Forming method of thermal insulation film

US9702052B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9702052-B2
Application numberUS-201514933599-A
CountryUS
Kind codeB2
Filing dateNov 5, 2015
Priority dateNov 7, 2014
Publication dateJul 11, 2017
Grant dateJul 11, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A forming method of a thermal insulation film, including: a first step of forming an anode oxidation coating film on an aluminum-based wall surface, the anode oxidation coating film including micro-pores each having a diameter of micrometer-scale and nano-pores each having a diameter of nanometer-scale; a second step of abrading a surface of the anode oxidation coating film with abrasive powders and bringing the abrasive powders into the micro-pores located at the formed abraded surface; and a third step of forming a protection film on the abraded surface to produce a thermal insulation film including the anode oxidation coating film and the protection film.

First claim

Opening claim text (preview).

What is claimed is: 1. A forming method of a thermal insulation film, comprising: a first step of forming an anode oxidation coating film on an aluminum-based wall surface, the anode oxidation coating film including micro-pores each having a diameter of micrometer-scale and nano-pores each having a diameter of nanometer-scale; a second step of abrading a surface of the anode oxidation coating film with abrasive powders to a prescribed depth to form an abraded surface and bringing the abrasive powders into the micro-pores located at the abraded surface; and a third step of forming a protection film on the abraded surface to produce a thermal insulation film including the anode oxidation coating film and the protection film, wherein the abrading reduces a thickness of the anode oxidation coating film in a direction from the surface of the anode oxidation coating film toward the aluminum-based wall surface. 2. The forming method of a thermal insulation film according to claim 1 , wherein the micro-pores at the abraded surface formed in the second step have a depth in a range from 1 to 10 μm, and the abrasive powders have an average particle size in a range below 1 μm. 3. The forming method of a thermal insulation film according to claim 2 , wherein the average particle size of the abrasive powders is above 100 nm. 4. The forming method of a thermal insulation film according to claim 1 , wherein in the third step, a polymer containing Si is coated on the abraded surface, and is fired to be converted into silicon dioxide, so as to form the protection film. 5. The forming method of a thermal insulation film according to claim 1 , wherein the abrasive powders brought into the micro-pores are adhered to each other by the protection film. 6. The forming method of a thermal insulation film according to claim 1 , wherein the aluminum-based wall surface is a wall surface of a combustion chamber of an internal combustion engine. 7. The forming method of a thermal insulation film according to claim 1 , wherein the reduction of the thickness is in the order of micrometers.

Assignees

Inventors

Classifications

  • for sealing layers · CPC title

  • C25D11/18Primary

    After-treatment, e.g. pore-sealing · CPC title

  • of aluminium or alloys based thereon · CPC title

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Frequently asked questions

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What does patent US9702052B2 cover?
A forming method of a thermal insulation film, including: a first step of forming an anode oxidation coating film on an aluminum-based wall surface, the anode oxidation coating film including micro-pores each having a diameter of micrometer-scale and nano-pores each having a diameter of nanometer-scale; a second step of abrading a surface of the anode oxidation coating film with abrasive powder…
Who is the assignee on this patent?
Toyota Motor Co Ltd, Toyota Chuo Kenkyusho Kk
What technology area does this patent fall under?
Primary CPC classification C25D11/18. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 11 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).