Methods of Forming Buried Junction Devices in Silicon Carbide Using Ion Implant Channeling and Silicon Carbide Devices Including Buried Junctions
US-2015028351-A1 · Jan 29, 2015 · US
US9735769B1 · US · B1
| Field | Value |
|---|---|
| Publication number | US-9735769-B1 |
| Application number | US-201514873680-A |
| Country | US |
| Kind code | B1 |
| Filing date | Oct 2, 2015 |
| Priority date | Oct 2, 2015 |
| Publication date | Aug 15, 2017 |
| Grant date | Aug 15, 2017 |
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Systems and methods for controlling current or mitigating electromagnetic or radiation interference effects using multiple different semi-conductive channel regions generating structures formed by multiple different semi-conductive electrical current or voltage control structures. One embodiment includes providing a first and second metal oxide semiconductor field effect transistor (MOSFET) sections formed on opposite sides of a metal-semiconductor field effect transistor (MESFET) such that operation of the MESFET modulates or controls current otherwise controlled by an electrical path of the MOSFET sections. A control system for determining when an embodiment of the invention is to be operated is also provided to include automated systems including sensors as well as manually operated systems. Automated systems can include radiation sensors as well as other control systems such as high voltage radio frequency transmitter or receiver systems. Methods of operation for a variety of modes are also provided.
Opening claim text (preview).
The invention claimed is: 1. An electrical system comprising: a substrate formed having a first, second, and third section, wherein said first and third section are located on opposing sides of said second section; a first and second metal oxide semi-conductor field effect transistor (MOSFET) sections each respectively disposed in said first and third substrate sections, each MOSFET section comprising a body region formed into said substrate section, a source region formed inside said body region, a drain region formed by said substrate, a gate insulator region formed between and overlapping a portion of said source region and substrate covering a portion of said body region, a control gate formed and covering said gate insulator region and a MOSFET semi-conductive channel region (SCR) having first, second, and third SCR sides in close proximity to said gate insulator, where said first and second SCR sides are opposing sides and said third SCR side is orthogonal to said first and second SCR sides, where said first and second SCR sides form inside said body region between said source region adjacent to said first SCR side and said drain region adjacent to said second SCR side, where said control gate is adjacent to said third SCR side; and a metal-semiconductor field effect transistor (MESFET) section disposed onto said second substrate section in between said first and second substrate sections but not in contact with said first and second MOSFETs, said MESFET section comprising a MESFET control gate and a MESFET SCR where said MESFET SCR is in close proximity to second side of said MOSFET SCR, where said MESFET control gate comprising a metal or silicide, where said MESFET control gate is not in contact with said MOSFET body region or MOSFET control gate, where said MESFET control gate is positioned at a distance from said MOSFET body region, where said placement determines a distance that an electromagnetic field generated by said MESFET control gate must travel to traverse said MESFET SCR. 2. An electrical system as in claim 1 , further comprising a control system for determining when said MESFET and said first or second MOSFET sections are to be operated comprising an automated system including sensors as well as a control section, wherein said automated system can include radiation sensors. 3. An electrical system as in claim 2 , wherein said control systems can comprise a high-voltage radiofrequency transmitter or receiver systems. 4. The electrical system as in claim 1 , further comprising a plurality of alternating current (AC) voltage sources each one coupled to said first and second MOSFET sections and said MESFET. 5. An electrical system as in claim 2 , further comprising a control system operable to modulate said plurality of alternating-current (AC) voltage sources to generate a radio-frequency response output from said MOSFET sections and MESFET. 6. An electrical system as in claim 1 , further comprising a plurality of direct-current (DC) voltage sources that are each coupled to a combined input gate of said first and second MOSFET sections that are coupled together as well as said MESFET section. 7. An electrical system as in claim 1 , further comprising a direct-current (DC) voltage source that is coupled to a combined input gate of said first and second MOSFET sections wherein an input gate of said MESFET is coupled to a source for said first and second MOSFET sections coupled to a common drain for said first and second MOSFET sections. 8. An electrical system comprising: a metal-semiconductor field effect transistor (MESFET); a first and second metal oxide semiconductor (MOS) field effect transistor (MOSFET) sections formed to respectively create a first and second semi-conductive channel region on opposing sides of said MESFET, wherein said first and second MOSFET sections are disposed on opposite sides of said MESFET to respectively create a third and fourth semi-conductive channel regions that passes through a portion of said first and second semi-conductive channel regions such that operation of the MESFET modulates or controls current passing through otherwise controlled by an electrical path of the MOSFET sections associated with said first and second semi-conductive channel regions. 9. An electrical system as in claim 8 , further comprising a control system for determining when said MESFET and said MOSFET is to be operated comprising an automated system including sensors as well as a control section, wherein said automated system can include radiation sensors as well as other control systems. 10. An electrical system as in claim 9 , wherein said control systems can comprise a high-voltage radio-frequency transmitter or receiver systems. 11. The electrical system as in claim 8 , further comprising a plurality of alternating-current (AC) voltage sources each one coupled to said first and second MOSFET sections and said MESFET. 12. An electrical system as in claim 11 , further comprising a control system operable to modulate said plurality of alternating-current (AC) voltage sources to generate a radio-frequency response output from said MOSFET sections and MESFET. 13. An electrical system as in claim 8 , further comprising a plurality of direct-current (DC) voltage sources that are each coupled to a combined input gate of said first and second MOSFET sections that are coupled together as well as said MESFET section. 14. An electrical system as in claim 8 , further comprising a direct-current (DC) voltage source that is coupled to a combined input gate of said first and second MOSFET sections wherein an input gate of said MESFET is coupled to a source for said first and second MOSFET sections coupled to a common drain for said first and second MOSFET sections. 15. A method associated with an electrical system comprising: providing an electrical system comprising a metal-semiconductor field-effect transistor (MESFET) and a first and second metal-oxide semiconductor (MOS) field-effect transistor (MOSFET) sections formed to respectively create a first and second semi-conductive channel region on opposing sides of said MESFET, wherein said first and second MOSFET sections are disposed on opposite sides of said MESFET to respectively create a third and fourth semi-conductive channel regions that passes through a portion of said first and second semi-conductive channel regions such that operation of the MESFET modulates or controls current passing through otherwise controlled by an electrical path of the MOSFET sections associated with said first and second semi-conductive channel regions. 16. A method as in claim 15 further comprising operating said MOS in response to a control input to adjust, modulate, or cut-off said current passing through first and second semi-conductive channel regions. 17. A method as in claim 16 , wherein said operating comprises a MOS cut-off mode to halt passage of said electrical signals through said first or second MOSFET section. 18. A method as in claim 16 , wherein said operating comprises a MOS linear mode to alter resistive characteristics of at least a portion of said first or second MOSFET sections. 19. A method as in claim 16 , wherein said operating comprises a MOS saturation mode to limit an amount of current that can pass through at least a portion of said first or second MOSFET sections. 20. A method as in claim 15 , further comprising providing a control system for determining when said MESFET and said first or second MOSFET sections are to be operated comprising an autom
Electricity · mapped topic
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without feedback from the output circuit to the control circuit · CPC title
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