Diazepane Derivatives, Processes for their Preparation, and Uses thereof for the Amelioration, Prevention and/or Treatment of Mental and Neurological Diseases
US-2024246957-A1 · Jul 25, 2024 · US
Lactone photoacid generators and resins and photoresists comprising same
US9720321B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9720321-B2 |
| Application number | US-201113297031-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 15, 2011 |
| Priority date | Nov 15, 2010 |
| Publication date | Aug 1, 2017 |
| Grant date | Aug 1, 2017 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
New lactone-containing photoacid generator compounds (“PAGs”) and photoresist compositions that comprise each PAG compounds are provided. These photoresist compositions are useful in the manufacture of electronic device.
First claim
Opening claim text (preview).
What is claimed is: 1. A photoacid generator having a formula chosen from wherein M + is a cation. 2. A photoresist composition comprising a polymer and a photoacid generator of claim 1 . 3. A method for forming a photoresist relief image on a substrate comprising: (a) applying a coating layer of a photoresist composition of claim 2 on a substrate; and (b) exposing the photoresist coating layer to patterned activating radiation and developing the exposed photoresist layer to provide a relief image. 4. A photoacid generator of claim 1 having a formula chosen from wherein M + is a cation. 5. A photoresist composition comprising a polymer and a photoacid generator of claim 4 . 6. A method for forming a photoresist relief image on a substrate comprising: (a) applying a coating layer of a photoresist composition of claim 5 on a substrate; and (b) exposing the photoresist coating layer to patterned activating radiation and developing the exposed photoresist layer to provide a relief image. 7. A photoacid generator of claim 1 having a formula chosen from wherein M + is a cation. 8. A photoresist composition comprising a polymer and a photoacid generator of claim 7 . 9. A method for forming a photoresist relief image on a substrate comprising: (a) applying a coating layer of a photoresist composition of claim 8 on a substrate; and (b) exposing the photoresist coating layer to patterned activating radiation and developing the exposed photoresist layer to provide a relief image.
Assignees
Inventors
Classifications
- C07D493/08Primary
Bridged systems · CPC title
with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title
the macromolecular compound having an alicyclic moiety in a side chain · CPC title
- G03F7/0045Primary
with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title
condensed with carbocyclic rings or ring systems · CPC title
Patent family
Related publications grouped by family.
External sources
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US9720321B2 cover?
- New lactone-containing photoacid generator compounds (“PAGs”) and photoresist compositions that comprise each PAG compounds are provided. These photoresist compositions are useful in the manufacture of electronic device.
- Who is the assignee on this patent?
- Aqad Emad, Li Mingqi, Xu Cheng-Bai, and 2 more
- What technology area does this patent fall under?
- Primary CPC classification C07D493/08. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Aug 01 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).