Manufacturing method of color filter substrate

US9760001B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9760001-B2
Application numberUS-201414429443-A
CountryUS
Kind codeB2
Filing dateJun 30, 2014
Priority dateSep 10, 2013
Publication dateSep 12, 2017
Grant dateSep 12, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A manufacturing method of a color filter substrate includes: depositing a photoresist layer on a substrate, patterning the photoresist layer through exposure and development and executing an UV curing; or forming an overcoat whose material is a light-cured material on a substrate, conducting an UV irradiation on the substrate from front and back sides of the substrate, respectively; or, depositing a black matrix photoresist, a red photoresist, a green photoresist and a blue photoresist on a substrate, respectively, and forming corresponding patterns respectively through exposure and development and executing an UV curing. By the technical solution, the line-width of a BM can be restrained from broadening, and the curing time can be shortened, thereby raising the production efficiency.

First claim

Opening claim text (preview).

What is claimed is: 1. A manufacturing method of a color filter substrate, comprising: coating photoresist on a substrate to form a photoresist layer, patterning the photoresist layer through exposure and development and executing an ultraviolet curing of the photoresist layer; wherein the ultraviolet curing is carried out in a conveyor belt ultraviolet curing machine; a transfer speed, a curing time period and a length of an ultraviolet curing segment of the conveyor belt ultraviolet curing machine meet the following relationship; the transfer speed=length of the UV curing segment/the curing time. 2. The manufacturing method claimed as claim 1 , wherein the photoresist layer is a black matrix photoresist layer, a red photoresist layer, a green photoresist layer, a blue photoresist layer, or a photoresist layer for pillar-shaped spacers and an ultraviolet irradiation is conducted on the substrate from front and back sides of the substrate, respectively. 3. The manufacturing method claimed as claim 1 , wherein the photoresist comprises a photosensitizer sensitive to i-line of ultraviolet light added therein. 4. The manufacturing method claimed as claim 3 , wherein the photoresist also comprises a photosensitizer sensitive to h-line or g-line of ultraviolet light added therein. 5. A manufacturing method of a color filter substrate, comprising: coating a light-cured material on a substrate to form an overcoat, and executing an ultraviolet curing; wherein the ultraviolet curing includes: conducting an ultraviolet irradiation on the substrate from front and back sides of the substrate, respectively. 6. The manufacturing method claimed as claim 5 , wherein the ultraviolet curing is carried out in a conveyor belt ultraviolet curing machine or an oven ultraviolet curing machine. 7. The manufacturing method claimed as claim 6 , wherein, where the conveyor belt ultraviolet curing machine is used for ultraviolet curing of the substrate, a transfer speed, a curing time period and a length of an ultraviolet curing segment meet the following relationship: the transfer speed=the length of the UV curing segment/the curing time. 8. The manufacturing method claimed as claim 6 , wherein the oven ultraviolet curing machine is provided hi a multilayered structure, and at least one ultraviolet light source is arranged between layers. 9. The manufacturing method claimed as claim 5 , wherein the light-cured material comprises a photosensitizer sensitive to i-line of ultraviolet light added therein. 10. The manufacturing method claimed as claim 9 , wherein, the light-cured material also comprises a photosensitizer sensitive to h-line or g-line of ultraviolet light added therein. 11. A manufacturing method of a color filter substrate, comprising: coating a black matrix photoresist on a substrate to form a black matrix photoresist layer, forming a pattern of a black matrix through exposure and development and executing an ultraviolet curing of the black matrix photoresist layer; coating a red photoresist on the substrate to form a red photoresist layer, forming pattern of red sub-pixels through exposure and development and executing an ultraviolet curing of the red photoresist layer; coating a green photoresist on the substrate to form a green photoresist layer, forming pattern of green sub-pixels through exposure and development and executing an ultraviolet curing of the green photoresist layer; and coating a blue photoresist on the substrate to form a blue photoresist layer, forming pattern of blue sub-pixels through exposure and development and executing an ultraviolet curing of the blue photoresist layer; wherein the ultraviolet curing is carried out in an oven ultraviolet curing machine; the oven ultraviolet curing machine is provided in a multilayered structure, and at least one ultraviolet light source is arranged between layers. 12. The manufacturing method claimed as claim 11 , further comprising: coating a light-cured material on the substrate to form an overcoat, and executing an ultraviolet curing. 13. The manufacturing method claimed as claim 12 , further comprising: coating a pillar-shaped spacer photoresist on the substrate to form a photoresist layer for pillar-shaped spacers, forming a pattern of the pillar-shaped spacers and executing an ultraviolet curing. 14. The manufacturing method claimed as claim 13 , further comprising: conducting an annealing on the substrate with the black matrix, the red, green and blue sub-pixels, the overcoat and the pillar-shaped spacers formed thereon. 15. The manufacturing method claimed as claim 13 , wherein at least one of the black matrix photoresist, the red photoresist, the green photoresist, the blue photoresist, the light-cured material and the pillar-shaped spacer photoresist comprises a photosensitizer sensitive to i-line of ultraviolet light added therein. 16. The manufacturing method claimed as claim 15 , wherein at least one of the black matrix photoresist, the red photoresist, the green photoresist, the blue photoresist, the light-cured material and the pillar-shaped spacer photoresist also comprises a photosensitizer sensitive to h-line or g-line of ultraviolet light added therein. 17. The manufacturing method claimed as claim 11 , wherein the ultraviolet curing is conducting an ultraviolet irradiation on the substrate from front and back sides of the substrate, respectively.

Assignees

Inventors

Classifications

  • Simultaneous exposure of the front side and the backside · CPC title

  • Methods for their manufacture, e.g. printing, electro-deposition or photolithography · CPC title

  • G03F7/0007Primary

    Filters, e.g. additive colour filters; Components for display devices · CPC title

  • of the already developed image · CPC title

  • in the form of arrays · CPC title

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What does patent US9760001B2 cover?
A manufacturing method of a color filter substrate includes: depositing a photoresist layer on a substrate, patterning the photoresist layer through exposure and development and executing an UV curing; or forming an overcoat whose material is a light-cured material on a substrate, conducting an UV irradiation on the substrate from front and back sides of the substrate, respectively; or, deposit…
Who is the assignee on this patent?
Boe Technology Group Co Ltd, Chengdu Boe Optoelect Tech Co
What technology area does this patent fall under?
Primary CPC classification G03F7/0007. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Sep 12 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).