Arrangement in a thermal process, and a method for measuring the thickness of a contamination layer

Patent metadata

Field	Value
Publication number	US-9739547-B2
Application number	US-201314649542-A
Country	US
Kind code	B2
Filing date	Nov 25, 2013
Priority date	Dec 5, 2012
Publication date	Aug 22, 2017
Grant date	Aug 22, 2017

Abstract

An arrangement of a thermal device and a surface reflecting and/or scattering electromagnetic radiation in the inner part of the thermal device. A source of electromagnetic radiation is arranged at a first distance (L 1 ) from the surface, and a detector of electromagnetic radiation is arranged at a second distance (L 2 ) from the surface. The source is configured to emit radiation to the surface, which is reflected and/or scattered from the surface as reflected radiation. The detector receives reflected radiation; and the processing unit determines data dependent on the first and/or second distance by the emitted and reflected radiation. A wall of the thermal device has a window or aperture for emitting an optical signal from the light source to the surface. An electromagnetic distance measurement device measures the thickness or the increase in the thickness of a contamination layer from a thermal device.

First claim

The invention claimed is:

1. An arrangement comprising:
a thermal device selected from the group consisting of: a boiler, a gasification reactor, a pyrolysis reactor, and a torrefaction reactor, having walls which enclose inner parts of the thermal device;
an inner surface of the thermal device which has the property of at least one of reflecting and scattering electromagnetic radiation;
a laser source for producing an electromagnetic radiation signal directed at the inner surface, the laser source outside the thermal device arranged at a first distance from said surface;
a detector of electromagnetic radiation arranged at a second distance from said inner surface and in electromagnetic radiation receiving relation to receive reflected electromagnetic radiation from said inner surface;
a window or an aperture configured to transmit an electromagnetic radiation signal from the laser source to said inner surface;
an extending pipe positioned so that the electromagnetic radiation signal from the laser source passes through the pipe;
a source of protective gas connected to the pipe to supply protective gas to the pipe;
a processing unit connected to the detector to determine a distance between said inner surface and the detector to determine a first length, and to periodically compare said first length to a second length produced by repeating the determination of the distance between said inner surface and the detector, to measure a growth in contamination on the inner surface;
a cleaning device for cleaning the inner surface of the thermal device;
a control device for controlling said cleaning device, connected to the processing unit in data receiving relation to operate the cleaning device when the inner surface has a selected thickness of contamination on the inner surface.

2. The arrangement according to claim 1 , wherein
the laser source is configured to emit light at least at a wavelength between 300 nm and 800 nm; and
the detector of electromagnetic radiation is configured to receive reflected light having said wavelength.

3. The arrangement according to claim 1 , wherein the processing unit is configured to determine the thickness of the contamination layer in such a way that said inner surface is a surface of said contamination layer.

4. The arrangement according to claim 1 , wherein the laser source is configured to be at least one of movable, and turnable in relation to the inner surface.

5. A method for measuring a thickness of a contamination layer or an increase in the thickness of the contamination layer in a thermal device, wherein the thermal device is a boiler, a gasification reactor, a pyrolysis reactor, or a torrefaction reactor, the thermal device comprises walls enclosing inner parts of the thermal device, and an inner surface is arranged in the inner part of the thermal device, wherein at least one of the walls of the thermal device further comprises a window or an aperture configured to transmit an electromagnetic signal from said laser source to said surface, and an extending pipe positioned so that the electromagnetic radiation signal from the laser source passes through the pipe the method comprising the steps of:
supplying protective gas to said pipe;
emitting electromagnetic radiation from a laser source to the surface so that electromagnetic radiation is at least one of reflected and scattered in the form of reflected electromagnetic radiation from said inner surface, the laser source being arranged at a first distance from said surface and outside the thermal device;
receiving said reflected electromagnetic radiation by a detector of electromagnetic radiation, the detector of electromagnetic radiation being arranged at a second distance from said surface;
determining a first length, during a first period of time, with the emitted electromagnetic radiation and reflected electromagnetic radiation, a first data dependent on at least one of the first and the second distance, and by uses of said first data;
determining a second length, during a second period of time, with the emitted electromagnetic radiation and reflected electromagnetic radiation, a second data dependent on at least one of the first and the second distance, and by uses of said second data;
determining from the first length and the second length, the increase in the thickness of the contamination layer or the thickness of the contamination layer by using the first length as an initial reference length;
comparing the increase in the thickness or the thickness of the contamination layer to a limit value; and
cleaning the inner surface when the increase in the thickness or the thickness of the contamination layer exceeds the limit value.

6. The method of claim 5 further comprising using an electromagnetic radiation distance measurement instrument during the operation of the thermal device.

7. The method according to claim 5 , wherein the emitting electromagnetic radiation is at a wavelength between 300 nm and 800 nm, and receiving electromagnetic radiation having said wavelength.

8. The method according to claim 5 , wherein said inner surface is a surface of a contamination layer, the contamination layer being arranged on a surface of a wall in the inner part of the thermal device.

9. The method according to claim 5 , wherein the step of determining from the first length and the second length, the increase in the thickness or the thickness of the contamination layer are statistically determined over several periods of time.

10. The method according to claim 9 , wherein said several periods of time cover a time span of least 30 seconds.

Assignees

• Valmet Technologies Oy

Inventors

• Maunula Joni

Classifications

• F28G15/003 Primary

  Control arrangements · CPC title

• F23M11/042

  Viewing ports of windows · CPC title

• G01B11/0616

  of coating · CPC title

• G01B11/0625

  with measurement of absorption or reflection · CPC title

• F23J3/023 Primary

  cleaning the fireside of watertubes in boilers · CPC title