Substrate cleaning apparatus and substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-9773686-B2
Application number	US-201414501733-A
Country	US
Kind code	B2
Filing date	Sep 30, 2014
Priority date	Oct 3, 2013
Publication date	Sep 26, 2017
Grant date	Sep 26, 2017

Abstract

A substrate cleaning apparatus for reducing a limitation of a layout of a chemical liquid nozzle and a rinsing liquid nozzle, while enabling a load cell to be installed at an optimal location and achieving a larger adjustment range, is disclosed. The substrate cleaning apparatus includes a roll assembly including at least a roll cleaning member to be brought into contact with a substrate and a roll arm that rotatably supports the roll cleaning member; a support arm for supporting the roll assembly; an adjustment screw extending through the support arm and screwed into the roll assembly; and a screw support that fixes a relative position of the adjustment screw in a vertical direction with respect to the support arm and rotatably supports the adjustment screw.

First claim

What is claimed is:

1. A substrate cleaning apparatus, comprising:
a roll arm for rotatably supporting a roll cleaning member to be brought into contact with a substrate;
a support arm supporting the roll arm;
an adjustment screw vertically extending through the support arm and supporting the roll arm, the adjustment screw being rotatable to adjust a height of an entirety of the roll arm relative to the support arm;
a screw support that fixes a relative position of the adjustment screw in a vertical direction with respect to the support arm and rotatably supports the adjustment screw;
an actuator configured to move the roll arm, the adjustment screw, and the support arm together in the vertical direction; and
a backup guide that restricts a rotation of the roll arm relative to the support arm when the adjustment screw rotates.

2. The substrate cleaning apparatus according to claim 1 , further comprising:
a tilting mechanism that allows the roll arm to tilt;
the adjustment screw is screwed into the tilting mechanism.

3. The substrate cleaning apparatus according to claim 1 , further comprising:
a biasing device biasing the roll arm toward the support arm.

4. The substrate cleaning apparatus according to claim 1 , further comprising:
a fixing device for fixing a rotational position of the adjustment screw.

5. The substrate cleaning apparatus according to claim 1 , further comprising:
a waterproof cover that covers a portion of the adjustment screw protruding from the support arm.

6. A substrate processing apparatus, comprising:
a polishing unit configured to polish a substrate; and
a substrate cleaning apparatus configured to clean the polished substrate, the substrate cleaning apparatus comprising:
a roll arm for rotatably supporting a roll cleaning member to be brought into contact with the substrate;
a support arm supporting the roll arm;
an adjustment screw vertically extending through the support arm and supporting the roll arm, the adjustment screw being rotatable to adjust a height of an entirety of the roll arm relative to the support arm;
a screw support that fixes a relative position of the adjustment screw in a vertical direction with respect to the support arm and rotatably supports the adjustment screw;
an actuator configured to move the roll arm, the adjustment screw, and the support arm together in the vertical direction; and
a backup guide that restricts a rotation of the roll arm relative to the support arm when the adjustment screw rotates.

7. The substrate cleaning apparatus according to claim 1 , wherein the screw support is fixed to the support arm.

8. The substrate cleaning apparatus according to claim 1 , wherein the roll arm is supported by a free end of the support arm through the adjustment screw.

9. The substrate cleaning apparatus according to claim 1 , wherein the roll arm is located below the support arm.

10. The substrate cleaning apparatus according to claim 1 , wherein the backup guide is located between the support arm and the roll arm.

11. The substrate cleaning apparatus according to claim 3 , wherein the biasing device comprises a spring.

Assignees

• Ebara Corp

Inventors

• Tanaka Hideaki

Classifications

• H10P72/7608

  characterised by a plurality of separate clamping members, e.g. clamping fingers · CPC title

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0412 Primary

  using mainly scrubbing means, e.g. brushes · CPC title

• H10P72/0404

  for general liquid treatment, e.g. etching followed by cleaning · CPC title

• H10P70/00 Primary

  Cleaning of wafers, substrates or parts of devices · CPC title