Curable resin composition, cured product thereof, and semiconductor device using the same

US9758694B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9758694-B2
Application numberUS-201615006796-A
CountryUS
Kind codeB2
Filing dateJan 26, 2016
Priority dateJan 26, 2015
Publication dateSep 12, 2017
Grant dateSep 12, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

According to one aspect of the present invention, there is provided a curable resin composition including at least: a polysiloxane compound having, in a molecule thereof, at least two functional groups selected from the group consisting of silanol groups and alkoxysilyl groups as a component (A-1); and silica whose extract water has a pH of 6.1 or lower at 25° C. as a component (B), wherein the amount of the component (B) relative to the total amount of the components (A-1) and (B) is in a range of 70 to 97 mass %. This curable resin composition is able to, even when formed into various shapes and sizes, prevent foaming during curing and thus is suitable as an encapsulant material for a semiconductor element.

First claim

Opening claim text (preview).

What is claimed is: 1. A curable resin composition comprising at least: component (A-1): a polysiloxane compound having, in a molecule thereof, at least two functional groups selected from the group consisting of silanol groups and alkoxysilyl groups; and component (B): silica whose extract water has a pH of 6.1 or lower at 25° C., the extract water being obtained by stirring 10 g of the silica in 200 ml of purified water at 80±3° C. for 1 hour to provide a sample liquid, and then, cooling the sample liquid to room temperature, wherein the amount of the component (B) relative to the total amount of the components (A-1) and (B) is in a range of 70 to 97 mass %; and the total amount of silanol and alkoxysilyl groups in the component (A-1) is in a range of 1 to 15 mmol/g. 2. The curable resin composition according to claim 1 , wherein the polysiloxane compound contained as the component (A-1) has at least a structural unit of the general formula [1] [R 1 m SiO n/2 ]  [1] where R 1 each independently represents a hydrogen atom, a C 1 -C 10 linear alkyl group, a C 3 -C 10 branched alkyl group, a C 3 -C 10 cyclic alkyl group, a C 2 -C 10 linear alkenyl group, a C 3 -C 10 branched alkenyl group, a C 3 -C 10 cyclic alkenyl group or a C 5 -C 10 aryl group; a part or all of hydrogen atoms of the alkyl group, the alkenyl group or the aryl group may be substituted by a halogen atom; a part of carbon atoms of the alkyl group, the alkenyl group or the aryl group may be replaced by at least one kind selected from the group consisting of a nitrogen atom, an oxygen atom and a silicon atom; the halogen atom is at least one kind selected from the group consisting of a fluorine atom, a chlorine atom, a bromine atom and an iodine atom; when there are a plurality of R 1 , R 1 can be of the same kind or different kinds; an oxygen atom of the structural unit of the general formula [1] is a siloxane bond-forming oxygen atom or a hydroxyl oxygen atom; and m and n each independently represent an integer of 1 to 4 and satisfy a relationship of m+n=4. 3. The curable resin composition according to claim 2 , wherein R 1 is a C 1 -C 10 linear alkyl group, a C 3 -C 10 branched alkyl group, a C 3 -C 10 cyclic alkyl group or a C 5 -C 10 aryl group. 4. The curable resin composition according to claim 2 , wherein R 1 is a methyl group or a phenyl group. 5. The curable resin composition according to claim 2 , wherein the polysiloxane compound contained as the component (A-1) has the structural unit of the general formula [1] and a structural unit of the general formula [2] [SiO 4/2 ]  [2] where an oxygen atom of the structural unit of the general formula [2] is a siloxane bond-forming oxygen atom or a hydroxyl oxygen atom. 6. The curable resin composition according to claim 1 , wherein the component (B) contains two or more kinds of silica. 7. The curable resin composition according to claim 6 , wherein the two or more kinds of silica are selected from the group consisting of crystalline silica, natural fused silica, synthetic fused silica, deflagration silica, fumed silica, sol-gel silica, flame fused silica and precipitated silica. 8. The curable resin composition according to claim 1 , wherein the silica contained as the component (B) has a median particle size of 0.02 to 500 μm. 9. The curable resin composition according to claim 1 , wherein the silica contained as the component (B) shows a plurality of frequency peaks in particle size distribution analysis. 10. The curable resin composition according to claim 1 , wherein the silica contained as the component (B) includes silica particles having a particle size of 3 μm or smaller. 11. The curable resin composition according to claim 1 , wherein the silica contained as the component (B) is chemically unmodified. 12. The curable resin composition according to claim 1 , further comprising at least one kind selected from the group consisting of an inorganic filler, a heat-resistant resin, a mold release agent, a pigment, a flame retardant, a curing catalyst and an anti-blocking agent. 13. The curable resin composition according to claim 12 , further comprising a coupling agent. 14. The curable resin composition according to claim 1 , wherein the curable resin composition has a spiral flow length of 5 to 180 cm as determined according to Japan Electrical Insulating and Advanced Performance Materials Industrial Association Standard T901 under the conditions of a temperature of 180° C., a molding pressure of 6.9 MPa and a molding time of 3 minutes. 15. A method for preparing the curable resin composition according to claim 1 , comprising mixing the component (A-1) with the component (B) such that the amount of the component (B) relative to the total amount of the component (A-1) and the component (B) is in a range of 70 to 97 mass %. 16. The method for preparing the curable resin composition according to claim 15 , wherein the curable resin composition is prepared by mixing the component (A-1), the component (B) and at least one kind selected from the group consisting of an inorganic filler, a heat-resistant resin, a mold release agent, a pigment, a flame retardant, a curing catalyst and an anti-blocking agent. 17. The method for preparing the curable resin composition according to claim 15 , wherein the curable resin composition is prepared by mixing the component (A-1), the component (B), at least one kind selected from the group consisting of an inorganic filler, a heat-resistant resin, a mold release agent, a pigment, a flame retardant, a curing catalyst and an anti-blocking agent, and a coupling agent. 18. A tableted product of the curable resin composition according to claim 1 . 19. A cured product of the curable resin composition according to claim 1 . 20. The cured product according to claim 19 , wherein the cured product has a thickness of 1 mm or greater. 21. The cured product according to claim 19 , wherein the cured product has a thickness of 2 mm or greater. 22. The cured product according to claim 19 , wherein the cured product has a thickness of 4 mm or greater. 23. A semiconductor device comprising: a cured product of a curable resin composition; and at least a semiconductor element that is encapsulated by the cured product, the curable resin composition comprising at least: component (A-1): a polysiloxane compound having, in a molecule thereof, at least two functional groups selected from the group consisting of silanol groups and alkoxysilyl groups; and component (B): silica whose extract water has a pH of 6.1 or lower at 25° C., the extract water being obtained by stirring 10 g of the silica in 200 ml of purified water at 80±3° C. for 1 hour to provide a sample liquid, and then, cooling the sample liquid to room temperature, wherein the amount of the component (B) relative to the total amount of the components (A-1) and (B) is in a range of 70 to 97 mass %. 24. The semiconductor device according to claim 23 , wherein the semiconductor element is a power semiconductor element. 25. A method of encapsulating a semiconductor element, comprising: curing a curable resin composition, the curable resin composition comprising at least: component (A-1): a polysiloxane compound having, in a molecule thereof, at least two functional groups selected from the group consisting of silanol groups and alkoxysilyl groups; and component (B): silica whose extract w

Assignees

Inventors

Classifications

  • Die-attach connectors and bond wires · CPC title

  • between a chip and a stacked lead frame, conducting package substrate or heat sink · CPC title

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • by a substrate and the encapsulations · CPC title

  • Bumps or wires · CPC title

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What does patent US9758694B2 cover?
According to one aspect of the present invention, there is provided a curable resin composition including at least: a polysiloxane compound having, in a molecule thereof, at least two functional groups selected from the group consisting of silanol groups and alkoxysilyl groups as a component (A-1); and silica whose extract water has a pH of 6.1 or lower at 25° C. as a component (B), wherein the…
Who is the assignee on this patent?
Central Glass Co Ltd
What technology area does this patent fall under?
Primary CPC classification C09D183/04. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 12 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).