Light-emitting devices using thin film electrode with refractive index optimized capping layer for reduction of plasmonic energy loss

US9722208B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9722208-B2
Application numberUS-201514984857-A
CountryUS
Kind codeB2
Filing dateDec 30, 2015
Priority dateDec 31, 2014
Publication dateAug 1, 2017
Grant dateAug 1, 2017

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Abstract

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A light emitting device includes a substrate, a first electrode disposed on the substrate, a light emission layer (EML) disposed on the first electrode, a second electrode disposed on the EML, and a capping layer disposed on the second electrode. A thickness of the second electrode is not more than 50 nm, a refractive index of the capping layer is less than a refractive index of the EML, and the EML and the second electrode are separated by a distance not more than 100 nm.

First claim

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What is claimed is: 1. A bottom emitting light emitting device, comprising: a substrate configured to emit light; a first electrode disposed on the substrate; a light emission layer (EML) disposed on the first electrode; a second electrode disposed on the EML; and a capping layer disposed on the second electrode, wherein a thickness of the second electrode is not more than 50 nm, wherein a refractive index of the capping layer is less than a refractive index of the EML, and wherein the EML and the second electrode are separated by a distance not more than 100 nm. 2. The light emitting device of claim 1 , further comprising: a hole transport layer disposed between the first electrode and the EML; and an electron transport layer disposed between the EML and the second electrode, wherein a thickness of the electron transport layer is less than 100 nm. 3. The light emitting device of claim 2 , wherein the refractive index of the capping layer is less than a refractive index of the electron transport layer. 4. The light emitting device of claim 3 , wherein the thickness of the second electrode is between 10 nm and 30 nm. 5. The light emitting device of claim 4 , wherein the capping layer is a dielectric layer and the refractive index of the capping layer is between 1.4 and 1.6. 6. The light emitting device of claim 5 , wherein a thickness of the capping layer is greater than or equal to 650 nm. 7. The light emitting device of claim 6 , wherein the capping layer is silicon dioxide, barium fluoride, calcium fluoride, aluminum oxide, potassium bromide, polymethyl methacrylate, polyacrylate, or polycarbonate. 8. The light emitting device of claim 2 , wherein the thickness of the second electrode is between 10 nm and 30 nm. 9. The light emitting device of claim 8 , wherein the capping layer is a dielectric layer and the refractive index of the capping layer is between 1.4 and 1.6. 10. The light emitting device of claim 9 , wherein a thickness of the capping layer is greater than or equal to 650 nm. 11. The light emitting device of claim 10 , wherein the capping layer is silicon dioxide, barium fluoride, calcium fluoride, aluminum oxide, potassium bromide, polymethyl methacrylate, polyacrylate, or polycarbonate. 12. The light emitting device of claim 2 , further comprising: an internal extraction structure disposed between the substrate and the first electrode, wherein the internal extraction structure comprises high refractive index particles and extracts light from a waveguide mode. 13. The light emitting device of claim 2 , further comprising: a microlens array formed on a surface of the substrate opposite the first electrode, wherein the microlens array extracts light from a substrate mode. 14. The light emitting device of claim 1 , wherein the second electrode is silver. 15. The light emitting device of claim 1 , wherein the thickness of the second electrode is between 10 nm and 30 nm. 16. The light emitting device of claim 15 , wherein the capping layer is a dielectric layer and the refractive index of the capping layer is between 1.4 and 1.6. 17. The light emitting device of claim 16 , wherein a thickness of the capping layer is greater than or equal to 650 nm. 18. The light emitting device of claim 17 , wherein the capping layer is silicon dioxide, barium fluoride, calcium fluoride, aluminum oxide, potassium bromide, polymethyl methacrylate, polyacrylate, or polycarbonate. 19. The light emitting device of claim 1 , further comprising: an internal extraction structure disposed between the substrate and the first electrode, wherein the internal extraction structure comprises high refractive index particles and extracts light from a waveguide mode. 20. The light emitting device of claim 1 , further comprising: a microlens array formed on a surface of the substrate opposite the first electrode, wherein the microlens array extracts light from a substrate mode. 21. A light emitting device, comprising: a substrate through which a majority of light generated by a light emission layer (EML) is radiated; a first electrode disposed on the substrate; the EML, disposed on the first electrode, that generates the light; a second electrode disposed on the EML; and a capping layer disposed on the second electrode, wherein a thickness of the second electrode is not more than 50 nm, wherein a refractive index of the capping layer is less than a refractive index of the EML, and wherein the EML and the second electrode are separated by a distance not more than 100 nm. 22. A light emitting device, comprising: a substrate; a first electrode, disposed on the substrate, configured to transmit light generated by a light emission layer (EML) to the substrate; the EML disposed on the first electrode; a second electrode disposed on the EML; and a capping layer disposed on the second electrode, wherein a thickness of the second electrode is not more than 50 nm, wherein a refractive index of the capping layer is less than a refractive index of the EML, and wherein the EML and the second electrode are separated by a distance not more than 100 nm.

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What does patent US9722208B2 cover?
A light emitting device includes a substrate, a first electrode disposed on the substrate, a light emission layer (EML) disposed on the first electrode, a second electrode disposed on the EML, and a capping layer disposed on the second electrode. A thickness of the second electrode is not more than 50 nm, a refractive index of the capping layer is less than a refractive index of the EML, and th…
Who is the assignee on this patent?
Konica Minolta Laboratory Usa Inc
What technology area does this patent fall under?
Primary CPC classification H01L51/5268. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 01 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).