Method for applying and exposing coating or ink compositions on substrates to radiation and the product thereof

US9751332B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9751332-B2
Application numberUS-201113993858-A
CountryUS
Kind codeB2
Filing dateDec 13, 2011
Priority dateDec 13, 2010
Publication dateSep 5, 2017
Grant dateSep 5, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention describes a two-sided radiation exposure method including a step of applying a coating or ink composition on a surface of a nonporous substrate. The applied coating or ink composition surface of the nonporous substrate is exposed to radiation one or more times. In addition, a non-applied surface of the nonporous substrate is exposed to radiation one or more times. The two-sided radiation exposure method improves adhesion and/or curing properties of the coating or ink composition applied on the nonporous substrate. The present invention also describes a radiation exposed, nonporous substrate with a coating or ink composition applied on a surface thereof produced by the steps of the above-mentioned method.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for applying a coating or ink composition on a nonporous substrate comprising: applying said coating or ink composition onto a first surface of said nonporous substrate; exposing said applied first surface of said nonporous substrate to radiation one or more times; and exposing a second surface of said nonporous substrate to radiation one or more times; wherein said nonporous substrate is an unprimed or non-chemically treated substrate. 2. The method according to claim 1 , wherein said applied first surface is exposed to radiation before said second surface. 3. The method according to claim 1 , wherein said second surface is exposed to radiation before said applied first surface. 4. The method according to claim 3 , wherein said composition has less than 2,000 ppb of extractable monomers from a surface area of 51 cm when immersed in 30 ml of a food simulant liquid after both said first and second surfaces are exposed to actinic radiation. 5. The method according to claim 1 , wherein said applied first surface is subject to less aggregate exposure of radiation than said second surface. 6. The method according to claim 1 , wherein said nonporous substrate is transparent or semi-transparent. 7. The method according to claim 1 , wherein said nonporous substrate is selected from: polypropylene, polyethylene, polyethylene terephthalate, polyethylene terephthalate glycol, polyvinyl chloride or mixtures thereof. 8. The method according to claim 1 , wherein said ink composition is an energy-curable ink. 9. The method according to claim 8 , wherein said energy-curable ink comprises one or more thermoplastic acrylic inert resins. 10. The method according to claim 1 , wherein greater than or equal to about 95% of said coating or ink composition adheres to said substrate after both said first and second are exposed to radiation. 11. The method according to claim 10 , wherein greater than or equal to about 99% of said coating or ink composition adheres to said substrate. 12. The method according to claim 11 , wherein greater than or equal to about 99.99% of said coating or ink composition adheres to said substrate. 13. A radiation exposed, nonporous substrate with a coating or ink composition applied thereon produced by the steps: applying said composition onto a first surface of said nonporous substrate; exposing said applied first surface of said nonporous substrate to radiation one or more times; and exposing a second surface of said nonporous substrate to radiation one or more times; wherein said nonporous substrate is an unprimed or non-chemically treated substrate. 14. The radiation exposed, nonporous substrate according to claim 13 , wherein said applied first surface is exposed to radiation before said second surface. 15. The radiation exposed, nonporous substrate according to claim 14 , wherein said second surface is exposed to radiation before said applied first surface. 16. The radiation exposed, nonporous substrate according to claim 15 , wherein said composition has less than 2,000 ppb of extractable monomers from a surface area of 51 cm when immersed in 30 ml of a food simulant liquid. 17. The radiation exposed, nonporous substrate according to claim 13 , wherein said applied first surface is subject to less aggregate exposure of radiation than said second surface. 18. The radiation exposed, nonporous substrate according to claim 13 , wherein said nonporous substrate is transparent or semi-transparent. 19. The radiation exposed, nonporous substrate according to claim 13 , wherein said nonporous substrate is selected from: polypropylene, polyethylene, polyethylene terephthalate, polyethylene terephthalate glycol, polyvinyl chloride or mixtures thereof. 20. The radiation exposed, nonporous substrate according to claim 13 , wherein said composition is an energy-curable ink. 21. The radiation exposed, nonporous substrate according to claim 13 , wherein said energy-curable ink comprises one or more thermoplastic acrylic inert resins. 22. The radiation exposed, nonporous substrate according to claim 13 , wherein greater than or equal to about 95% of said composition adheres to said substrate after both said first and second surfaces are exposed to radiation. 23. The radiation exposed, nonporous substrate according to claim 22 , wherein greater than or equal to about 99% of said composition adheres to said substrate. 24. The radiation exposed, nonporous substrate according to claim 23 , wherein greater than or equal to about 99.99% of said composition adheres to said substrate. 25. Packaging materials selected from plastic materials, food-grade materials, cosmetic materials, industrial coating materials and pharmaceutical materials comprising the radiation exposed nonporous substrate according to claim 13 .

Assignees

Inventors

Classifications

  • Curing or cross-linking the coating · CPC title

  • After-treatment · CPC title

  • using UV radiation · CPC title

  • B05D5/10Primary

    to obtain an adhesive surface · CPC title

  • using thermal means, e.g. infrared radiation, heat · CPC title

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What does patent US9751332B2 cover?
The present invention describes a two-sided radiation exposure method including a step of applying a coating or ink composition on a surface of a nonporous substrate. The applied coating or ink composition surface of the nonporous substrate is exposed to radiation one or more times. In addition, a non-applied surface of the nonporous substrate is exposed to radiation one or more times. The two-…
Who is the assignee on this patent?
Zhang Yuemei, Adhikari Prasad K, Sun Chemical Corp
What technology area does this patent fall under?
Primary CPC classification B05D5/10. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Sep 05 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).