UV light source having combined ionization and formation of excimers

US9718705B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9718705-B2
Application numberUS-201314436884-A
CountryUS
Kind codeB2
Filing dateOct 18, 2013
Priority dateOct 19, 2012
Publication dateAug 1, 2017
Grant dateAug 1, 2017

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

The invention relates to a device for producing UV light. Said device provides light from light sources that operate in accordance with different physical principles. The device comprises a chamber having several gas-filled plasma chambers ( 11, 12 ), wherein the chamber has at least one area ( 37, 39 ) transparent to UV light and/or VUV light. A first group ( 11 ) of plasma chambers is filled with an ionizable gas containing mercury and a second group ( 12 ) of plasma chambers is filled with a gas that forms excimers when suitably excited.

First claim

Opening claim text (preview).

What is claimed is: 1. A device for producing UV light and/or vacuum UV light, the device comprising: a UV-transparent chamber comprising at least one area transparent for UV light and/or vacuum UV light; a first group of plasma chambers filled with a mercury-containing ionizable gas; a second group of plasma chambers filled with a gas that forms excimers upon suitable excitation; wherein a plasma chamber of the second group and a plasma chamber of the first group are directly joined by a common wall, wherein said plasma chamber of the second group is positioned with a wall opposite the common wall next to the at least one area transparent for UV light and/or vacuum UV light; wherein said plasma chamber of the second group forms a thermal insulation for said plasma chamber of the first group. 2. The device according to claim 1 , wherein the plasma chambers of the first group emit a first UV light at a wavelength of 254 nm and the plasma chambers of the second group emit a second UV light at a wavelength of less than 250 nm. 3. The device according to claim 2 , wherein the second UV light has a wave length of less than 220 nm. 4. The device according to claim 1 , wherein the plasma chambers of the second group are configured to be excited by a dielectric barrier discharge (DBD); capacitive discharge; inductive coupling (ICP); and/or microwaves. 5. The device according to claim 1 , wherein the UV-transparent chamber comprises at least one plate that is transparent for UV light and/or vacuum UV light, wherein a thermal insulation that is transparent for UV light and/or vacuum UV light is arranged between the plasma chambers of the first group and the at least one plate. 6. The device according to claim 5 , wherein the plasma chambers of the first group include plasma chambers arranged in a first row parallel to the at least one plate. 7. The device according to claim 6 , wherein the plasma chambers of the first group include plasma chambers arranged in a second row parallel to a second one of the at least one plate. 8. The device according to claim 1 , wherein the plasma chambers of the first group are filled with mercury vapor and noble gases. 9. The device according to claim 1 , wherein the plasma chambers of the second group are filled with halogens or noble gases or mixtures thereof or chemical compounds thereof. 10. The device according to claim 1 , wherein the plasma chambers of the first group include at least one plasma chamber filled with a mercury-containing gas and wherein the plasma chambers of the second group include at least one excimer radiator. 11. The device according to claim 1 , wherein a pressure between 10 −2 mbar and 10 bar exists in the plasma chambers of the first group and in the plasma chambers of the second group. 12. The device according to claim 1 , wherein the plasma chambers of the first group and the plasma chambers of the second group are arranged within the UV-transparent chamber. 13. The device according to claim 1 , wherein the plasma chambers of the first group are configured to be excited by electrodes with a frequency of excitation in a range between approximately 50 Hz up to 10 5 kHz; by inductive coupling (ICP); and/or by microwaves. 14. The device according to claim 13 , wherein the microwaves are injected as a surface-sustained wave into the plasma chambers of the first group. 15. The device according to claim 13 , further comprising at least one magnetron configured to generate the microwaves and wherein the at least one magnetron is arranged outside or inside the UV-transparent chamber. 16. The device according to claim 13 , wherein the UV-transparent chamber comprises at least one opening and the microwaves pass through the at least one opening into the UV-transparent chamber. 17. The device according to claim 13 , wherein the UV-transparent chamber comprises at least one opening and the microwaves generated by the at least one magnetron are injected through the at least one opening into the UV-transparent chamber. 18. The device according to claim 13 , wherein, outside of the UV-transparent chamber, electrodes for inductive coupling (ICP); a dielectric barrier discharge (DBD); and/or a capacitive discharge are provided. 19. The device according to claim 18 , wherein the microwaves are injected as a surface-sustained wave into the plasma chambers of the second group. 20. The device according to claim 18 , further comprising at least one magnetron configured to generate the microwaves and wherein the at least one magnetron is arranged outside or inside the UV-transparent chamber. 21. The device according to claim 18 , wherein the UV-transparent chamber comprises at least one opening through which the microwaves pass into the UV-transparent chamber. 22. The device according to claim 21 , wherein the UV-transparent chamber comprises at least one opening and through the at least one opening the microwaves generated by the at least one magnetron are injected into the UV-transparent chamber. 23. The device according to claim 18 , wherein, outside of the UV-transparent chamber, electrodes for inductive coupling (ICP); a dielectric barrier discharge (DBD); and/or a capacitive discharge are provided.

Assignees

Inventors

Classifications

  • Paths producing light of different wavelengths, e.g. for simulating daylight · CPC title

  • Lamps suspended above a water surface or pipe · CPC title

  • Disinfection · CPC title

  • having helium, argon, neon, krypton, or xenon as the principle constituent · CPC title

  • Units having reflectors, e.g. coatings, baffles, plates, mirrors · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9718705B2 cover?
The invention relates to a device for producing UV light. Said device provides light from light sources that operate in accordance with different physical principles. The device comprises a chamber having several gas-filled plasma chambers ( 11, 12 ), wherein the chamber has at least one area ( 37, 39 ) transparent to UV light and/or VUV light. A first group ( 11 ) of plasma chambers is filled …
Who is the assignee on this patent?
Fraunhofer Ges Forschung, Sico Tech Gmbh
What technology area does this patent fall under?
Primary CPC classification C02F1/325. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 01 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).