Low temperature CVD coatings and applications thereof

US9764986B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9764986-B2
Application numberUS-201514602745-A
CountryUS
Kind codeB2
Filing dateJan 22, 2015
Priority dateJan 22, 2015
Publication dateSep 19, 2017
Grant dateSep 19, 2017

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

In one aspect, articles employing CVD coatings deposited at low temperatures are described herein. Briefly, a coated article described herein comprises a substrate and a refractory coating adhered to the substrate, the refractory coating including a layer of TiN deposited by thermal CVD, the layer of TiN having an average crystallite size of 0.05 μm to 0.5 μm and residual tensile stress of 100 MPa to 700 MPa.

First claim

Opening claim text (preview).

The invention claimed is: 1. A coated article comprising: a substrate; and a refractory coating adhered to the substrate, the refractory coating including a layer of titanium nitride deposited by thermal chemical vapor deposition (CVD), the layer of titanium nitride having an average crystallite size of 0.05 μm to 0.5 μm and residual tensile stress of 100 MPa to 700 MPa. 2. The coated article of claim 1 , wherein the titanium nitride layer has hardness of 1500 HV to 2500 HV. 3. The coated article of claim 1 , the titanium nitride layer has a texture coefficient greater than 3.5 for the (200) growth direction, the texture coefficient (TC) being defined as TC ⁡ ( hkl ) = I ⁡ ( hkl ) I 0 ⁡ ( hkl ) ⁢ { 1 n ⁢ ∑ I ⁡ ( hkl ) I 0 ⁡ ( hkl ) } - 1 where I(hkl)=measured intensity of the (hkl) reflection I 0 (hkl)=standard intensity of the (hkl) reflection according to International Center for Diffraction Data (ICDD) card 38-1420 n=number of reflections used in the TC calculation (hkl) reflections used in the TC calculation are (111), (200), (220), (311), (222), (400), (331) and (422). 4. The coated article of claim 3 , wherein the titanium nitride layer has a TC greater than 4.0. 5. The coated article of claim 1 , wherein the substrate is selected from the group consisting of cemented carbide, ceramic and alloy. 6. The coated article of claim 1 , wherein the titanium nitride layer forms an interface with the substrate. 7. The coated article of claim 6 , wherein the substrate is cemented carbide, the cemented carbide substrate having residual tensile stress of 50 MPa to 300 MPa at a depth within 2 μm of the interface with the titanium nitride layer. 8. The coated article of claim 7 , wherein the cemented carbide substrate has a pre-coat treated surface condition. 9. The coated article of claim 8 , wherein the cemented carbide substrate has a blasted surface condition. 10. The coated article of claim 5 , wherein the substrate is an alloy selected from the group consisting of steels, iron-based alloys, nickel-based alloys and cobalt-based alloys. 11. The coated article of claim 1 , wherein the titanium nitride layer has a thickness of 1 μm to 200 μm. 12. The coated article of claim 1 , wherein the titanium nitride layer has a thickness of 5 μm to 100 μm. 13. The coated article of claim 1 , wherein the refractory coating further comprises one or more inner layers between the titanium nitride layer and the substrate, an inner layer comprising one or more metallic elements selected from the group consisting of aluminum and metallic elements of Groups IVB, VB and VIB of the Periodic Table and one or more non-metallic elements of Groups IIIA, VI, VA and VIA of the Periodic Table. 14. The coated article of claim 1 , wherein the refractory coating further comprises one or more outer layers over the titanium nitride layer, an outer layer comprising one or more metallic elements selected from the group consisting of aluminum and metallic elements of Groups IVB, VB and VIB of the Periodic Table and one or more non-metallic elements of Groups IIIA, VI, VA and VIA of the Periodic Table. 15. The coated article of claim 1 , wherein the substrate is a cutting tool. 16. The coated article of claim 1 , wherein the substrate is a wear component. 17. The coated article of claim 1 , wherein the layer of titanium nitride has a critical load (L c ) of at least 70 N. 18. The coated article of claim 1 , wherein the titanium nitride crystallites exhibit a tetragonal pyramid grain morphology. 19. The coated article of claim 1 , wherein the titanium nitride layer is in the as-deposited state. 20. The coated article of claim 1 , wherein the substrate is selected from the group consisting of cemented carbide and ceramic.

Assignees

Inventors

Classifications

  • C23C16/34Primary

    Nitrides {(C23C16/303 takes precedence)} · CPC title

  • based on titanium nitrides, e.g. TiAlON · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9764986B2 cover?
In one aspect, articles employing CVD coatings deposited at low temperatures are described herein. Briefly, a coated article described herein comprises a substrate and a refractory coating adhered to the substrate, the refractory coating including a layer of TiN deposited by thermal CVD, the layer of TiN having an average crystallite size of 0.05 μm to 0.5 μm and residual tensile stress of 100 …
Who is the assignee on this patent?
Kennametal Inc
What technology area does this patent fall under?
Primary CPC classification C23C16/34. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 19 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).