Method and device for differential signal channel length compensation in electronic system

US9706642B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9706642-B2
Application numberUS-86991010-A
CountryUS
Kind codeB2
Filing dateAug 27, 2010
Priority dateAug 27, 2010
Publication dateJul 11, 2017
Grant dateJul 11, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Embodiments of the present invention are directed to providing a time delay to a shortened trace in a differential microstrip trace pair. By adding back metal to a ground plane associated with a DC blocking capacitor, a time delay can be added to the shortened trace. The cutout associated with the longer trace remains unaltered. In a further embodiment, both cutouts can be modified with the addition of metal, with the cutout associated with the shorter trace receiving more metal than the other cutout. In a further embodiment of the present invention, a cutout associated with a connector can be modified to add back metal in the cutout. The cutout associated with the shorter trace is modified while the other cutout is left unchanged.

First claim

Opening claim text (preview).

What is claimed is: 1. A substrate, comprising: a first metal layer including a first trace and a second trace; a second metal layer including a ground plane; a dielectric layer arranged between the first and second metal layers; a first solder pad and a second solder pad connected to the first trace and the second trace respectively; and a first cutout and a second cutout in the ground plane corresponding with the first solder pad and the second solder pad respectively, wherein a length of the second trace is shorter than a length of the first trace, wherein an open area of the second cutout is less than an open area of the first cutout, wherein the ground plane is a single-layer ground plane, and wherein the second cutout includes a second perimeter that is substantially the same as a first perimeter of the first cutout, and the second cutout includes patterned metal interior to the second cutout. 2. The substrate of claim 1 , wherein the first metal layer further comprises a top layer of the substrate. 3. The substrate of claim 1 , wherein the second metal layer further comprises a bottom layer of the substrate. 4. The substrate of claim 1 , wherein the patterned metal interior of the second cutout comprises one or more metal members that extend across an inner space of the second cutout. 5. The substrate of claim 4 , wherein the one or more metal members includes at least one metal member that is perpendicular to another metal member. 6. The substrate of claim 1 , wherein the first trace, second trace, ground plane and dielectric layer form a differential microstrip transmission line. 7. The substrate of claim 1 , wherein the first solder pad and the second solder pad are associated with DC blocking capacitors. 8. The substrate of claim 1 , wherein the first solder pad and the second solder pad are associated with printed circuit board connectors. 9. The substrate of claim 1 , wherein the first solder pad and the second solder pad are vertically aligned with the first cutout and the second cutout respectively. 10. The substrate of claim 1 , wherein the first cutout is not contiguous with the second cutout. 11. A method of manufacturing a substrate, comprising: providing a dielectric layer between a first metal layer and a second metal layer; providing a ground plane on the second metal layer; providing first and second traces on the first metal layer, wherein the first and second traces include first and second solder pads respectively, and wherein the second trace is shorter than the first trace; and providing a first cutout and a second cutout in the ground plane, wherein the first and second cutouts correspond with the first and second solder pads respectively, an open area of the second cutout is smaller than an open area of the first cutout, wherein the ground plane is a single-layer ground plane, and wherein the providing the second cutout includes providing the second cutout with a second perimeter that is substantially the same as a first perimeter of the first cutout, and the second cutout includes patterned metal interior to the second cutout. 12. The method of claim 11 , wherein the first metal layer further comprises a top layer of the substrate. 13. The method of claim 11 , wherein the second metal layer further comprises a bottom layer of the substrate. 14. The method of claim 11 , wherein the providing the second cutout includes providing the patterned metal interior to the second cutout that comprises one or more metal members that extend across the open area of the second cutout. 15. The method of claim 14 , wherein the providing the second cutout includes providing one or more metal members that include at least one metal member that is perpendicular to another metal member. 16. The method of claim 11 , wherein the providing the dielectric layer, the first and second metal layers, the ground plane, and the first and second traces includes forming a differential microstrip transmission line. 17. The method of claim 11 , wherein the providing the first solder pad and the second solder pad is associated with a subsequent process of coupling DC blocking capacitors. 18. The method of claim 11 , wherein the providing the first solder pad and the second solder pad is associated with a subsequent process of coupling printed circuit board connectors. 19. The method of claim 11 , wherein the providing the first solder pad and the second solder pad includes vertically aligning the first solder pad and the second solder pad with the first cutout and the second cutout respectively. 20. A substrate, comprising: a first metal layer including a first trace and a second trace; a second metal layer including a ground plane; a dielectric layer arranged between the first and second metal layers; a first solder pad and a second solder pad connected to the first trace and the second trace respectively; and a first cutout and a second cutout in the ground plane corresponding with the first solder pad and the second solder pad respectively, the first cutout and the second cutout having a first patterned metal interior and a second patterned metal interior respectively, wherein a length of the second trace is shorter than a length of the first trace, wherein the first patterned metal interior is different from the second patterned metal interior, and wherein the ground plane is a single-layer ground plane.

Assignees

Inventors

Classifications

  • with two longitudinal conductors · CPC title

  • Lay-out of balanced signal pairs, e.g. differential lines or twisted lines · CPC title

  • Leadless chip, e.g. chip capacitor or resistor · CPC title

  • Single or multiple openings in a shielding, ground or power plane (H05K1/0227 takes precedence) · CPC title

  • H05K1/0253Primary

    Impedance adaptations of transmission lines by special lay-out of power planes, e.g. providing openings (H05K1/0251 takes precedence) · CPC title

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What does patent US9706642B2 cover?
Embodiments of the present invention are directed to providing a time delay to a shortened trace in a differential microstrip trace pair. By adding back metal to a ground plane associated with a DC blocking capacitor, a time delay can be added to the shortened trace. The cutout associated with the longer trace remains unaltered. In a further embodiment, both cutouts can be modified with the add…
Who is the assignee on this patent?
Lin Shengli, Avago Technologies General Ip
What technology area does this patent fall under?
Primary CPC classification H05K1/0253. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 11 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).