Photocured product and method for producing the same

Patent metadata

Field	Value
Publication number	US-9704710-B2
Application number	US-201314371293-A
Country	US
Kind code	B2
Filing date	Jan 31, 2013
Priority date	Feb 9, 2012
Publication date	Jul 11, 2017
Grant date	Jul 11, 2017

Abstract

It is intended to provide a photocured product that is prepared using the photo-imprint method and has favorable pattern precision and improvement in pattern defects. The present invention provides a photocured product obtained by irradiating a coating film in contact with a mold with light, the photocured product containing a fluorine atom-containing surfactant, wherein of secondary ion signals obtained by the surface analysis of the photocured product based on time-of-flight secondary ion mass spectrometry, the intensity of a C 2 H 5 O + ion signal is higher than that of a C 3 H 7 O + ion signal.

First claim

The invention claimed is:

1. A photocured product obtained by irradiating a photocurable composition in contact with a mold with light, the photocured product containing a fluorine atom-containing surfactant represented by:
R 1 - x 1 -R 2 - x 2 -R 3   (1),

wherein R 1 represents a perfluoroalkyl group, R 2 represents a divalent substituent containing ethylene oxide, R 3 represents a polar functional group selected from an alkylhydroxyl group, a carboxyl group, a thiol group, a pyridyl group, a silanol group, and a sulfo group, and x 1 and x 2 each represent a single bond or a divalent substituent,
wherein a ratio of the fluorine atom-containing surfactant to the photo cured product is 0.001% by weight to 5% by weight, and
wherein of secondary ion signals obtained by a surface analysis of the photocured product based on time-of-flight secondary ion mass spectrometry, an intensity of a C 2 H 5 O + ion signal is higher than that of a C 3 H 7 O + ion signal.

2. The photocured product according to claim 1 , wherein the fluorine atom-containing surfactant is F(CF 2 ) 6 CH 2 (OCH 2 CH 2 ) 6 OH.

Assignees

• Canon Kk

Inventors

• Murayama Yohei
• Ito Toshiki
• Mihara Chieko
• Okinaka Motoki

Classifications

• H10P50/692

  characterised by their composition, e.g. multilayer masks or materials · CPC title

• H10P76/2041 Primary

  Photolithographic processes · CPC title

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• G03F7/0046

  with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title

• B82Y15/00

  Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors · CPC title