Mask-less fabrication of vertical thin film batteries

US9768450B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9768450-B2
Application numberUS-201314653730-A
CountryUS
Kind codeB2
Filing dateDec 17, 2013
Priority dateDec 19, 2012
Publication dateSep 19, 2017
Grant dateSep 19, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of fabricating a thin film battery may comprise: depositing a first stack of blanket layers on a substrate, the first stack comprising a cathode current collector, a cathode, an electrolyte, an anode and an anode current collector; laser die patterning the first stack to form one or more second stacks, each second stack forming the core of a separate thin film battery; blanket depositing an encapsulation layer over the one or more second stacks; laser patterning the encapsulation layer to open up contact areas to the anode current collectors on each of the one or more second stacks; blanket depositing a metal pad layer over the encapsulation layer and the contact areas; and laser patterning the metal pad layer to electrically isolate the anode current collectors of each of the one or more thin film batteries. For electrically non-conductive substrates, cathode contact areas are opened-up through the substrate.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of fabricating a thin film battery comprising: depositing a first stack of blanket layers on the top surface of an electrically non-conductive substrate, the first stack comprising a cathode current collector layer, a cathode layer, an electrolyte layer, an anode layer and an anode current Collector layer, followed by laser die patterning said first stack to form one or more second stacks, each second stack forming a core of a separate thin film battery; blanket depositing an encapsulation layer over said one or more second stacks; laser patterning said encapsulation layer to open up anode contact areas to the anode current collectors on each of said one or more second stacks; blanket depositing a metal pad layer over said encapsulation layer and said anode contact areas; laser patterning said metal pad layer to electrically isolate the anode current collectors of each of said one or more thin film batteries; and opening up, through said electrically non-conductive substrate, cathode contact areas on the cathode current collector for each of said one or more thin film batteries. 2. The method of claim 1 , wherein said anode layer is a lithium layer. 3. The method of claim 1 , wherein said opening up cathode contact areas includes laser ablating said electrically non-conductive substrate. 4. The method of claim 1 , wherein said laser patterning said encapsulation layer further includes removing strips of said encapsulation layer completely around and adjacent to the edges of said second stacks, said strips being roughly the thickness of said encapsulation layer away from the edges of said second stacks. 5. The method of claim 1 , further comprising annealing said cathode layer. 6. The method of claim 1 , wherein said first stack further comprises a die patterning assistance layer between said electrically non-conductive substrate and said cathode current collector layer. 7. The method of claim 6 , wherein said die patterning assistance layer is an amorphous silicon layer. 8. The method of claim 1 , wherein said opening up cathode contact areas includes: depositing resist over the bottom surface of said substrate; removing portions of said resist to expose areas of the bottom surface of said substrate; and etching through said electrically non-conductive substrate at the exposed areas to expose said cathode contact areas. 9. The method of claim 8 , wherein said resist is photoresist. 10. The method of claim 8 , wherein said etching is wet etching.

Assignees

Inventors

Classifications

  • Sputtering · CPC title

  • Sputtering · CPC title

  • H01M6/40Primary

    Printed batteries {, e.g. thin film batteries} · CPC title

  • of the type ABO3 with A representing alkali, alkaline earth metal or Pb and B representing a refractory or rare earth metal · CPC title

  • Small-sized flat cells or batteries for portable equipment · CPC title

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What does patent US9768450B2 cover?
A method of fabricating a thin film battery may comprise: depositing a first stack of blanket layers on a substrate, the first stack comprising a cathode current collector, a cathode, an electrolyte, an anode and an anode current collector; laser die patterning the first stack to form one or more second stacks, each second stack forming the core of a separate thin film battery; blanket depositi…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H01M6/40. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 19 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).