Inorganic passivation material, method for forming the same, and inorganic passivation protective film produced therefrom

Patent metadata

Field	Value
Publication number	US-9758624-B2
Application number	US-201414305354-A
Country	US
Kind code	B2
Filing date	Jun 16, 2014
Priority date	Dec 31, 2013
Publication date	Sep 12, 2017
Grant date	Sep 12, 2017

Abstract

A method for forming an inorganic passivation material is provided. The method includes mixing about 5 to 80 parts by weight of trialkoxysilane, about 10 to 80 parts by weight of tetraalkoxysilane, and about 1 to 30 parts by weight of catalyst to perform a reaction at pH of about 0.05 to 4 to form an inorganic resin material. The inorganic resin material is modified by phosphate ester to form an inorganic passivation material, wherein phosphate ester is about 0.1-10 parts by weight based on 100 parts by weight of the inorganic resin material. An inorganic passivation material and a passivation protective film produced therefrom are also provided.

First claim

What is claimed is:

1. A method for forming an inorganic passivation material, comprising:
mixing 5 to 80 parts by weight of tetraalkoxysilane, 10 to 80 parts by weight of trialkoxysilane, and 1 to 30 parts by weight of catalyst to perform a reaction at pH of 0.05 to 4, based on a total amount of the tetraalkoxysilane, the trialkoxysilane, and the catalyst, to form an inorganic resin material; and
modifying the inorganic resin material by phosphate ester to form an inorganic passivation material, wherein phosphate ester is 0.1 to 10 parts by weight based on 100 parts by weight of the inorganic resin material,
wherein the phosphate ester comprises phosphatosilane, phosphatosiloxane, phosphate titanium alkoxide, sulfhydryl hydrocarbyl phosphate, or a combination thereof,
wherein the phosphatosilane comprises

wherein each of R 3 is independently hydrogen, methyl, ethyl, propyl, or butyl.

2. The method for forming an inorganic passivation material as claimed in claim 1 , further comprising coating and curing the inorganic passivation material to form an inorganic passivation protective film.

3. The method for forming an inorganic passivation material as claimed in claim 1 , wherein the tetraalkoxysilane has the following formula:

wherein each of R 1 is independently C 1 to C 8 straight-chain alkyl group.

4. The method for forming an inorganic passivation material as claimed in claim 1 , wherein the trialkoxysilane has the following formula:

wherein each of R 2 is independently C 1 to C 8 straight-chain alkyl group; R 3 is hydrogen, substituted or unsubstituted C 1 to C 8 alkyl group, substituted or unsubstituted C 1 to C 8 alkenyl group, epoxy group, or amino group.

5. The method for forming an inorganic passivation material as claimed in claim 4 , wherein R 3 is a functional group containing a fluorine substituent.

6. The method for forming an inorganic passivation material as claimed in claim 1 , wherein the phosphate titanium alkoxide comprises

wherein each of R is independently hydrogen, methyl, ethyl, propyl, butyl, or isopropyl.

7. The method for forming an inorganic passivation material as claimed in claim 1 , wherein the sulfhydryl hydrocarbyl phosphate comprises

8. The method for forming an inorganic passivation coating material as claimed in claim 1 , wherein the catalyst comprises hydrochloric acid, nitric acid, acetic acid, sulfuric acid, or a combination thereof.

Assignees

• Ind Tech Res Inst

Inventors

• Tang wei-cheng
• Huang Yun-Shan
• Yu Ya-Tin
• Su Yi-Che
• Sheen Yuung-Ching
• Huang Yuan-Chang

Classifications

• C09D183/04 Primary

  Polysiloxanes · CPC title

• C09D183/08

  containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen · CPC title

• C08G77/30

  phosphorus-containing groups · CPC title

• C09D183/06

  containing silicon bound to oxygen-containing groups (C09D183/12 takes precedence) · CPC title

• C08G77/395 Primary

  containing phosphorus · CPC title