Curved face diffraction grating fabrication method, curved face diffraction grating cast, and curved face diffraction grating employing same

US9709714B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9709714-B2
Application numberUS-201314406168-A
CountryUS
Kind codeB2
Filing dateJun 3, 2013
Priority dateJun 8, 2012
Publication dateJul 18, 2017
Grant dateJul 18, 2017

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A curved surface diffraction grating fabrication method for fabricating a curved surface diffraction grating having a desired curvature with high accuracy, includes: a step of forming a diffraction grating pattern on a flat-shaped silicon substrate; a step of curving the silicon substrate on which the diffraction grating pattern is formed, by pressing, in a heated state, a fixing substrate having a shape with a desired curved surface onto the silicon substrate and of fixing the silicon substrate on which the diffraction grating pattern is formed to the fixing substrate having the shape with the curved surface, to fabricate a curved surface diffraction grating cast; and a step of bringing a member having flexibility into contact with the curved surface diffraction grating cast, to transfer the diffraction grating pattern to the member.

First claim

Opening claim text (preview).

What is claimed is: 1. A curved surface diffraction grating fabrication method, comprising: a step of forming a film of silicon oxide or silicon nitride on a flat-shaped silicon substrate; a step of forming a diffraction grating pattern on the silicon oxide or the silicon nitride; a step of spherically or toroidally curving the silicon substrate on which the diffraction grating pattern is formed, by pressing, in a heated state, a curved surface substrate having a shape with a spherical or toroidal surface onto the silicon substrate; a step of fixing the spherically or toroidally curved silicon substrate to a fixing substrate having a curved surface, to fabricate a spherically or toroidally curved surface diffraction grating cast; and a step of bringing a member having flexibility into contact with the spherically or toroidally curved surface diffraction grating cast, to transfer the diffraction grating pattern to the member. 2. The curved surface diffraction grating fabrication method according to claim 1 , wherein the pressing of the curved surface substrate having the shape with the spherical or toroidal surface onto the silicon substrate on which the diffraction grating pattern is formed, in the heated state, is conducted under a hydrogen atmosphere. 3. The curved surface diffraction grating fabrication method according to claim 1 , wherein the spherical or toroidal silicon substrate on which the diffraction grating pattern is formed and the fixing substrate are anodically bonded. 4. The curved surface diffraction grating fabrication method according to claim 1 , wherein the spherical or toroidal silicon substrate on which the diffraction grating pattern is formed and the fixing substrate are bonded by an adhesive layer. 5. The curved surface diffraction grating fabrication method according to claim 1 , wherein the fixing substrate is made from heat-resistant glass.

Assignees

Inventors

Classifications

  • Moulds for lenses (moulds for plastic articles in general B29C33/00) · CPC title

  • Producing diffraction gratings · CPC title

  • B29C59/02Primary

    by mechanical means, e.g. pressing {(B29C59/007 takes precedence; embossing expanded porous articles B29C44/5627)} · CPC title

  • Optical elements · CPC title

  • using mechanical means, e.g. ruling with diamond tool, moulding · CPC title

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What does patent US9709714B2 cover?
A curved surface diffraction grating fabrication method for fabricating a curved surface diffraction grating having a desired curvature with high accuracy, includes: a step of forming a diffraction grating pattern on a flat-shaped silicon substrate; a step of curving the silicon substrate on which the diffraction grating pattern is formed, by pressing, in a heated state, a fixing substrate havi…
Who is the assignee on this patent?
Hitachi High Tech Corp
What technology area does this patent fall under?
Primary CPC classification B29C59/02. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jul 18 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).