Conductive paste and method for producing conductive film using same

US9732236B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9732236-B2
Application numberUS-201415103440-A
CountryUS
Kind codeB2
Filing dateDec 5, 2014
Priority dateDec 10, 2013
Publication dateAug 15, 2017
Grant dateAug 15, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

After there is prepared a conductive paste which contains fine copper particles having an average particle diameter of 1 to 100 nm, each of the fine copper particles being coated with an azole compound, coarse copper particles having an average particle diameter of 0.3 to 20 μm, a glycol solvent, such as ethylene glycol, and at least one of a polyvinylpyrrolidone (PVP) resin and a polyvinyl butyral (PVB) resin and wherein the total amount of the fine copper particles and the coarse copper particles is 50 to 90% by weight, the weight ratio of the fine copper particles to the coarse copper particles being in the range of from 1:9 to 5:5, the conductive paste thus prepared is applied on a substrate by screen printing to be preliminary-fired by vacuum drying, and then, fired with light irradiation by irradiating with light having a wavelength of 200 to 800 nm at a pulse period of 500 to 2000 μs and a pulse voltage of 1600 to 3800 V to form a conductive film on the substrate.

First claim

Opening claim text (preview).

The invention claimed is: 1. A conductive paste comprising: fine copper particles having an average particle diameter of 1 to 100 nm, each of the fine copper particles being coated with an azole compound; coarse copper particles having an average particle diameter of 0.3 to 20 μm; a glycol solvent; and at least one of a polyvinylpyrrolidone resin and a polyvinyl butyral resin. 2. A conductive paste as set forth in claim 1 , wherein a total amount of said fine copper particles and said coarse copper particles in said conductive paste is 50 to 90% by weight. 3. A conductive paste as set forth in claim 1 , wherein a weight ratio of said fine copper particles to said coarse copper particles in said conductive paste is in the range of from 1:9 to 5:5. 4. A conductive paste as set forth in claim 1 , wherein said azole compound is benzotriazole. 5. A conductive paste as set forth in claim 1 , wherein said glycol solvent is ethylene glycol. 6. A conductive paste as set forth in claim 1 , which further comprises a dispersing agent. 7. A conductive paste as set forth in claim 1 , wherein said conductive paste contains the polyvinylpyrrolidone resin, and an amount of said polyvinylpyrrolidone resin in said conductive paste is 3 to 9% by weight with respect to the total amount of said fine copper particles and said coarse copper particles. 8. A conductive paste as set forth in claim 1 , wherein said conductive paste contains the polyvinyl butyral resin, and an amount of said polyvinyl butyral resin in said conductive paste is 3 to 6% by weight with respect to the total amount of said fine copper particles and said coarse copper particles.

Assignees

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Classifications

  • Metallic powder coated with organic material · CPC title

  • Nanosized particles · CPC title

  • Inks comprising nanoparticles and specially adapted for being sintered at low temperature (H05K1/095 takes precedence) · CPC title

  • C09D5/24Primary

    Electrically-conducting paints {(conductive materials H01B1/00)} · CPC title

  • Homopolymers or copolymers of N-vinyl-pyrrolidones · CPC title

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What does patent US9732236B2 cover?
After there is prepared a conductive paste which contains fine copper particles having an average particle diameter of 1 to 100 nm, each of the fine copper particles being coated with an azole compound, coarse copper particles having an average particle diameter of 0.3 to 20 μm, a glycol solvent, such as ethylene glycol, and at least one of a polyvinylpyrrolidone (PVP) resin and a polyvinyl but…
Who is the assignee on this patent?
Dowa Electronics Materials Co Ltd
What technology area does this patent fall under?
Primary CPC classification C09D5/24. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 15 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).