Method for the preparation of silanes

US9738532B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9738532-B2
Application numberUS-201414782247-A
CountryUS
Kind codeB2
Filing dateFeb 28, 2014
Priority dateApr 24, 2013
Publication dateAug 22, 2017
Grant dateAug 22, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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The invention relates to a process for preparing dimeric and/or trimeric silanes by conversion of monosilane in a plasma and to a plant for performance of the process.

First claim

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The invention claimed is: 1. A process for preparing a dimeric and/or trimeric silane of the general formula I: wherein n=0 or 1, comprising: i) subjecting a reactant stream comprising monosilane of the general formula II and hydrogen, ii) to a gas discharge, and iii) obtaining the dimeric and/or trimeric silane of the formula I from a resulting phase, and setting a defined ratio of a partial hydrogen pressure to a partial pressure of a silane which is gaseous under a condition selected in the resulting phase; wherein the defined ratio in process step iii) of the partial hydrogen pressure to the partial pressure of the gaseous silanes is set by a hydrogen-permeable membrane. 2. The process according to claim 1 , wherein the pressure in process step iii) is elevated relative to the pressure in process stage ii). 3. The process according to claim 1 , wherein the resulting phase in process step iii) has a pressure of 1 bar ab to 100 bar abs . 4. The process according to claim 1 , wherein the monosilane in process step ii) is subjected to the gas discharge in the presence of hydrogen at a pressure between 0.05 mbar abs and 15,000 mbar abs . 5. The process according to claim 1 , wherein the gas discharge in process step ii) is effected at a pressure between 0.1 mbar abs and 1,000 mbar abs . 6. The process according to claim 1 , wherein the gas discharge in process step ii) is effected at a temperature between −60° C. and 10° C. 7. The process according to claim 1 , wherein the reactant stream has a defined ratio of hydrogen and monosilane in percent by volume (% by vol.) of 15:1 to 1:5. 8. The process according to claim 1 , wherein the reactant stream in step ii) is exposed to a nonthermal plasma. 9. The process according to claim 1 , wherein the membrane is permeable to hydrogen and essentially impermeable to silanes. 10. The process according to claim 1 , wherein said membrane comprises at least one of the following materials: quartz, metal, metallic alloy, ceramic, zeolite, organic polymer and/or a composite membrane having an at least two-layer structure comprising one or more of the aforementioned materials. 11. The process according to claim 1 , wherein the dimeric silane is obtained. 12. The process according to claim 1 , wherein the trimeric silane is obtained. 13. The process according to claim 1 , wherein a mixture of the dimeric and the trimeric silanes is obtained.

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What does patent US9738532B2 cover?
The invention relates to a process for preparing dimeric and/or trimeric silanes by conversion of monosilane in a plasma and to a plant for performance of the process.
Who is the assignee on this patent?
Lang Juergen Erwin, Rauleder Hartwig, Mueh Ekkehard, and 1 more
What technology area does this patent fall under?
Primary CPC classification C01B33/04. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 22 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).