TFT backplate structure comprising transistors having gate isolation layers of different thicknesses and manufacture method thereof

Patent metadata

Field	Value
Publication number	US-9768202-B2
Application number	US-201414426155-A
Country	US
Kind code	B2
Filing date	Sep 19, 2014
Priority date	Sep 2, 2014
Publication date	Sep 19, 2017
Grant date	Sep 19, 2017

Abstract

The present invention provides a TFT backplate structure and a manufacture method thereof. The TFT backplate structure comprises a switch TFT (T 1 ) and a drive TFT (T 2 ). The switch TFT (T 1 ) is constructed by a first source/a first drain ( 61 ), a first gate ( 21 ), and a first etching stopper layer ( 51 ), a first oxide semiconductor layer ( 41 ), a first gate isolation layer ( 31 ) sandwiched in between. The drive TFT (T 2 ) is constructed by a second source/a second drain ( 62 ), a second gate ( 22 ), and a second oxide semiconductor layer ( 42 ), a first etching stopper layer ( 51 ), a second gate isolation layer ( 32 ) sandwiched in between. The electrical properties of the switch TFT (T 1 ) and the drive TFT (T 2 ) are different. The switch TFT has smaller subthreshold swing to achieve fast charge and discharge, and the drive TFT has relatively larger subthreshold swing for controlling the current and the grey scale more precisely.

First claim

What is claimed is:

1. A manufacture method of a TFT backplate structure, comprising steps of:
step 1 , providing a substrate, and depositing a first metal film on the substrate, and patterning the first metal film to form a first gate and a second gate with a distance in between such that the first gate and the second gate are spaced from each other in a sideway direction;
step 2 , depositing a gate isolation film on the substrate, the first gate and the second gate and patterning the gate isolation film to form a first gate isolation layer and a second gate isolation layer;
step 3 , depositing an oxide semiconductor film on the substrate of accomplishing the second step and patterning the oxide semiconductor film to form a first oxide semiconductor layer right over the first gate and on the first gate isolation layer;
step 4 , depositing an etching stopper film on the substrate of accomplishing the third step and patterning the etching stopper film to form a first etching stopper layer on the first oxide semiconductor layer and the second gate isolation layer;
step 5 , depositing an oxide semiconductor film on the substrate of accomplishing the fourth step and patterning the oxide semiconductor film to form a second oxide semiconductor layer right over the second gate and on the first etching stopper layer;
step 6 , depositing a second metal film on the substrate of accomplishing the fifth step and patterning the second metal film to form a first source/a first drain, and a second source/a second drain;
wherein the first source/the first drain are connected to the first oxide semiconductor layer and the second gate, and the second source/the second drain are connected to the second oxide semiconductor layer;
step 7 , forming a protective layer on the first source/the first drain, and the second source/the second drain; and
step 8 , forming a pixel electrode on the protective layer;
wherein the pixel electrode is connected to the second source/the second drain;
wherein the second oxide semiconductor layer is located on the first etching stopper layer that is directly formed and stacked on the second gate isolation layer in a predetermined direction and the second oxide semiconductor layer is spaced from the first oxide semiconductor layer in the sideway direction that is different from the predetermined direction; and
wherein the first source/the first drain, the first gate, and the first etching stopper layer, the first oxide semiconductor layer, and the first gate insulation layer that are between the first source/the first drain and the first gate collectively form a first transistor and the second source/the second drain, second first gate, and the second oxide semiconductor layer, the first etching stopper layer, and the second gate insulation layer that are between the second source/the second drain and the second gate collectively form a second transistor, the first and second transistors being arranged side by side and spaced from each other in the sideway direction, wherein in the side-by-side arranged first and second transistors, the first etching stopper layer is located above the first oxide semiconductor layer and below the second oxide semiconductor layer.

2. The manufacture method of the TFT backplate structure according to claim 1 , wherein the fifth step further comprises depositing and patterning an etching stopper film on the second oxide semiconductor layer to form a second etching stopper layer on the second oxide semiconductor layer.

3. The manufacture method of the TFT backplate structure according to claim 1 , wherein both the first and the second oxide semiconductor layers are IGZO semiconductor layers.

4. The manufacture method of the TFT backplate structure according to claim 1 , wherein the pixel electrode is an ITO pixel electrode.

5. A manufacture method of a TFT backplate structure, comprising steps of:
step 1 , providing a substrate, and depositing a first metal film on the substrate, and patterning the first metal film to form a first gate and a second gate with a distance in between such that the first gate and the second gate are spaced from each other in a sideway direction;
step 2 , depositing a gate isolation film on the substrate, the first gate and the second gate and patterning the gate isolation film to form a first gate isolation layer and a second gate isolation layer;
step 3 , depositing an oxide semiconductor film on the substrate of accomplishing the second step and patterning the oxide semiconductor film to form a first oxide semiconductor layer right over the first gate and on the first gate isolation layer;
step 4 , depositing an etching stopper film on the substrate of accomplishing the third step and patterning the etching stopper film to form a first etching stopper layer on the first oxide semiconductor layer and the second gate isolation layer;
step 5 , depositing an oxide semiconductor film on the substrate of accomplishing the fourth step and patterning the oxide semiconductor film to form a second oxide semiconductor layer right over the second gate and on the first etching stopper layer;
step 6 , depositing a second metal film on the substrate of accomplishing the fifth step and patterning the second metal film to form a first source/a first drain, and a second source/a second drain;
wherein the first source/the first drain are connected to the first oxide semiconductor layer and the second gate, and the second source/the second drain are connected to the second oxide semiconductor layer;
step 7 , forming a protective layer on the first source/the first drain, and the second source/the second drain; and
step 8 , forming a pixel electrode on the protective layer;
wherein the pixel electrode is connected to the second source/the second drain;
wherein the second oxide semiconductor layer is located on the first etching stopper layer that is directly formed and stacked on the second gate isolation layer in a predetermined direction and the second oxide semiconductor layer is spaced from the first oxide semiconductor layer is in the sideway direction that is different from the predetermined direction;
wherein the first source/the first drain, the first gate, and the first etching stopper layer, the first oxide semiconductor layer, and the first gate insulation layer that are between the first source/the first drain and the first gate collectively form a first transistor and the second source/the second drain, second first gate, and the second oxide semiconductor layer, the first etching stopper layer, and the second gate insulation layer that are between the second source/the second drain and the second gate collectively form a second transistor, the first and second transistors being arranged side by side and spaced from each other in the sideway direction, wherein in the side-by-side arranged first and second transistors, the first etching stopper layer is located above the first oxide semiconductor layer and below the second oxide semiconductor layer;
wherein the fifth step further comprises depositing and patterning an etching stopper film on the second oxide semiconductor layer to form a second etching stopper layer on the second oxide semiconductor layer;
wherein both the first and the second oxide semiconductor layers are IGZO semiconductor layers; and
wherein the pixel electrode is an ITO pixel electrode.

Assignees

• Shenzhen China Star Optoelect
• Shenzhen China Star Optoelect

Inventors

• Lv Xiaowen
• Tseng Chihyuan
• Su Chihyu
• Zhang Hejing

Classifications

• H10D84/01

  Manufacture or treatment · CPC title

• H01L29/7869

  Electricity · mapped topic

• H01L27/12

  Electricity · mapped topic

• H01L27/1251 Primary

  Electricity · mapped topic

• H01L21/77

  Electricity · mapped topic