Composition for forming passivation layer, semiconductor substrate having passivation layer, method of producing semiconductor substrate having passivation layer, photovoltaic cell element, method of producing photovoltaic cell element and photovoltaic cell

US9714262B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9714262-B2
Application numberUS-201314414865-A
CountryUS
Kind codeB2
Filing dateJul 19, 2013
Priority dateJul 19, 2012
Publication dateJul 25, 2017
Grant dateJul 25, 2017

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  1. Title

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Abstract

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A composition for forming a passivation layer, comprising a compound represented by Formula (I): M(OR 1 ) m . In Formula (I), M comprises at least one metal element selected from the group consisting of Nb, Ta, V, Y and Hf, each R 1 independently represents an alkyl group having from 1 to 8 carbon atoms or an aryl group having from 6 to 14 carbon atoms, and m represents an integer from 1 to 5.

First claim

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The invention claimed is: 1. A composition for forming a passivation layer, comprising a compound represented by the following Formula (I) and a compound represented by the following Formula (II): M(OR 1 ) m   (I) wherein, in Formula (I) and Formula (II), M comprises at least one metal element selected from the group consisting of Nb, Ta, V, Y and Hf, each R 1 independently represents an alkyl group having from 1 to 8 carbon atoms or an aryl group having from 6 to 14 carbon atoms, m represents an integer from 1 to 5, each R 2 independently represents an alkyl group having from 1 to 8 carbon atoms, n represents an integer from 1 to 3, each of X 2 and X 3 independently represents an oxygen atom or a methylene group, and each of R 3 , R 4 and R 5 independently represents a hydrogen atom or an alkyl group having from 1 to 8 carbon atoms, wherein the weight/weight ratio of the compound represented by Formula (I) and the compound represented by Formula (II) is from 50/50 to 90/10 and having a fixed charge density of from −7.8×10 9 to −8.3×10 11 . 2. The composition for forming a passivation layer according to claim 1 , further comprising a liquid medium. 3. The composition for forming a passivation layer according to claim 1 , further comprising a resin. 4. The composition for forming a passivation layer according to claim 3 , wherein the composition further comprising a liquid medium, and a total content of the liquid medium and the resin being from 5% by mass to 98% by mass based on the total content of the composition. 5. The composition for forming a passivation layer according to claim 1 , wherein a total content of the compound represented by Formula (I) and the compound represented by Formula (II) being from 0.1% by mass to 80% by mass based on the total content of the composition. 6. A semiconductor substrate having a passivation layer, comprising: the semiconductor substrate; and the passivation layer that is a thermally-treated product of the composition for forming a passivation layer according to claim 1 that is provided at an entire or partial surface of the semiconductor substrate. 7. A photovoltaic cell element, comprising: a semiconductor substrate having a pn junction of a p-type layer and an n-type layer; a passivation layer that is a thermally-treated product of the composition for forming a passivation layer according to claim 1 and that is provided at an entire or partial surface of the semiconductor substrate; and an electrode provided at at least one of the p-type layer or the n-type layer. 8. A photovoltaic cell, comprising; the photovoltaic cell element according to claim 7 ; and a wiring material provided on the electrode of the photovoltaic cell element.

Assignees

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Classifications

  • Photovoltaic [PV] energy · CPC title

  • without C-Metal linkages · CPC title

  • C07F9/005Primary

    Compounds of elements of Group 5 of the Periodic Table without metal-carbon linkages · CPC title

  • without C-aluminium linkages · CPC title

  • Cross-Sectional Technologies · mapped topic

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What does patent US9714262B2 cover?
A composition for forming a passivation layer, comprising a compound represented by Formula (I): M(OR 1 ) m . In Formula (I), M comprises at least one metal element selected from the group consisting of Nb, Ta, V, Y and Hf, each R 1 independently represents an alkyl group having from 1 to 8 carbon atoms or an aryl group having from 6 to 14 carbon atoms, and m represents an integer from 1 to 5.
Who is the assignee on this patent?
Hitachi Chemical Co Ltd
What technology area does this patent fall under?
Primary CPC classification C07F9/005. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 25 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).