Copper foil having uniform thickness and methods for manufacturing the copper foil

US9711799B1 · US · B1

Patent metadata
FieldValue
Publication numberUS-9711799-B1
Application numberUS-201615284011-A
CountryUS
Kind codeB1
Filing dateOct 3, 2016
Priority dateOct 3, 2016
Publication dateJul 18, 2017
Grant dateJul 18, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present disclosure relates to an improved electrodeposited copper foil having uniform thickness and methods for manufacturing the electrodeposited copper foil. The electrodeposited copper foil typically has one to four interfacial lines through the cross-sectional area of the foil and a weight deviation less than 2.0%. The disclosure also relates to a process for making the electrodeposited copper foil that includes the addition of one or more insulative masks to the surface of a dimensionally stable anode. The insulative mask is cut to correspond to areas of variation in electrodeposited copper foil, such that the mask causes interferences with the electrodeposition process to even out the variation.

First claim

Opening claim text (preview).

The invention claimed is: 1. An electrodeposited copper foil comprising: (a) 1 to 4 interfacial lines through the cross-sectional area of the foil; and (b) a weight deviation less than 2.0%. 2. The electrodeposited copper foil of claim 1 , wherein the (b) weight deviation is less than 1.6%. 3. The electrodeposited copper foil of claim 2 , wherein the (b) weigh deviation is 1.4 to 1.6%. 4. The electrodeposited copper foil of claim 1 , further comprising: (c) a deposited side having a surface roughness (Rz) of 2 μm or less. 5. The electrodeposited copper foil of claim 1 comprising a deposited side with a surface roughness (Rz) of 1.43 μm to 1.93 μm. 6. The electrodeposited copper foil of claim 1 , further comprising: (d) a tensile strength of 30 kgf/mm 2 to 40 kgf/mm 2 . 7. A negative electrode comprising a negative active material layer on a negative current collector, wherein the negative current collector comprises an electrodeposited copper foil of claim 1 . 8. The negative electrode of claim 7 , wherein the negative active material layer contains carbon material. 9. The negative electrode of claim 8 , wherein the carbon material is selected from the group consisting of non-graphitizing carbon, artificial graphite, coke, graphite, glasslike carbon, carbon fiber, activated carbon, and carbon black. 10. A lithium ion secondary battery comprising a positive electrode, the negative electrode according to claim 7 , a separator interposed between the positive electrode and negative electrode, and an electrolyte. 11. The lithium ion secondary battery of claim 10 , wherein the positive electrode comprises a composite lithium oxide. 12. An electronic device comprising the lithium ion secondary battery of claim 11 selected from the group consisting of a power tool, an electric vehicle, a cell phone, a tablet, and a portable electronic device. 13. A printed circuit board comprising the electrodeposited copper foil according to claim 1 . 14. A process for making the electrodeposited copper foil of claim 1 comprising: a. preparing a copper sulfate electrolytic solution around at least a portion of a drum that is connected to a negative charge; b. positioning one or more insulative masks on the surface of a dimensionally stable anode; c. performing an electrochemical reaction on the copper sulfate electrolytic solution, so as to obtain on the drum the electrodeposited copper foil comprising: (i) 1 to 4 interfacial lines through the cross-sectional area of the foil; and (ii) a weight deviation less than 2.0%. 15. The method of claim 14 , wherein the one or more insulative masks cover from 6% to 12% of the area of the dimensionally stable anode. 16. An electrodeposited copper foil comprising: (a) 1 to 4 interfacial lines through the cross-sectional area of the foil; (b) a weight deviation less than 2.0%; (c) a deposited side having a surface roughness (Rz) of 2 μm or less; and (d) a tensile strength of 30 kgf/mm 2 to 40 kgf/mm 2 . 17. The electrodeposited copper foil of claim 16 , wherein the (b) weight deviation is less than 1.6%. 18. The electrodeposited copper foil of claim 16 , wherein the (b) weight deviation is 1.4 to 1.6%. 19. The electrodeposited copper foil of claim 16 , wherein the deposited side has a surface roughness (Rz) of 1.43 μm to 1.93 μm.

Assignees

Inventors

Classifications

  • for inserting or intercalating light metals · CPC title

  • Batteries in portable systems, e.g. mobile phone, laptop · CPC title

  • Negative electrodes · CPC title

  • H01M4/64Primary

    Carriers or collectors · CPC title

  • Electrodes based on carbonaceous material, e.g. graphite-intercalation compounds or CFx · CPC title

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Frequently asked questions

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What does patent US9711799B1 cover?
The present disclosure relates to an improved electrodeposited copper foil having uniform thickness and methods for manufacturing the electrodeposited copper foil. The electrodeposited copper foil typically has one to four interfacial lines through the cross-sectional area of the foil and a weight deviation less than 2.0%. The disclosure also relates to a process for making the electrodeposited…
Who is the assignee on this patent?
Chang Chun Petrochemical Co Ltd
What technology area does this patent fall under?
Primary CPC classification H01M4/64. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 18 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).