Silicon carbide-tantalum carbide composite and susceptor

US9764992B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9764992-B2
Application numberUS-201414652210-A
CountryUS
Kind codeB2
Filing dateJan 28, 2014
Priority dateFeb 6, 2013
Publication dateSep 19, 2017
Grant dateSep 19, 2017

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Provided is a silicon carbide-tantalum carbide composite having excellent durability. A silicon carbide-tantalum carbide composite ( 1 ) includes: a body ( 10 ) whose surface layer is at least partly formed of a first silicon carbide layer ( 12 ); a tantalum carbide layer ( 20 ); and a second silicon carbide layer ( 13 ). The tantalum carbide layer ( 20 ) is disposed over the first silicon carbide layer ( 12 ). The second silicon carbide layer ( 13 ) is interposed between the tantalum carbide layer ( 20 ) and the first silicon carbide layer ( 12 ). The second silicon carbide layer ( 13 ) has a C/Si composition ratio of not less than 1.2 as measured by X-ray photoelectron spectroscopy. The second silicon carbide layer ( 13 ) has a peak intensity ratio G/D of not less than 1.0 between the G-band and D-band of carbon as measured by Raman spectroscopy.

First claim

Opening claim text (preview).

The invention claimed is: 1. A silicon carbide-tantalum carbide composite comprising: a body whose surface layer is at least partly formed of a first silicon carbide layer; a tantalum carbide layer disposed over the first silicon carbide layer; and a second silicon carbide layer interposed between the tantalum carbide layer and the first silicon carbide layer, wherein the second silicon carbide layer has a C/Si composition ratio of not less than 1.2 as measured by X-ray photoelectron spectroscopy. 2. The silicon carbide-tantalum carbide composite according to claim 1 , wherein the second silicon carbide layer has a C/Si composition ratio of not more than 6.0 as measured by X-ray photoelectron spectroscopy. 3. A silicon carbide-tantalum carbide composite comprising: a body whose surface layer is at least partly formed of a first silicon carbide layer; a tantalum carbide layer disposed over the first silicon carbide layer; and a second silicon carbide layer interposed between the tantalum carbide layer and the first silicon carbide layer, wherein the second silicon carbide layer has a peak intensity ratio G/D of not less than 1.0 between the G-band and D-band of carbon as measured by Raman spectroscopy. 4. The silicon carbide-tantalum carbide composite according to claim 3 , wherein the second silicon carbide layer has a peak intensity ratio G/D of not more than 7.5 between the G-band and D-band of carbon as measured by Raman spectroscopy. 5. The silicon carbide-tantalum carbide composite according to claim 1 , wherein the second silicon carbide layer has a crystallite diameter of not more than 753 Angstroms. 6. The silicon carbide-tantalum carbide composite according to claim 1 , wherein the body includes a graphite base material and the first silicon carbide layer disposed on the graphite base material. 7. The silicon carbide-tantalum carbide composite according to claim 1 , wherein the second silicon carbide layer has a thickness of not less than 0.05 μm. 8. A susceptor comprising the silicon carbide-tantalum carbide composite according to claim 1 , the susceptor including a recess of which at least one of a bottom surface and a side surface is formed of tantalum carbide layer.

Assignees

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Classifications

  • for supporting or gripping · CPC title

  • characterised by a coating, a hardness or a material · CPC title

  • Carbides · CPC title

  • application under an other specific atmosphere · CPC title

  • characterised by the material treated · CPC title

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What does patent US9764992B2 cover?
Provided is a silicon carbide-tantalum carbide composite having excellent durability. A silicon carbide-tantalum carbide composite ( 1 ) includes: a body ( 10 ) whose surface layer is at least partly formed of a first silicon carbide layer ( 12 ); a tantalum carbide layer ( 20 ); and a second silicon carbide layer ( 13 ). The tantalum carbide layer ( 20 ) is disposed over the first silicon carb…
Who is the assignee on this patent?
Toyo Tanso Co
What technology area does this patent fall under?
Primary CPC classification C04B41/89. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 19 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).