To apply a fluid to a substrate

US9731498B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9731498-B2
Application numberUS-201315032244-A
CountryUS
Kind codeB2
Filing dateOct 28, 2013
Priority dateOct 28, 2013
Publication dateAug 15, 2017
Grant dateAug 15, 2017

How to read this patent

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Apparatus to apply a fluid to a substrate, the apparatus includes a first roller to rotate about an axis and apply a fluid to a first side of the substrate. The first roller includes an outlet to provide gas to the substrate to guide the movement of the substrate subsequent to the application of fluid to the substrate.

First claim

Opening claim text (preview).

We claim: 1. Apparatus to apply a fluid to a substrate, the apparatus comprising: a first roller to rotate about an axis and apply a fluid to a first side of the substrate, the first roller including an outlet to provide gas to the substrate to guide a movement of the substrate subsequent to the application of fluid to the substrate; and a second roller to rotate about an axis, the second roller being positioned adjacent to the first roller to form a nip, the second roller including an outlet to provide gas to the substrate to guide the movement of the substrate subsequent to the application of fluid to the substrate. 2. Apparatus as claimed in claim 1 , wherein the first roller has an exterior surface to apply the fluid to the first side of the substrate, the exterior surface defining a slot therein, the outlet being positioned within the slot. 3. Apparatus as claimed in claim 1 wherein the second roller is to apply a fluid to a second side of the substrate. 4. Apparatus as claimed in claim 1 , further comprising a guide module to receive the substrate from the first roller, the guide module being arranged to provide gas to the substrate to dry the fluid applied to the substrate and to transport the substrate in a contactless manner. 5. Apparatus as claimed in claim 4 , wherein the guide module includes a chamber to transport the substrate, the chamber having a length selected to enable the guide module to wholly dry the fluid applied to the substrate. 6. Apparatus as claimed in claim 4 , wherein the guide module is to provide gas at least toward the first roller to support the substrate subsequent to the application of the fluid to the substrate. 7. A method to apply a fluid to a substrate, the method comprising: controlling a first roller to rotate about an axis and apply a fluid to a first side of the substrate; controlling provision of gas from an outlet of the first roller to guide a movement of the substrate subsequent to the application of fluid to the substrate; controlling a second roller to rotate about an axis, the second roller being positioned adjacent to the first roller to form a nip; and controlling provision of gas from an outlet of the second roller to the substrate to guide the movement of the substrate subsequent to the application of fluid to the substrate. 8. A method as claimed in claim 7 , wherein controlling the provision of gas from the outlet is performed while the first roller is rotated from a first predetermined angle to a second predetermined angle. 9. A method as claimed in claim 7 , further comprising controlling a guide module to provide gas to the substrate to dry the fluid applied to the substrate and to transport the substrate in a contactless manner, the guide module being arranged to receive the substrate from the first roller. 10. Apparatus to apply fluid to a substrate, the apparatus comprising: a controller to: control a first roller to rotate about an axis and apply a fluid to a first side of the substrate; control the provision of gas from an outlet of the first roller to guide a movement of the substrate subsequent to the application of fluid to the substrate; control a second roller to rotate about an axis, the second roller being positioned adjacent to the first roller to form a nip; and control provision of gas from an outlet of the second roller to the substrate to guide the movement of the substrate subsequent to the application of fluid to the substrate. 11. Apparatus as claimed in claim 10 , wherein the controller is to control the provision of gas from the outlet while the first roller is rotated from a first predetermined angle to a second predetermined angle. 12. Apparatus as claimed in claim 10 , wherein the controller is to: control a guide module to provide gas to the substrate to dry the fluid applied to the substrate and to transport the substrate in a contactless manner, the guide module being arranged to receive the substrate from the first roller. 13. Apparatus as claimed in claim 1 , wherein the outlet of the first roller includes an opening to provide gas to the substrate and a curved surface extending from the opening of the outlet towards an exterior surface of the first roller to guide the movement of the substrate.

Assignees

Inventors

Classifications

  • Impression cylinders · CPC title

  • B41F22/00Primary

    Means preventing smudging of machine parts or printed articles (B41F23/00 takes precedence) · CPC title

  • by heat drying, by cooling, by applying powders {(B41F23/005 takes precedence)} · CPC title

  • Devices for conveying sheets through printing apparatus or machines (through platen presses B41F1/28) · CPC title

  • with means for coating or laminating · CPC title

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Frequently asked questions

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What does patent US9731498B2 cover?
Apparatus to apply a fluid to a substrate, the apparatus includes a first roller to rotate about an axis and apply a fluid to a first side of the substrate. The first roller includes an outlet to provide gas to the substrate to guide the movement of the substrate subsequent to the application of fluid to the substrate.
Who is the assignee on this patent?
Hewlett Packard Indigo Bv, Hewlett Packard Indigo Bv
What technology area does this patent fall under?
Primary CPC classification B41F22/00. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Aug 15 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).