Superparamagnetic colloids with enhanced charge stability for high quality magnetically tunable photonic structures

Patent metadata

Field	Value
Publication number	US-9734946-B2
Application number	US-201214357251-A
Country	US
Kind code	B2
Filing date	Nov 9, 2012
Priority date	Nov 9, 2011
Publication date	Aug 15, 2017
Grant date	Aug 15, 2017

Abstract

A method of stabilizing electromagnetically charged particles, which includes coating electromagnetically charged particles with a protective layer; and etching the protective layer to produce a porous protective layer on the electromagnetically charged.

First claim

What is claimed is:

1. A method of stabilizing electrostatically charged magnetic particles, comprising:
coating electrically charged magnetic particles with a protective layer by directly depositing a layer of silica through a sol-gel process on a surface of the electrically charged magnetic particles;
etching the protective layer of silica in water to produce a porous protective layer of silica on the electrically charged magnetic particles;
dispersing a plurality of the electrically charged magnetic particles with the porous protective layer of silica in a polar solution; and
assembling the plurality of the electrically charged magnetic particles with the porous protective layer of silica under an external magnetic field into periodic structures with tunable photonic properties in the polar solution.

2. The method of claim 1 , wherein the electrically charged magnetic particles are superparamagnetic.

3. The method of claim 1 , wherein the porous protective layer has mesoscale porosity and enhanced permeability to solvents and ions.

4. The method of claim 3 , wherein the porous protective layer prevent polyelectrolytes from detaching from the superparamagnetic particles and allows the charge dissociation of polyelectrolytes and produces strong electrostatic interactions among the superparamagnetic particles; and
wherein the porous protective layer enhances the charge stability and maintains long-range repulsions, which allows for self-assembly of the periodic structures.

5. The method of claim 1 , comprising:
coating the electrically charged magnetic particles with a layer of a cross-linked polystyrene; and
etching a surface of the cross-linked polystyrene layer of the superparamagnetic particles in toluene and/or chloroform to produce a porous protective layer on the surface of the superparamagnetic particles.

6. The method of claim 1 , wherein the etching the protective layer of silica in the water produces mesopores and micropores within the layer of the silica, the mesopores comprise pores of greater than approximately 2 nm, and the micropores comprise pores of less than approximately 2 nm.

7. The method of claim 1 , comprising:
performing a post-treatment process, which partially removes materials from the protective layer to create porosity.

8. The method of claim 2 , comprising:
synthesizing superparamagnetic particles in water and coating the particles with the layer of silica;
washing the coated superparamagnetic particles with ethanol and water to remove excess ammonia and water;
heating the superparamagnetic particles in distilled water;
cleaning the superparamagnetic particles with water; and
dispersing the superparamagnetic particles in distilled water.

9. The method of claim 2 , comprising:
controlling porosity of the porous protective layer on the superparamagnetic particles based on a duration of etch time.

10. A method of stabilizing electrostatically charged magnetic particles, comprising:
coating electrically charged magnetic particles with a protective layer, wherein the electrically charged magnetic particles are superparamagnetic particles; and
etching a surface of the protective layer of the superparamagnetic particles in toluene and/or chloroform to produce a porous protective layer on the surface of the superparamagnetic particles.

11. The method of claim 10 , comprising:
coating the superparamagnetic particles with a layer of silica by directly depositing a layer of silica through a sol-gel process on a surface of the superparamagnetic particles;
etching the silica coated particles in a base solution to produce mesoscale porosity in the protective layer, which stabilizes the charges on the superparamagnetic particles; and
enhancing the electrostatic repulsion by facilitating the charge dissociation of polyelectrolytes underneath the protective layer to form a high density of negative charges.

12. The method of claim 10 , further comprising:
coating the superparamagnetic particles with a layer of silica by directly depositing a layer of silica through a sol-gel process on a surface of the superparamagnetic particles; and
etching the protective layer of silica in water to produce a porous protective layer of silica on the electrically charged magnetic particles.

13. The method of claim 10 , wherein the protective layer is a cross-linked polystyrene.

14. A method of stabilizing electrostatically charged magnetic particles, comprising:
coating surfaces of electrically charged magnetic particles with a protective layer of a polymer by directly depositing the protective layer of polymer on the electrically charged magnetic particles surface through an emulsion polymerization process;
post-treating the surfaces of the electrically charged magnetic particles to produce micropores and mesoscale pores within the protective polymer layer, wherein the post-treating comprises etching the protective layer of polymer in a nonpolar solvent to produce the micropores and mesopores within the protective layer;
dispersing a plurality of the electrically charged magnetic particles with the porous protective layer of polymer in a polar solution; and
assembling the plurality of the electrically charged magnetic particles with the micropores and the mesopores within the protective layer of polymer under an external magnetic field into periodic structures with tunable photonic properties in the polar solution.

15. The method of claim 14 , wherein the electrically charged magnetic particles are charged superparamagnetic particles.

16. The method of claim 15 , comprising:
depositing the protecting layer on the superparamagnetic particles through an emulsion polymerization, the emulsion polymerization includes depositing a slightly cross-linked polymer layer on the surfaces of the superparamagnetic particles.

17. The method of claim 15 , wherein the micropores and mesoscale pores prevent polyelectrolytes from detaching from the electrically charged magnetic particles and allows the polyelectrolytes to ionize and produces strong electrostatic interactions among the electrically charged magnetic particles; and
wherein the micropores and mesoscale pores enhance the charge stability and maintain long-range repulsions for self-assembly of the periodic structures.

18. The method of claim 14 , wherein the mesoscale pores within the layer of polymer comprises pores of greater than approximately 2 nm, and the micropores have a diameter of less than approximately 2 nm.

19. The method of claim 14 , wherein the protective layer is a cross-linked polystyrene.

20. The method of claim 14 , wherein the nonpolar solution is 1,2-dichlorobenzene, toluene, chloroform, or hexane.

Assignees

• Univ California

Inventors

• Yin Yadong
• Hu Yongxing

Classifications

• B82Y20/00

  Nanooptics, e.g. quantum optics or photonic crystals · CPC title

• B01J13/0047 Primary

  containing a metal oxide · CPC title

• B01J13/20

  After-treatment of capsule walls, e.g. hardening · CPC title

• B01J13/14

  Polymerisation; cross-linking · CPC title

• G02B2006/1213

  comprising photonic band-gap structures or photonic lattices · CPC title