Protected electrode structures and methods

Patent metadata

Field	Value
Publication number	US-9728768-B2
Application number	US-201414209274-A
Country	US
Kind code	B2
Filing date	Mar 13, 2014
Priority date	Mar 15, 2013
Publication date	Aug 8, 2017
Grant date	Aug 8, 2017

Abstract

An electrode structure and its method of manufacture are disclosed. The disclosed electrode structures may be manufactured by depositing a first release layer on a first carrier substrate. A first protective layer may be deposited on a surface of the first release layer and a first electroactive material layer may then be deposited on the first protective layer. The first release layer may have a low mean peak to valley surface roughness, which may enable the formation of a thin protective layer with a low mean peak to valley surface roughness.

First claim

What is claimed is:

1. A method, comprising:
providing a first carrier substrate;
depositing a first release layer on the first carrier substrate, wherein a mean peak to valley roughness of a surface of the first release layer opposite the first carrier substrate is between about 0.1 μm and about 1 μm, and wherein the first release layer has a thickness of greater than or equal to about 2 μm;
depositing a first protective layer on the surface of the first release layer;
depositing a first electroactive material layer on the first protective layer,
wherein an adhesive strength between the first release layer and the first protective layer is greater than an adhesive strength between the first release layer and the first carrier substrate;
delaminating the first carrier substrate from the first release layer; and
removing the first release layer from the first protective layer by dissolving the first release layer in an electrolyte.

2. The method of claim 1 , wherein delaminating the first carrier substrate further comprises delaminating the first release layer from the first protective layer.

3. The method of claim 1 , wherein delaminating the first carrier substrate further comprises delaminating the first carrier substrate from the first release layer, wherein the first release layer remains disposed on the first protective layer.

4. The method of claim 1 , further comprising depositing a current collector on the first electroactive material layer.

5. The method of claim 1 , further comprising laminating a separate portion of the electrode structure to the first electroactive material layer.

6. The method of claim 5 , wherein lamination involves applying a pressure of between 5 kg/cm 2 and 10 kg/cm 2 .

7. The method of claim 1 , wherein the first release layer is at least one of a polymer, a gel polymer, and a wax.

8. The method of claim 1 , wherein the first protective layer is substantially continuous.

9. The method of claim 1 , wherein a thickness of the first protective layer is greater than the mean peak to valley roughness of the first release layer.

10. The method of claim 1 , wherein the thickness of the first protective layer is at least two times greater than the mean peak to valley roughness of the first release layer.

11. The method of claim 1 , wherein a thickness of the first protective layer is between about 0.1 μm and about 2 μm.

12. The method of claim 1 , wherein the first release layer comprises a material that is substantially amorphous.

13. The method of claim 1 , wherein an intermediate layer is disposed between at least one of the first carrier substrate and the first release layer, the first release layer and the first protective layer, and the first protective layer and the first electroactive material layer.

14. The method of claim 1 , wherein the release layer is conductive to lithium ions.

15. The method of claim 1 , wherein the release layer comprises a lithium salt.

16. The method of claim 1 , wherein a mean peak to valley roughness of the first release layer is less than a mean peak to valley roughness of the substrate.

17. The method of claim 1 , comprising, after the delaminating step, assembling an electrochemical cell comprising the first release layer, the first protective layer, the first electroactive material, and the electrolyte, and then performing the step of removing the release layer by contacting the release layer with the electrolyte.

18. A method, comprising:
providing a first carrier substrate;
depositing a first release layer on the first carrier substrate, wherein the first release layer comprises a polymer gel;
depositing a first protective layer on the surface of the first release layer, wherein a thickness of the first release layer is greater than a mean peak to valley roughness of the first carrier substrate;
depositing a first electroactive material layer on the first protective layer;
delaminating the first carrier substrate from the first release layer; and
removing the first release layer from the first protective layer by dissolving the first release layer in an electrolyte.

19. The method of claim 18 , comprising, after the delaminating step, assembling an electrochemical cell comprising the first release layer, the first protective layer, the first electroactive material, and the electrolyte, and then performing the step of removing the release layer by contacting the release layer with the electrolyte.

Assignees

• Sion Power Corp

Inventors

• Mikhaylik Yuriy V
• Laramie Michael G
• Kopera John Joseph Christopher

Classifications

• H01M10/0565

  Polymeric materials, e.g. gel-type or solid-type · CPC title

• H01M4/1391

  of electrodes based on mixed oxides or hydroxides, or on mixtures of oxides or hydroxides, e.g. LiCoOx · CPC title

• H01M4/0423

  Physical vapour deposition · CPC title

• H01M4/13

  Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof · CPC title

• H01M10/052

  Li-accumulators · CPC title