Treatment apparatus using high frequency waves and method for controlling same

Patent metadata

Field	Value
Publication number	US-9744371-B2
Application number	US-201615167467-A
Country	US
Kind code	B2
Filing date	May 27, 2016
Priority date	Jul 26, 2011
Publication date	Aug 29, 2017
Grant date	Aug 29, 2017

Abstract

The present invention relates to a treatment apparatus using high frequency waves, and to a method for controlling same. The treatment apparatus using high frequency waves comprises: a high frequency wave generating unit; a plurality of needles for providing, into the skin of a user, high frequency energy transferred from the high frequency wave generating unit; and a driving unit for inserting the plurality of needles into the skin of the user, wherein the apparatus further comprises a control unit for controlling the driving unit such that the plurality of needles are inserted into a first target point within the skin and then move to a second target point.

First claim

What is claimed is:

1. A treatment method using RF treatment apparatus, the treatment method comprising:
inserting a plurality of needles to a first depth in a subcutaneous area;
providing RF energy to the first depth of the subcutaneous area through ends of the plurality of needles;
terminating RF energy delivery to the first depth;
locating the ends of the plurality of needles to a second depth in the subcutaneous area; and,
providing RF energy to the second depth of the subcutaneous area through the ends of the plurality of needles.

2. The treatment method of claim 1 , wherein the first depth is located deeper from a skin surface than the second depth.

3. The treatment method of claim 2 , wherein the first depth is located deeper by not less than 0.1 mm and not more than 3 mm than the second depth.

4. The treatment method of claim 1 , wherein in the step for providing RF energy to the first depth the ends of the plurality of needles are stationary at the first depth and RF energy is provided for a predetermined first time, and
wherein in the step for provided RF energy to the second depth the end of the plurality of needles are stationary at the second depth and RF energy is provided for a predetermined second time.

5. The treatment method of claim 4 , wherein the predetermined first time and the predetermined second time are not less than 0.001 secs and not more than 2 secs.

6. The treatment method of claim 1 , wherein electrodes for providing RF energy into the subcutaneous area are provided at the ends of the plurality of needles, and surfaces of portions other than the ends are formed of an insulating material.

7. The treatment method of claim 1 , wherein a length of portions for providing RF energy are not less than 1 mm from the ends of the needles.

8. The treatment method of claim 1 , the treatment method further comprising a step for resting for a predetermined period without providing RF energy into the subcutaneous area between the step for providing RF energy to the first depth and the step for providing RF energy to the second depth.

9. The treatment method of claim 1 , wherein during the step for providing RF energy to the first depth or the step for providing RF energy to the second depth, the impedance of a portion where the ends of the plurality of the needle are located is measured and parameters of RF energy are controlled based on the measured impedance.

10. The treatment method of claim 1 , wherein in the step for inserting the plurality of needles to the first depth, the end of the plurality of needles are inserted into a portion deeper than the first depth, and moved back to the first depth.

11. A treatment method for treating skin tissue by inserting a plurality needles including at least one electrode into a subcutaneous area and providing RF energy through the electrode, the treatment method comprising:
providing RF energy at a first depth of the subcutaneous area;
terminating a treatment for the first depth by stopping providing RF energy to the first depth; and
providing RF energy at a second depth of the subcutaneous area.

12. The treatment method of claim 11 , wherein the first depth is located deeper from a skin surface than the second depth.

13. The treatment method of claim 12 , wherein the first depth is located deeper by not less than 0.1 mm and not more than 3 mm than the second depth.

14. The treatment method of claim 11 , the treatment method further comprising a step for resting for a predetermined period without providing RF energy into the subcutaneous area between the step for providing RF energy to the first depth and the step for providing RF energy to the second depth.

15. The treatment method of claim 11 , wherein electrodes for providing RF energy into the subcutaneous area are provided at the ends of the plurality of needles, and surfaces of portions other than the ends are formed of an insulating material.

Assignees

• Lutronic Corp

Inventors

• Ko Kwang Chon

Classifications

• A61B5/6848

  Needles · CPC title

• A61B5/0531

  Measuring skin impedance · CPC title

• A61H2039/005

  by means of electromagnetic waves, e.g. I.R., U.V. rays · CPC title

• A61H2230/655

  used as a control parameter for the apparatus · CPC title

• A61B18/1477

  Needle-like probes · CPC title