Method of manufacturing color conversion substrate

Patent metadata

Field	Value
Publication number	US-9703191-B2
Application number	US-201615254228-A
Country	US
Kind code	B2
Filing date	Sep 1, 2016
Priority date	Sep 2, 2015
Publication date	Jul 11, 2017
Grant date	Jul 11, 2017

Abstract

A method of manufacturing a color conversion substrate includes preparing a substrate including a first pixel region, a second pixel region, and a third pixel region, forming a first color conversion portion corresponding to the first pixel region, forming a second color conversion portion corresponding to the second pixel region, and forming a third color conversion portion corresponding to the third pixel region. The providing the first color conversion portion includes providing a first color filter of a first color corresponding to the first pixel region, providing a first transparent pattern corresponding to the first pixel region, and providing a first pattern layer corresponding to the first pixel region and including a first material which converts light incident thereto into light of the first color, where the first transparent pattern is provided between the first color filter and the first pattern layer.

First claim

What is claimed is:

1. A method of manufacturing a color conversion substrate, the method comprising:
preparing a substrate on which a first pixel region, a second pixel region and a third pixel region are defined;
providing a first color conversion portion corresponding to the first pixel region on the substrate;
providing a second color conversion portion corresponding to the second pixel region on the substrate; and
providing a third color conversion portion corresponding to the third pixel region on the substrate, wherein
the providing the first color conversion portion comprises:
providing a first color filter of a first color corresponding to the first pixel region;
providing a first transparent pattern corresponding to the first pixel region; and
providing a first pattern layer corresponding to the first pixel region and comprising a first material which converts light incident thereto into light of the first color,
wherein the first transparent pattern is provided between the first color filter and the first pattern layer.

2. The method of claim 1 , wherein the first material comprises a quantum dot.

3. The method of claim 1 , wherein the first color filter and the first pattern layer are provided using a same mask.

4. The method of claim 1 , wherein the providing the first pattern layer comprises:
providing a first photosensitive material layer comprising the first material on the substrate;
exposing a portion of the first photosensitive material layer using a first mask in which an opening is defined; and
forming the first pattern layer by removing one of a non-exposed portion and the exposed portion of the first photosensitive material layer.

5. The method of claim 4 , wherein the providing the first color filter comprises:
providing a first photosensitive pigment layer comprising a pigment of the first color on the substrate;
exposing a portion of the first photosensitive pigment layer using the first mask; and
forming the first color filter by removing one of a non-exposed portion and the exposed portion of the first photosensitive pigment layer.

6. The method of claim 4 , wherein the providing the first transparent pattern comprises:
providing a transparent material layer on the substrate; and
patterning the transparent material layer using the first pattern layer corresponding to the first pixel region as a mask.

7. The method of claim 1 , wherein the providing the second color conversion portion comprises:
providing a second color filter of a second color corresponding to the second pixel region;
providing a second transparent pattern corresponding to the second pixel region; and
providing a second pattern layer corresponding to the second pixel region and comprising a second material which converts light incident thereto into light of the second color.

8. The method of claim 7 , wherein the second transparent pattern is provided between the second color filter and the second pattern layer.

9. The method of claim 7 , wherein the second material comprises a quantum dot.

10. The method of claim 7 , wherein
the providing the second pattern layer comprises:
providing a second photosensitive material layer comprising the second material on the substrate; and
exposing a portion of the second photosensitive material layer using a second mask, in which an opening is defined, and

the providing the second color filter comprises:
providing a second photosensitive pigment layer comprising a pigment of the second color on the substrate; and
exposing a portion of the second photosensitive pigment layer using the second mask.

11. The method of claim 10 , wherein the portion of the second photosensitive material layer and the portion of the second photosensitive pigment layer are simultaneously exposed using the second mask.

12. The method of claim 1 , wherein the providing the third color conversion portion comprises:
providing a third color filter of a third color corresponding to the third pixel region;
providing a third transparent pattern corresponding to the third pixel region; and
providing a third pattern layer corresponding to the third pixel region.

13. The method of claim 12 , wherein the third pattern layer has light transmittance such that light incident thereto is transmitted therethrough.

14. The method of claim 13 , wherein the third pattern layer comprises a scatterer.

15. The method of claim 13 , wherein the third pattern layer comprises a third material which converts light incident thereto into light of the third color.

16. The method of claim 1 , further comprising:
providing a light-shielding layer between adjacent pixel regions from among the first pixel region, the second pixel region and the third pixel region.

17. The method of claim 1 , further comprising:
providing a reflective filter on the first color conversion portion.

18. The method of claim 1 , wherein the reflective filter covers the first pixel region, the second pixel region and the third pixel region.

Assignees

• Samsung Display Co Ltd

Inventors

• Park Kisoo
• Kim Yongseok
• Kim Youngmin
• Park Haeil
• Lee Boram

Classifications

• G02F2001/133614

  Physics · mapped topic

• G02F1/133621

  providing coloured light (G02F1/133617, G02F1/133533 take precedence) · CPC title

• G03F7/20

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

• G02B5/26

  Reflecting filters (G02B5/28 takes precedence) · CPC title

• G02B5/201

  in the form of arrays · CPC title