Multifunctional wafer pretreatment chamber and chemical vapor deposition device
US-2024337011-A1 · Oct 10, 2024 · US
US9725802B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9725802-B2 |
| Application number | US-201414538298-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 11, 2014 |
| Priority date | Nov 11, 2014 |
| Publication date | Aug 8, 2017 |
| Grant date | Aug 8, 2017 |
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A process for applying a silicon oxide barrier coating to a PET container, wherein the PET container comprises a wall having an inner surface and an outer surface, the process comprising the steps of: (a) heating a PET container such that at least the outer surface is at a temperature of from about 200° F. to about 383° F.; (b) forming a coated PET container by applying at least one silicon oxide barrier layer on at least the inner surface of the PET container while the temperature of at least the outer surface of the PET container is at a temperature of from about 200° F. to about 383° F.; and (c) cooling the coated PET container after step b.
Opening claim text (preview).
We claim: 1. A process for applying a silicon oxide barrier coating to a PET container, wherein the PET container comprises a wall having an inner surface and an outer surface, the process comprising the steps of: a. heating a PET container such that at least the outer surface is at a temperature of from 225° F. to about 383° F.; b. forming a coated PET container by applying at least one silicon oxide barrier layer on at least the inner surface of the PET container while the temperature of at least the outer surface of the PET container is at a temperature of from 225° F. to about 383° F.; and c. cooling the coated PET container after step b, wherein the heating step comprises the use of a heating tunnel through which the PET containers travel, and wherein the heating tunnel comprises from two to six heat zones of different temperatures located along a vertical axis of the containers. 2. The process of claim 1 wherein the heating step comprises heating the PET container to a surface temperature of from about 250° F. to about 383° F. throughout the wall. 3. The process of claim 1 wherein the forming step comprises: i. forming a vacuum in a chamber in which at least one PET container is situated; ii. adding a silicon oxide forming monomer reaction gas to at least the inner surface of the wall of the PET container; and iii. exposing the PET container to plasma energy to deposit the at least one layer of silicon oxide on at least the inner surface of the wall of the PET container. 4. The process of claim 1 wherein the heating tunnel comprises rotary elements to rotate the containers to ensure even heat exposure circumferentially.
characterised by the method used for heating the substrate (C23C16/48, C23C16/50 take precedence) · CPC title
Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates · CPC title
by heating · CPC title
Linings or internal coatings · CPC title
using plasma jets · CPC title
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