Method of forming a graphene structure

Patent metadata

Field	Value
Publication number	US-9716227-B2
Application number	US-201414587007-A
Country	US
Kind code	B2
Filing date	Dec 31, 2014
Priority date	Dec 31, 2014
Publication date	Jul 25, 2017
Grant date	Jul 25, 2017

Abstract

In various embodiments, a method of forming a graphene structure is provided. The method may include forming a body including at least one protrusion, and forming a graphene layer at an outer peripheral surface of the at least one protrusion.

First claim

What is claimed is:

1. A method of forming a graphene structure, comprising:
forming a body comprising a base and at least one protrusion extending from the base, wherein the body is a semiconductor body and the at least one protrusion comprises carbon-containing semiconductor material, wherein the carbon-containing semiconductor material is silicon carbide; and
forming, by thermal decomposition of the silicon carbide, a graphene layer surrounding an outer peripheral surface of the at least one protrusion from the silicon carbide of the at least one protrusion, wherein the graphene layer extends vertically and perpendicular to the base and comprises at least one carbon nanotube,
wherein a relative orientation of the silicon carbide and the at least one protrusion is such that faces of the outer surface of the at least one protrusion comprise a C-face and a Si-face, wherein the C-face and/or the Si-face are parallel to a (0001) plane of the silicon carbide.

2. The method of claim 1 ,
wherein forming the body comprising the at least one protrusion comprises providing a substrate, and forming at least one trench in the substrate.

3. The method of claim 1 ,
wherein forming the body comprising the at least one protrusion comprises providing a substrate, and epitaxially growing the at least one protrusion on the substrate.

4. The method of claim 1 , further comprising:
removing a portion of the protrusion that resides within the graphene layer.

5. The method of claim 1 , further comprising:
forming an opening in the at least one protrusion; and
forming a graphene layer on a surface of the opening.

6. The method of claim 1 ,
wherein the graphene layer at an outer peripheral surface of the at least one protrusion forms a closed surface.

7. The method of claim 1 ,
wherein forming the graphene layer comprises annealing the body.

8. The method of claim 7 ,
wherein one or more process parameters of the annealing are adjusted such that the at least one carbon nanotube is configured as a single-walled carbon nanotube.

9. The method of claim 8 ,
wherein the process parameters of the annealing comprise at least one of an annealing temperature, an annealing duration, an atmospheric pressure, and constituents of the atmosphere.

10. The method of claim 7 ,
wherein an annealing temperature is in a range from about 1150° C. to about 1800° C.

11. The method of claim 7 ,
wherein an annealing duration is in a range from about 5 minutes to about 60 minutes.

12. The method of claim 7 ,
wherein the at least one protrusion comprises silicon carbide, and a surface termination of the at least one protrusion is silicon.

13. The method of claim 1 , wherein the at least one protrusion comprises a first doped region having a first conductivity type, and a second doped region having a second conductivity type.

14. The method of claim 1 ,
wherein a diameter d of the protrusion is chosen to fulfill the relation d=78.3×((n+m) 2 −n×m) 0.5 pm, wherein n and m are integer values, at least one of n and m being greater than 0.

15. The method of claim 1 , further comprising:
detaching the at least one protrusion from a remaining portion of the body after forming the graphene layer.

16. The method of claim 4 , further comprising:
detaching at least one graphene layer from a remaining portion of the body.

17. The method of claim 1 ,
wherein the outer peripheral surface of the at least one protrusion is cylindrical.

18. The method of claim 1 ,
wherein at least one physical property of the graphene layer varies in an azimuthal direction of the protrusion.

19. A method of forming a graphene structure, the method comprising:
forming at least one structure with at least one cylindrical outer surface from a silicon carbide substrate, the at least one structure projecting from at least a base of the silicon carbide substrate; and
annealing the silicon carbide substrate so that graphene forms at the at least one cylindrical outer surface so as to form at least one cylindrical graphene structure, the straight cylindrical structure extending perpendicular to the base, wherein the graphene comprises at least one carbon nanotube,
wherein a relative orientation of the silicon carbide and the at least one structure is such that faces of the outer surface of the at least one structure comprise a C-face and a Si-face, wherein the C-face and/or the Si-face are parallel to a (0001) plane of the silicon carbide.

Assignees

• Infineon Technologies Ag

Inventors

• Schulze Hans-Joachim
• Irsigler Peter
• Ruhl Guenther

Classifications

• H10P14/3451

  Structure · CPC title

• H10P14/3406

  Carbon, e.g. diamond-like carbon · CPC title

• H10P14/2925

  Surface structures · CPC title

• H10P14/2904 Primary

  Silicon carbide · CPC title

• H10P14/2902 Primary

  being Group IVA materials · CPC title