Method for doping an active Hall effect region of a Hall effect device and Hall effect device having a doped active Hall effect region

Patent metadata

Field	Value
Publication number	US-9741925-B2
Application number	US-201615069370-A
Country	US
Kind code	B2
Filing date	Mar 14, 2016
Priority date	Mar 13, 2015
Publication date	Aug 22, 2017
Grant date	Aug 22, 2017

Abstract

Methods for doping an active Hall effect region of a Hall effect device in a semiconductor substrate, and Hall effect devices having a doped active Hall effect region are provided. A method includes forming a first doping profile of a first doping type in a first depth region of the active Hall effect region by means of a first implantation with a first implantation energy level, forming a second doping profile of the first doping type in a second depth region of the active Hall effect region by means of a second implantation with a second implantation energy level, and forming an overall doping profile of the active Hall effect region by annealing the semiconductor substrate with the active Hall effect region having the first and the second doping profile.

First claim

What is claimed is:

1. A Hall effect device, comprising:
an active Hall effect region provided in a semiconductor substrate, wherein the active Hall effect region comprises a first doping profile of a first doping type in a first depth region of the active Hall effect region, and a second doping profile of the first doping type in a second depth region of the active Hall effect region,
wherein the second doping profile partially superimposes the first doping profile.

2. The Hall effect device according to claim 1 , wherein the active Hall effect region comprises a third doping profile of the first doping type in a third depth region of the active Hall effect region, wherein the third doping profile superimposes the second doping profile.

3. The Hall effect device according to claim 1 , wherein an overall doping profile of the active Hall effect region has, within a tolerance range, a constant doping concentration of the first doping type in a depth direction from a surface of a semiconductor substrate into the semiconductor substrate up to an isolation region of a second doping type.

4. The Hall effect device according to claim 1 , wherein an overall doping profile of the active Hall effect region has, within a tolerance range, a constant doping concentration of the first doping type from a surface of the semiconductor substrate through the second depth region to a middle portion of the first depth region and decreases from the middle portion of the first depth region up to an isolation region of a second doping type.

5. The Hall effect device according to claim 1 , wherein an overall doping profile of the active Hall effect region has a doping concentration which increases from a surface of the semiconductor substrate up to a middle portion of the second depth region of the active Hall effect region and has, within a tolerance range, a constant doping concentration of the first doping type from the middle portion of the second depth region through the first depth region up to an isolation region of a second doping type in the semiconductor substrate.

6. The Hall effect device according to claim 1 , wherein an overall doping profile of the active Hall effect region has a first doping concentration which increases from a surface of the semiconductor substrate up to a middle portion of the second depth region of the active Hall effect region and reaches, within a tolerance range, a maximum doping concentration of the first doping type in the middle portion of the second depth region and decreases from the middle portion of the second depth region up to a middle region between the first and the second depth region, and
wherein the overall doping profile of the active Hall effect region has a second doping concentration which increases from the middle region between the first and the second depth region to a middle portion of the first depth region and reaches, within a tolerance range, the maximum doping concentration of the first doping type in the middle portion of the first depth region and decreases from the middle portion of the second depth region up to the isolation region of a second doping type.

7. The Hall effect device according to claim 1 , wherein the first doping profile extends in a depth direction from a surface of the semiconductor substrate up to a first intermediary portion of the active Hall effect region.

8. The Hall effect device according to claim 1 , wherein the second doping profile extends in the depth direction from a first intermediary portion of the active Hall effect region up to an isolation region of a second doping type.

9. The Hall effect device according to claim 1 , wherein the second doping profile extends in the depth direction from a first intermediary portion of the active Hall effect region up to a second intermediary portion of the active Hall effect region.

10. The Hall effect device according to claim 9 , further comprising:
a third doping profile of the first doping type in a third depth region of the active Hall effect region, wherein the third doping profile extends in the depth direction from the second intermediary portion of the active Hall effect region up to a third intermediary portion of the active Hall effect region.

11. The Hall effect device according to claim 10 , further comprising:
a fourth doping profile of the first doping type in a fourth depth region of the active Hall effect region, wherein the fourth doping profile extends in the depth direction from the third intermediary portion of the active Hall effect region up to at least a fourth intermediary portion of the active Hall effect region.

12. The Hall effect device according to claim 11 , wherein the fourth doping profile extends in the depth direction up to an isolation region of a second doping type.

13. The Hall effect device according to claim 9 , further comprising:
a third doping profile of the first doping type in a third depth region of the active Hall effect region, wherein the third doping profile extends in the depth direction from the second intermediary portion of the active Hall effect region up to at least a third intermediary portion of the active Hall effect region.

14. The Hall effect device according to claim 13 , wherein the third doping profile extends in the depth direction up to an isolation region of a second doping type.

15. The Hall effect device according to claim 9 , further comprising:
a third doping profile of the first doping type in a third depth region of the active Hall effect region, wherein the third doping profile extends in the depth direction from another intermediary portion of the active Hall effect region up to at least a third intermediary portion of the active Hall effect region.

16. The Hall effect device according to claim 15 , wherein the third doping profile extends in the depth direction up to an isolation region of a second doping type.

17. The Hall effect device according to claim 1 , wherein an overall doping profile of the active Hall effect region has, within a tolerance range, a constant doping concentration of the first doping type in a depth direction at upper region and a lower region of semiconductor substrate, and a reduced doping concentration of the first doping type at a middle region of the semiconductor substrate, wherein the reduced doping concentration is less than the constant doping concentration.

18. The Hall effect device according to claim 1 , wherein an overall doping profile of the active Hall effect region has, within a tolerance range, a constant doping concentration of the first doping type in a depth direction at upper region, a middle region and a lower region of semiconductor substrate, and a first reduced doping concentration of the first doping type at a first region of the semiconductor substrate between the upper region and the middle region, and a second reduced doping concentration of the first doping type at a second region of the semiconductor substrate between the middle region and the lower region, wherein the first and the second reduced doping concentrations are less than the constant doping concentration.

19. The Hall effect device according to claim 1 , wherein:
the first doping profile extends in a depth direction from a surface of the semiconductor substrate up to a first intermediary portion of the active Hall effect region, and
the second doping profile extends in the depth direction from the first intermediary portion of the active Hall effect region up to an isolation region of a second doping type.

20. The

Assignees

• Infineon Technologies Ag

Inventors

• Eckinger Markus
• Kolb Stefan

Classifications

• G01R33/0052

  Manufacturing aspects; Manufacturing of single devices, i.e. of semiconductor magnetic sensor chips (devices based on galvano-magnetic effect or the like H10N50/85) · CPC title

• G01R33/07 Primary

  Hall effect devices · CPC title

• H01L43/04 Primary

  Electricity · mapped topic

• H01L43/065

  Electricity · mapped topic

• H01L43/14

  Electricity · mapped topic