Method for manufacturing an electrode for lithium ion batteries

Patent metadata

Field	Value
Publication number	US-9716276-B2
Application number	US-201614986697-A
Country	US
Kind code	B2
Filing date	Jan 3, 2016
Priority date	Aug 1, 2009
Publication date	Jul 25, 2017
Grant date	Jul 25, 2017

Abstract

An electrode for lithium ion batteries, the electrode having a metal film which is inert to lithium ions and having a plurality of silicon nanowires protruding from the film, which are arranged on at least one flat side of the film, wherein sections of the nanowires are enclosed by the metal film.

First claim

The invention claimed is:

1. A method for manufacturing an electrode for lithium ion batteries, comprising the following steps:
(a) electrochemically etching a silicon wafer to form pores up to a predetermined pore depth P in a preselected arrangement;
(b) converting the pore walls, by overetching the pores, into upright nanowires attached to the wafer, the nanowires having a predetermined thickness; and
(c) forming a film of a predetermined thickness D from a metal which is inert to lithium ions, by electrodeposition on an etched side of the wafer,
wherein the metal film encloses attached ends of the nanowires, the nanowires are anchored in the metal film, and the nanowires protrude by a length of about P-D from a flat side of the metal film facing opposite to the wafer, wherein the predetermined thickness D is at least 1 micrometer;
wherein the metal film is detached from the wafer while the nanowires are torn off at the same time.

2. The method according to claim 1 , wherein the wafer including the metal film arranged thereon is heated, and the metal film detaches from the wafer due to thermal expansion differences between the metal film and the wafer.

3. A method for manufacturing an electrode for lithium ion batteries, comprising the following steps:
(a) electrochemically etching a silicon wafer to form pores up to a predetermined pore depth P in a preselected arrangement;
(b) converting the pore walls, overetching the pores, into upright nanowires attached to the wafer, the nanowires having a predetermined thickness; and
(c) forming a film of a predetermined thickness D from a metal which is inert to lithium ions, by electrodeposition on an etched side of the wafer,
wherein the metal film encloses attached ends of the nanowires, and the nanowires protrude by a length of about P-D from a flat side which is opposite to the wafer; and
(d) detaching the metal film from the wafer while the nanowires are torn off at the same time.

4. The method according to claim 3 , wherein the wafer including the metal film arranged thereon is heated, and the metal film detaches from the wafer due to thermal expansion differences between the metal film and the wafer.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Bahr Joerg
• Carstensen Juergen
• Foell Helmut
• Riemenschneider Oliver
• Hartz Hauke
• Ossei-Wusu Emmanuel

Classifications

• H01M4/661 Primary

  Metal or alloys, e.g. alloy coatings (H01M4/669 take precedence) · CPC title

• H01M4/0438 Primary

  by electrochemical processing (electroless electrochemical plating C23C18/54) · CPC title

• H01M4/386

  Silicon or alloys based on silicon · CPC title

• C25D1/20

  Separation of the formed objects from the electrodes {with no destruction of said electrodes} · CPC title

• H01M4/045

  Electrochemical coating; Electrochemical impregnation · CPC title