Method for manufacturing semiconductor structure and semiconductor structure thereof
US-2024381776-A1 · Nov 14, 2024 · US
US9729990B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9729990-B2 |
| Application number | US-201514978680-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 22, 2015 |
| Priority date | Feb 18, 2013 |
| Publication date | Aug 8, 2017 |
| Grant date | Aug 8, 2017 |
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A condenser microphone comprises a substrate, a vibratile diaphragm and a back plate. The substrate has an opening. The diaphragm is disposed corresponding to the substrate and covers the opening, and has a plurality of protrusions. The back plate is coupled to the diaphragm and has a plurality of through holes, at least some of which are corresponding to the protrusions respectively. An interval is formed between the diaphragm and the back plate, and when the diaphragm vibrates, the protrusions move into or further near the through holes.
Opening claim text (preview).
What is claimed is: 1. A manufacturing method of a condenser microphone, comprising steps of: providing a substrate; forming a diaphragm having a plurality of protrusions on the substrate; forming a sacrifice layer on the diaphragm and covering the protrusions; disposing a back plate covering the sacrifice layer and partially coupled to the diaphragm; forming a plurality of through holes in the back plate, wherein at least some of the through holes are corresponding to the protrusions respectively; and removing the sacrifice layer. 2. The manufacturing method as recited in claim 1 , wherein the diaphragm and its protrusions are fabricated via injection, hot embossing, adhering or integration forming, on the substrate. 3. The manufacturing method as recited in claim 1 , wherein after the step of providing the substrate, the manufacturing method further comprises a step of: disposing at least an insulating layer on the substrate. 4. The manufacturing method as recited in claim 1 , wherein after the step of forming the sacrifice layer on the diaphragm and covering the protrusions, the manufacturing method further comprises steps of: forming an dielectric layer on the sacrifice layer; and removing the sacrifice layer by an etching method.
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