Intensity distribution management system and method in pixel imaging

Patent metadata

Field	Value
Publication number	US-9720244-B1
Application number	US-201113250686-A
Country	US
Kind code	B1
Filing date	Sep 30, 2011
Priority date	Sep 30, 2011
Publication date	Aug 1, 2017
Grant date	Aug 1, 2017

Abstract

An intensity distribution management system includes a light source, a mask for receiving light therefrom and for allowing some light to propagate through and past the mask, a surface for receiving light allowed past the mask, and a diffusive element disposed between the mask and the light source for ensuring a substantially even light intensity distribution in relation to the surface. An imaging method includes emitting a light beam, manipulating the beam to have a first numerical aperture across a first divergence axis, directing the beam through a diffusive element to increase the numerical aperture of the beam, directing the beam through one or more transmissive portions of a mask, the mask being disposed relative to the diffusive element, and imaging transmitted portions of the beam to a target surface wherein the beam has a substantially ripple-free and uniform intensity distribution across the first divergence axis at the target surface.

First claim

What is claimed is:

1. An intensity distribution management system comprising:
a light source situated to produce a light beam;
a beam shaping system situated to receive the light beam and to produce a substantially uniform homogenized line beam propagating along an optical axis having a line axis orthogonal to the optical axis and a thickness axis mutually orthogonal to the optical axis and line axis, the homogenized line beam having a homogenized intensity profile along the line axis;
a mask situated perpendicular to the optical axis so as to receive the substantially uniform homogenized line beam and to transmit selected portions of the homogenized line beam to propagate through said mask so as to be received by a target surface; and
a diffusive element disposed between said mask and said beam shaping system so as to attenuate intensity ripples in a light intensity distribution of the selected portions at the target surface that are associated with the transmission of the selected portions through said mask.

2. The system of claim 1 , wherein said light source is a laser source comprising one or more laser diode modules that include laser diode bars or single-emitter diodes.

3. The system of claim 2 , wherein the line axis corresponds to a slowly diverging slow axis of the laser diode bars or single-emitter diodes and the thickness axis corresponds to a rapidly diverging fast axis of the laser diode bars or single-emitter diodes.

4. The system of claim 1 wherein the target surface is a laser induced thermal imaging target surface.

5. The system of claim 1 wherein said light source and beam shaping system comprise a line generator.

6. The system of claim 1 , wherein the homogenized line beam received by the mask has different divergences with respect to the line axis and the thickness axis.

7. The system of claim 1 , wherein said diffusive element and said mask are angularly displaced with respect to each other at an oblique angle so as to reduce aperture diffraction effects.

8. The system of claim 1 wherein said diffusive element is an isotropic diffuser.

9. The system of claim 1 wherein said diffusive element is a one dimensional diffusive element.

10. The system of claim 1 , wherein said diffusive element and said mask are angularly displaced with respect to each other by an angle of greater than zero and less than or equal to five degrees.

11. The system of claim 1 , wherein the homogenized line beam has a first numerical aperture with respect to the line axis as incident to said diffusive element and a second numerical aperture with respect to the line axis upon exiting said diffusive element wherein the second numerical aperture is greater than the first numerical aperture.

12. The system of claim 11 wherein said first numerical aperture is approximately 0.01.

13. The system of claim 1 , wherein the mask is an opaque mask including opaque and non-opaque portions.

14. The system of claim 1 , wherein the mask includes transmissive portions situated to transmit the selected portions of the homogenized line beam and non-transmissive portions situated to block unselected portions of the homogenized line beam so that the unselected portions do not propagate to the target surface.

15. The system of claim 1 , wherein the selected portions of the homogenized line beam at the target surface form an image of transmissive portions of the mask that transmit the selected portions of the homogenized line beam through the mask.

16. The system of claim 1 , wherein the diffusive element is attached to or formed on the mask.

17. An intensity distribution management method comprising:
emitting a light beam from a light source;
homogenizing the light beam so as to form a substantially uniform homogenized light beam;
changing a numerical aperture of said substantially uniform homogenized light beam to a first beam numerical aperture across a first divergence axis;
directing said substantially uniform homogenized light beam through a diffusive element so as to increase said first beam numerical aperture to a second beam numerical aperture across the first divergence axis;
directing said substantially uniform homogenized light beam with the second beam numerical aperture through one or more transmissive portions of a mask, said mask being disposed relative to said diffusive element; and
imaging transmitted portions of said substantially uniform homogenized light beam at a target surface so that said transmitted portions have a substantially uniform intensity distribution across said first divergence axis at said target surface with a reduced ripple intensity variation due to transmission through said diffusive element.

18. The method of claim 17 wherein said light source is a laser source.

19. The method of claim 18 wherein said laser source comprises one or more laser diode modules.

20. The method of claim 19 wherein said laser diode modules are laser diode bars or single-emitter based modules.

21. The method of claim 17 wherein said target surface is one used for laser induced thermal imaging.

22. The method of claim 17 wherein said light source is a line generator.

23. The method of claim 17 , wherein the substantially uniform homogenized light beam as received by the diffusive element has a third beam numerical aperture across a divergence axis orthogonal to the first divergence axis and wherein the substantially uniform homogenized light beam as received by the mask has approximately the same third numerical aperture across the divergence axis orthogonal to the first divergence axis.

24. The method of claim 17 wherein said light source includes beam shaping optics.

25. The method of claim 17 , wherein said diffusive element and said mask are angularly displaced with respect to each other at an oblique angle in order to minimize aperture diffraction effects.

26. The method of claim 17 wherein said diffusive element is an isotropic diffuser.

27. The method of claim 17 wherein said diffusive element is a one dimensional diffusive element.

28. The method of claim 17 , wherein said diffusive element and said mask are angularly displaced with respect to each other by an angle of greater than zero and less than or equal to five degrees.

29. The method of claim 17 , wherein said first beam numerical aperture is approximately 0.01.

30. The method of claim 17 , further comprising blocking one or more portions of the substantially uniform homogenized light beam with one or more opaque portions of the mask.

31. The method of claim 17 , wherein the imaged transmitted portions form an image of the transmissive portions of the mask.

32. An apparatus, comprising:
a light source situated to generate one or more beams;
a beam shaping system situated to receive the one or more beams and to generate a substantially uniform homogenized beam;
a mask situated to receive the substantially uniform homogenized output beam and to transmit selected portions of the substantially uniform homogenized beam to a target surface and to block other selected portions of the substantially uniform homogenized beam; and
a diffusive element situated between the mask and the beam shaping system to adjust a light intensity distribution of the transmitted selected portions of the substantially uniform homogeniz

Assignees

• Debartolo Jr Joseph V
• Karlsen Scott
• Martinsen Rob
• Small Jay
• Nlight Inc

Inventors

• Debartolo Jr Joseph V
• Karlsen Scott
• Martinsen Rob
• Small Jay

Classifications

• G02B27/20 Primary

  for imaging minute objects, e.g. light-pointer · CPC title

• G02B5/0294 Primary

  adapted to provide an additional optical effect, e.g. anti-reflection or filter · CPC title

• G02B27/0988

  Diaphragms, spatial filters, masks for removing or filtering a part of the beam · CPC title

• G02B27/0927

  Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat · CPC title

• H10K71/20

  Changing the shape of the active layer in the devices, e.g. patterning · CPC title