Apparatus and method for measuring surface topography optically
US-2017027670-A1 · Feb 2, 2017 · US
US9752867B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9752867-B2 |
| Application number | US-201514980337-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 28, 2015 |
| Priority date | Jul 3, 2014 |
| Publication date | Sep 5, 2017 |
| Grant date | Sep 5, 2017 |
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A system for determining surface topography of a three-dimensional structure is provided. The system can include an illumination unit configured to output a two-dimensional array of light beams each comprising a plurality of wavelengths. An optical assembly can focus the plurality of wavelengths of each light beam to a plurality of focal lengths so as to simultaneously illuminate the structure over a two-dimensional field of view. A detector and a processor are used to generate data representative of the surface topography of the three-dimensional structure based on the measured characteristics of the light reflected from the structure.
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What is claimed is: 1. A system for measuring surface topography of a three-dimensional structure, the system comprising: an illumination unit configured to output a two-dimensional array of light beams each comprising a plurality of wavelengths; an optical assembly operatively coupled to the illumination unit and configured to focus the plurality of wavelengths of each light beam to a plurality of focal lengths relative to the optical assembly so as to simultaneously illuminate the three-dimensional structure over a two-dimensional field of view, wherein the plurality of focal lengths is fixed relative to the optical assembly during the measuring of the surface topography; and a detector configured to measure a characteristic of light reflected from the three-dimensional structure for each of a plurality of locations distributed in two dimensions over the two-dimensional field of view. 2. The system of claim 1 , wherein the characteristic comprises an intensity. 3. The system of claim 1 , wherein the plurality of wavelengths comprises wavelengths from 400 nm to 800 nm. 4. The system of claim 1 , wherein the plurality of wavelengths comprises at least three spectral bands, and wherein the at least three spectral bands comprise overlapping wavelengths of light. 5. The system of claim 1 , wherein the plurality of wavelengths comprises a continuous spectrum of wavelengths. 6. The system of claim 1 , wherein the two-dimensional array of light beams forms a two-dimensional array of spots on the three-dimensional structure over the two-dimensional field of view, and wherein a ratio of pitch to spot size for the two-dimensional array of spots is configured to inhibit cross-talk between the two-dimensional array of spots. 7. The system of claim 1 , wherein the optical assembly is configured to focus the light beams of the two-dimensional array to the plurality of focal lengths using at least one optical component with longitudinal chromatic aberration. 8. The system of claim 1 , wherein the plurality of focal lengths covers a depth of at least 20 mm. 9. The system of claim 2 , wherein the detector comprises a plurality of sensor elements distributed over a surface area configured to receive the light reflected from the three-dimensional structure over the two-dimensional field of view. 10. The system of claim 9 , wherein each sensor element of the plurality of sensor elements is configured to measure the intensity of at least one wavelength of the light reflected from the three-dimensional structure. 11. The system of claim 10 , wherein the plurality of sensor elements comprises a plurality of red sensor elements, a plurality of green sensor elements, and a plurality of blue sensor elements; each of the plurality of red sensor elements being configured to measure the intensity of a red light wavelength, each of the plurality of green sensor elements being configured to measure the intensity of a green light wavelength, and each of the plurality of blue sensor elements being configured to measure the intensity of a blue light wavelength. 12. The system of claim 11 , wherein the plurality of sensor elements are arranged in a Bayer pattern or in a plurality of layers. 13. The system of claim 1 , wherein the optical assembly is configured to focus the plurality of wavelengths to the plurality of focal lengths to a depth within a range from 10 mm to 30 mm relative to the optical assembly without relative movement of components of the optical assembly and components of the illumination unit. 14. A method for measuring surface topography of a three-dimensional structure, the method comprising: generating a two-dimensional array of light beams each comprising a plurality of wavelengths; focusing the plurality of wavelengths of each light beam to a plurality of focal lengths relative to the three-dimensional structure so as to simultaneously illuminate the three-dimensional structure over a two-dimensional field of view, wherein the plurality of focal lengths is fixed relative to the optical assembly during the measuring of the surface topography; and measuring a characteristic of light reflected from the three-dimensional structure for each of a plurality of locations distributed in two dimensions over the two-dimensional field of view. 15. The method of claim 14 , wherein the characteristic comprises an intensity. 16. The method of claim 14 , wherein the plurality of wavelengths comprises wavelengths from 400 nm to 800 nm. 17. The method of claim 14 , wherein the plurality of wavelengths comprises at least three spectral bands, and wherein the at least three spectral bands comprise overlapping wavelengths of light. 18. The method of claim 14 , wherein the plurality of wavelengths comprises a continuous spectrum of wavelengths. 19. The method of claim 14 , wherein the two-dimensional array of light beams forms a two-dimensional array of spots on the structure over the two-dimensional field of view, and wherein a ratio of pitch to spot size for the two-dimensional array of spots is selected to inhibit cross-talk between the two-dimensional array of spots. 20. The method of claim 14 , wherein the light beams of the two-dimensional array are focused to the plurality of focal lengths using at least one optical component with longitudinal chromatic aberration. 21. The method of claim 14 , wherein the plurality of focal lengths covers a depth of at least 20 mm. 22. The method of claim 15 , wherein the intensity of the light reflected from the three-dimensional structure is measured using a detector comprising a plurality of sensor elements distributed over a surface area configured to receive the light reflected from the three-dimensional structure over the two-dimensional field of view. 23. The method of claim 22 , wherein each sensor element of the plurality of sensor elements is configured to measure the intensity of at least one wavelength of the light reflected from the three-dimensional structure. 24. The method of claim 23 , wherein the plurality of sensor elements comprises a plurality of red sensor elements, a plurality of green sensor elements, and a plurality of blue sensor elements; each of the plurality of red sensor elements being configured to measure the intensity of a red light wavelength, each of the plurality of green sensor elements being configured to measure the intensity of a green light wavelenath, and each of the plurality of blue sensor elements being configured to measure the intensity of a blue light wavelength. 25. The method of claim 24 , wherein the plurality of sensor elements are arranged in a Bayer pattern or in a plurality of layers. 26. The method of claim 14 , wherein the focusing of the plurality of wavelengths to the plurality of focal lengths to a depth within a range from 10 mm to 30 mm is performed without relative movement of components of an optical assembly and components of an illumination unit.
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