Method of Fabricating an Integrated Circuit with a Pattern Density-Outlier-Treatment for Optimized Pattern Density Uniformity
US-2015371821-A1 · Dec 24, 2015 · US
US9703911B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9703911-B2 |
| Application number | US-201514700563-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 30, 2015 |
| Priority date | Apr 30, 2015 |
| Publication date | Jul 11, 2017 |
| Grant date | Jul 11, 2017 |
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A method includes converting a first threshold voltage related (VT-related) cell of a first standard cell library to a first modified VT-related cell. The first standard cell library includes the first VT-related cell and a first base cell. The first VT-related cell and the first base cell each include different portions of a layout design of a first standard cell corresponding to a first performance setting. The method includes generating a second standard cell library based on the first base cell and the first modified VT-related cell. The first modified VT-related cell and the first base cell each include different portions of a layout design of a second standard cell corresponding to a second performance setting. The method further includes generating a layout design for an integrated circuit based on the second standard cell library; and forming a set of masks based on the layout design.
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What is claimed is: 1. A method, comprising: converting a first threshold voltage related (VT-related) cell of a first standard cell library to a first modified VT-related cell, the first standard cell library comprising the first VT-related cell and a first base cell, the first VT-related cell and the first base cell each comprising different portions of a layout design of a first standard cell corresponding to a first performance setting, the different portions being overlaid to obtain the layout design of the first standard cell; generating a second standard cell library based on the first base cell and the first modified VT-related cell, the first modified VT-related cell and the first base cell each comprising different portions of a layout design of a second standard cell corresponding to a second performance setting; generating a layout design for an integrated circuit based on the second standard cell library; and forming a set of masks based on the layout design. 2. The method of claim 1 , further comprising: converting a plurality of VT-related cells of the first standard cell library to a first plurality of modified VT-related cells, comprising: converting the first VT-related cell of the first standard cell library to the first modified VT-related cell, the first plurality of modified VT-related cells comprising the first modified VT-related cell; and converting a second VT-related cell of the first standard cell library to a second modified VT-related cell, the first plurality of modified VT-related cells comprising the second modified VT-related cell; and converting the first plurality of modified VT-related cells to a second plurality of modified VT-related cells, comprising: restoring the second VT-related cell of the first standard cell library to replace the second modified VT-related cell, wherein generating the second standard cell library is performed based on the second plurality of modified VT-related cells and a plurality of base cells corresponding to the plurality of VT-related cells of the first standard cell library, the plurality of base cells comprising the first base cell. 3. The method of claim 2 , further comprising: identifying the second VT-related cell of the first standard cell library based on matching at least a portion of a cell name of the second VT-related cell with one or more predetermined strings prior to performing restoring the second VT-related cell. 4. The method of claim 2 , wherein converting the plurality of VT-related cells of the first standard cell library to the first plurality of modified VT-related cells comprises: replacing a first sub-set of the first plurality of VT-related cells corresponding to a first transistor threshold voltage setting with a first sub-set of the first plurality of modified VT-related cells corresponding to a second transistor threshold voltage. 5. The method of claim 4 , wherein converting the plurality of VT-related cells of the first standard cell library to the first plurality of modified VT-related cells further comprises: replacing a second sub-set of the first plurality of VT-related cells corresponding to the second transistor threshold voltage setting with a second sub-set of the first plurality of modified VT-related cells corresponding to a third transistor threshold voltage. 6. The method of claim 1 , further comprising: identifying a second VT-related cell of the first standard cell library based on matching at least a portion of a cell name of the second VT-related cell with one or more predetermined strings, wherein generating the second standard cell library is performed further based on the second VT-related cell and a second base cell of the first standard cell library corresponding to the second VT-related cell. 7. The method of claim 1 , wherein the first VT-related cell, the first modified VT-related cell, and the first base cell are stored in a non-transitory storage device in a manner consistent with a Graphic Database System (GDS) file format. 8. A method, comprising: converting a first set of threshold voltage related (VT-related) cells of a first standard cell library to a first set of modified VT-related cells, the first set of VT-related cells corresponding to a first transistor threshold voltage setting, and the first set of modified VT-related cells corresponding to a second transistor threshold voltage setting; generating a second standard cell library to include a first set of base cells of the first standard cell library and the first set of modified VT-related cells; generating a layout design for an integrated circuit based on the second standard cell library, generating the layout design comprising overlaying a base cell of the first set of base cells and a corresponding modified VT-related cell of the first set of modified VT-related cells; and forming a set of masks based on the layout design. 9. The method of claim 8 , further comprising: identifying a second set of VT-related cells of the first standard cell library based on a configuration setting, wherein generating the second standard cell library comprises causing the second standard cell library to further include the second set of VT-related cells of the first standard cell library and a second set of base cells of the first standard cell library corresponding to the second set of VT-related cells of the first standard cell library. 10. The method of claim 9 , wherein identifying the second set of VT-related cells of the first standard cell library comprises: matching at least a portion of cell names of the second set of VT-related cells with one or more predetermined strings. 11. The method of claim 9 , further comprising: prior to performing identifying the second set of VT-related cells of the first standard cell library: converting the second set of VT-related cells of the first standard cell library to a second set of modified VT-related cells; and compiling a set of temporary VT-related cells that includes the first set of modified VT-related cells and the second set of modified VT-related cells; and after performing identifying the second set of VT-related cells of the first standard cell library: restoring the second set of VT-related cells of the first standard cell library to replace the second set of modified VT-related cells in the set of temporary VT-related cells. 12. The method of claim 8 , further comprising: converting a second set of VT-related cells of the first standard cell library to a second set of modified VT-related cells, the second set of VT-related cells corresponding to the second transistor threshold voltage setting, and the second set of modified VT-related cells corresponding to a third transistor threshold voltage setting, wherein generating the second standard cell library comprises causing the second standard cell library to further include the second set of modified VT-related cells and a second set of base cells corresponding to the second set of VT-related cells of the first standard cell library. 13. The method of claim 8 , wherein the first set of base cells of the first standard cell library, the first set of VT-related cells of the first standard cell library, and the first set of modified VT-related cells are stored in a non-transitory storage device in a manner consistent with a Graphic Database System (GDS) file format. 14. A method, comprising: converting a first standard cell library corresponding to a first performance setting to a second standard cell library corresponding to a second performance setting, the first standard cell library comprising a first set of threshol
Configuration CAD, e.g. designing by assembling or positioning modules selected from libraries of predesigned modules · CPC title
Circuit design at the physical level (physical level design for reconfigurable circuits G06F30/347) · CPC title
Floor-planning or layout, e.g. partitioning or placement · CPC title
Physics · mapped topic
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