Compound, resin, resist composition and method for producing resist pattern

Patent metadata

Field	Value
Publication number	US-9758466-B2
Application number	US-201514835344-A
Country	US
Kind code	B2
Filing date	Aug 25, 2015
Priority date	Aug 25, 2014
Publication date	Sep 12, 2017
Grant date	Sep 12, 2017

Abstract

A compound having a group represented by formula (Ia):

wherein R 1 and R 2 each independently represent a C 1 to C 8 fluorinated alkyl group, ring W represents a C 5 to C 18 alicyclic hydrocarbon group that may have a substituent, and * represents a binding site.

First claim

The invention claimed is:

1. A resin consisting of a structural unit derived from a compound having a group of formula (Ia), or consisting of
the structural unit derived from the compound having the group of formula (Ia)
and a structural unit not having an acid-labile group; and
wherein the compound of formula (Ia) is:

wherein R 1 and R 2 each independently represent a C 1 to C 8 fluorinated alkyl group,
ring W represents a C 5 to C 18 alicyclic hydrocarbon group that may have a substituent, and
* represents a binding site.

2. The resin according to claim 1 ,
which comprises 50% by mole or more of the structural unit derived from the compound having the group of formula (Ia) with respect to the total structural units of the resin.

3. The resin according to claim 1 ,
which consists of the structural unit derived from the compound having the group of formula (Ia) with respect to a total structural units of the resin.

4. A resist composition comprising
the resin of claim 1 ,
a resin including a structural unit having an acid-labile group, and
an acid generator.

5. A method for producing a resist pattern comprising steps (1) to (5);
(1) applying the resist composition according to claim 4 onto a substrate;
(2) drying the applied composition to form a composition layer;
(3) exposing the composition layer;
(4) heating the exposed composition layer, and
(5) developing the heated composition layer.

Assignees

• Sumitomo Chemical Co

Inventors

• Ochiai Mitsuyoshi
• Shimada Masahiko
• Ichikawa Koji

Classifications

• C07C2602/42

  the bicyclo ring system containing seven carbon atoms · CPC title

• C07C2603/74

  Adamantanes · CPC title

• C07C2603/14

  Benz[f]indenes; Hydrogenated benz[f]indenes · CPC title

• C07C2601/14

  The ring being saturated · CPC title

• G03F7/0397

  the macromolecular compound having an alicyclic moiety in a side chain · CPC title