention, the amount of the lithium impurities present on the particle surface of the cathode active material can be reduced to suppress a side reaction of the lithium impurities and an electrolyte.

First claim

What is claimed is:

1. A method for treating particle surface of a cathode active material for a lithium secondary battery, the method comprising:
(a) preparing a cathode active material comprising a lithium compound;
(b) generating a plasma from gases comprising at least one of a fluorine-containing gas and a phosphorus-containing gas as a part of a reactive gas; and
(c) removing lithium impurities present on particle surface of the cathode active material with the plasma,
wherein the reactive gas comprises SF 6 ,
wherein the gases further comprise a carrier gas comprising an inert gas, and
wherein the lithium impurities comprise at least one of LiOH and Li 2 CO 3 .

2. The method for treating particle surface of a cathode active material according to claim 1 , wherein the lithium compound is selected from the group consisting of LiCoO 2 , LiNiO 2 , LiMn 2 O 4 , LiFePO 4 , LiFe 1-x Mn x PO 4 , LiNi 1-x-y Mn x Co y O 2 (0≦x<1, 0≦y<1) and LiNi 1-x-y-z Co x M1 y M2 z O 2 (wherein, M1 and M2 are each independently selected from the group consisting of Al, Ni, Co, Fe, Mn, V, Cr, Ti, W, Ta, Ma and Mo; and x, y and z are each independently an atomic fraction of oxide-forming elements, in which 0≦x<1, 0≦y<1, and 0≦z<1).

3. The method for treating particle surface of a cathode active material according to claim 1 , wherein the reactive gas further comprises at least one selected from hydrogen, oxygen, hydrocarbon and a compound containing halogen family elements.

4. The method for treating particle surface of a cathode active material according to claim 1 , wherein the phosphorus-containing gas comprises at least one selected from PH 3 , P(CH 3 ) 3 and PF 3 .

5. The method for treating particle surface of a cathode active material according to claim 3 , wherein the hydrocarbon is CH 4 .

6. The method for treating particle surface of a cathode active material according to claim 1 , wherein the inert gas is at least one selected from nitrogen, argon, helium and neon.

7. The method for treating particle surface of a cathode active material according to claim 1 , wherein the reactive gas further comprises CH 4 , and the inert gas is N 2 .

8. The method for treating particle surface of a cathode active material according to claim 1 , wherein the step (b) is conducted by using a capacitively-coupled plasma (CCP) generator, an inductively-coupled plasma (ICP) generator, a direct current (DC) plasma generator or a dielectric barrier discharge (DBD) plasma generator.

9. The method for treating particle surface of a cathode active material according to claim 1 , wherein the step (c) comprises modifying at least part of the lithium impurities to LiF.

10. The method for treating particle surface of a cathode active material according to claim 9 , wherein the step (c) further comprises sputtering at least part of the lithium impurities with the accelerated ions of the plasma.

Assignees

• Lg Chemical Ltd

Inventors

• Kang Sung-Joong
• Park Hong-Kyu
• Jin Joo-Hong
• Lee Dae-Jin

Classifications

• H01M4/485 Primary

  of mixed oxides or hydroxides for inserting or intercalating light metals, e.g. LiTi2O4 or LiTi2OxFy (H01M4/505, H01M4/525 take precedence) · CPC title

• H01M4/505

  of mixed oxides or hydroxides containing manganese for inserting or intercalating light metals, e.g. LiMn2O4 or LiMn2OxFy · CPC title

• C01D15/02 Primary

  Oxides; Hydroxides · CPC title

• H01M4/525

  of mixed oxides or hydroxides containing iron, cobalt or nickel for inserting or intercalating light metals, e.g. LiNiO2, LiCoO2 or LiCoOxFy · CPC title

• H01M4/5825

  Oxygenated metallic salts or polyanionic structures, e.g. borates, phosphates, silicates, olivines · CPC title