Method of forming oriented block copolymer line patterns, block copolymer line patterns formed thereby, and their use to form patterned articles

Patent metadata

Field	Value
Publication number	US-9718094-B2
Application number	US-201514845488-A
Country	US
Kind code	B2
Filing date	Sep 4, 2015
Priority date	May 25, 2011
Publication date	Aug 1, 2017
Grant date	Aug 1, 2017

Abstract

A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.

First claim

The invention claimed is:

1. A structured article comprising:
a substrate comprising a surface comprising parallel facets characterized by a pitch, λ, having units of nanometers and corresponding to the separation between adjacent facets; and an annealed block copolymer film comprising a surface contacting the substrate surface comprising parallel facets;
wherein the annealed block copolymer film comprises linear microdomains parallel to the substrate surface and orthogonal to the parallel facets;
wherein the block copolymer in bulk comprises a hexagonal array of cylindrical microdomains characterized by a center-to-center spacing, L 2 , of adjacent cylindrical microdomains, wherein L 2 has units of nanometers;
wherein λ/L 2 is either less than or equal to 0.73 or greater than or equal to 1.4; and
wherein the structured article is prepared by a method comprising
forming a block copolymer film on the substrate surface comprising parallel facets; and
annealing the block copolymer film to form the annealed block copolymer film.

2. The structured article of claim 1 , wherein the linear microdomains have a center-to-center spacing of about 15 to about 60 nanometers.

3. The structured article of claim 1 , wherein the annealed block copolymer film has an order parameter, ƒ, of at least 0.95 over an area of at least 0.5 millimeter 2 .

4. The structured article of claim 1 , wherein the annealed block copolymer film has an order parameter, ƒ, over an area of at least 0.5 millimeter 2 that is greater than the corresponding order parameter for the substrate surface.

5. The structured article of claim 1 , wherein the block copolymer film comprises a block copolymer selected from the group consisting of polystyrene-b-poly(ethylene oxide), polystyrene-b-poly(2-vinylpyridine), polystyrene-b-poly(4-vinylpyridine), polystyrene-b-polybutadiene, polystyrene-b-polydimethylsiloxane, polystyrene-b-polylactide, and polystyrene-b-poly(methyl methacrylate).

6. The structured article of claim 1 , wherein the substrate consists essentially of a single crystal.

7. The structured article of claim 1 , wherein the substrate comprises a polymeric replica of a crystalline surface comprising parallel facets.

8. The structured article of claim 1 , wherein λ/L 2 is less than or equal to 0. 73.

9. The structured article of claim 1 , wherein λ/L 2 is greater than or equal to 1.4.

10. The structured article of claim 1 ,
wherein the block copolymer film has a thickness of about L 1 to about 2L 1 , wherein L 1 has units of nanometers and is a center-to-center domain spacing of cylindrical microdomains in bulk block copolymer;
wherein the block copolymer film comprises a polystyrene-b-poly(ethylene oxide);
wherein the polystyrene-b-poly(ethylene oxide) comprises about 65 to about 80 volume percent of a polystyrene block and about 20 to about 35 volume percent of a poly(ethylene oxide) block;
wherein the substrate comprises crystalline aluminum oxide or a poly(butylene terephthalate) replica of a crystalline aluminum oxide surface;
wherein the block copolymer film has an order parameter, ƒ, of at least 0.95 over an area of at least 0.5 millimeter 2 .

11. A structured article, comprising:
a substrate comprising a surface comprising parallel facets characterized by a pitch, λ, having units of nanometers and corresponding to the separation between adjacent facets; and
a block copolymer film comprising a surface contacting the substrate surface comprising parallel facets;
wherein the block copolymer film comprises linear microdomains parallel to the substrate surface and orthogonal to the parallel facets;
wherein the block copolymer in bulk comprises a hexagonal array of cylindrical microdomains characterized by a center-to-center spacing, L 2 , of adjacent cylindrical microdomains, wherein L 2 has units of nanometers; and
wherein λ/L 2 is either less than or equal to 0.73 or greater than or equal to 1.4.

12. The structured article of claim 11 , wherein the linear microdomains have a center-to-center spacing of about 15 to about 60 nanometers.

13. The structured article of claim 11 , wherein the annealed block copolymer film has an order parameter, ƒ, of at least 0.95 over an area of at least 0.5 millimeter 2 .

14. The structured article of claim 11 , wherein the annealed block copolymer film has an order parameter, ƒ, over an area of at least 0.5 millimeter 2 that is greater than the corresponding order parameter for the substrate surface.

15. The structured article of claim 11 , wherein the block copolymer film comprises a block copolymer selected from the group consisting of polystyrene-b-poly(ethylene oxide), polystyrene-b-poly(2-vinylpyridine), polystyrene-b-poly(4-vinylpyridine), polystyrene-b-polybutadiene, polystyrene-b-polydimethylsiloxane, polystyrene-b-polylactide, and polystyrene-b-poly(methyl methacrylate).

16. The structured article of claim 11 , wherein the substrate consists essentially of a single crystal.

17. The structured article of claim 11 , wherein the substrate comprises a polymeric replica of a crystalline surface comprising parallel facets.

18. The structured article of claim 11 , wherein λ/L 2 is less than or equal to 0. 73.

19. The structured article of claim 11 , wherein λ/L 2 is greater than or equal to 1.4.

20. The structured article of claim 11 ,
wherein the block copolymer film has a thickness of about L 1 to about 2L 1 , wherein L 1 has units of nanometers and is a center-to-center domain spacing of cylindrical microdomains in bulk block copolymer;
wherein the block copolymer film comprises a polystyrene-b-poly(ethylene oxide);
wherein the polystyrene-b-poly(ethylene oxide) comprises about 65 to about 80 volume percent of a polystyrene block and about 20 to about 35 volume percent of a poly(ethylene oxide) block;
wherein the substrate comprises crystalline aluminum oxide or a poly(butylene terephthalate) replica of a crystalline aluminum oxide surface;
wherein the block copolymer film has an order parameter, ƒ, of at least 0.95 over an area of at least 0.5 millimeter 2 .

Assignees

• Russell Thomas P
• Hong Sung Woo
• Lee Dong Hyun
• Park Soojin
• Xu Ting
• Unist Academy-Industry
• Univ California
• Univ Massachusetts

Inventors

• Russell Thomas P
• Hong Sung Woo
• Lee Dong Hyun
• Park Soojin
• Xu Ting

Classifications

• B05D3/107

  Post-treatment of applied coatings · CPC title

• B05D3/10

  by other chemical means · CPC title

• B81C1/00071

  Channels · CPC title

• B81C1/00063

  Trenches · CPC title

• B81C1/00079

  Grooves not provided for in groups B81C1/00063 - B81C1/00071 · CPC title