Glass for magnetic recording medium substrate, magnetic recording medium substrate, magnetic recording medium and glass spacer for magnetic recording and reproducing apparatus
US-2024321310-A1 · Sep 26, 2024 · US
Method of supporting a workpiece during physical vapour deposition
US9719166B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9719166-B2 |
| Application number | US-201213528027-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 20, 2012 |
| Priority date | Jun 21, 2011 |
| Publication date | Aug 1, 2017 |
| Grant date | Aug 1, 2017 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
Methods and related apparatus support a work piece during a physical vapor deposition. An aluminium support having a support surface coated with a heat absorbent coating is provided. The support is cooled to around 100° C. and a PVD process is performed such that, with cooling, the work piece temperature is between 350° C. and 450° C. The coating is inert and/or ultra-high voltage compatible.
First claim
Opening claim text (preview).
What is claimed is: 1. A method of supporting a workpiece during Physical Vapour Deposition (PVD), the method including: (a) providing an aluminium support having a support surface coated with a heat absorbing coating of a metal oxide film, and placing the workpiece on the metal oxide film so as to be supported by the support surface of the support; (b) cooling the support to 100° C.; and (c) executing PVD, to thereby deposit material on the workpiece, while the cooling is being carried out such that, with the cooling, the workpiece temperature is between 350° C. and 450° C. during the depositing of the material on the workpiece. 2. A method as claimed in claim 1 wherein the coating is inert and/or Ultra High Voltage compatible. 3. A method as claimed in claim 2 wherein the coating is a film of CrO x or Al 2 O 3 . 4. A method of supporting a workpiece during Physical Vapour Deposition (PVD), the method including: (a) providing an aluminium support having a support surface coated with a heat absorbing coating of CrO x or Al 2 O 3 , and placing the workpiece on the coating of CrO x or Al 2 O 3 so as to be supported by the support surface of the support; (b) cooling the support to 100° C.; and (c) executing PVD, to thereby deposit material on the workpiece, while the cooling is being carried out such that, with the cooling, the workpiece temperature is between 350° C. and 450° C. during the depositing of the material on the workpiece.
Assignees
Inventors
Classifications
Temperature · CPC title
- C23C14/35Primary
by application of a magnetic field, e.g. magnetron sputtering {(C23C14/3457 takes precedence)} · CPC title
Workpiece holder · CPC title
operating with cathodic sputtering (H01J37/36 takes precedence {; methods of cathodic sputtering C23C14/34}) · CPC title
Substrate holders · CPC title
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Frequently asked questions
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- What does patent US9719166B2 cover?
- Methods and related apparatus support a work piece during a physical vapor deposition. An aluminium support having a support surface coated with a heat absorbent coating is provided. The support is cooled to around 100° C. and a PVD process is performed such that, with cooling, the work piece temperature is between 350° C. and 450° C. The coating is inert and/or ultra-high voltage compatible.
- Who is the assignee on this patent?
- Burgess Stephen R, Spts Technologies Ltd
- What technology area does this patent fall under?
- Primary CPC classification C23C14/35. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Aug 01 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).