Components of an electronic device and methods for their assembly
US-2024431057-A1 · Dec 26, 2024 · US
US9702052B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9702052-B2 |
| Application number | US-201514933599-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 5, 2015 |
| Priority date | Nov 7, 2014 |
| Publication date | Jul 11, 2017 |
| Grant date | Jul 11, 2017 |
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A forming method of a thermal insulation film, including: a first step of forming an anode oxidation coating film on an aluminum-based wall surface, the anode oxidation coating film including micro-pores each having a diameter of micrometer-scale and nano-pores each having a diameter of nanometer-scale; a second step of abrading a surface of the anode oxidation coating film with abrasive powders and bringing the abrasive powders into the micro-pores located at the formed abraded surface; and a third step of forming a protection film on the abraded surface to produce a thermal insulation film including the anode oxidation coating film and the protection film.
Opening claim text (preview).
What is claimed is: 1. A forming method of a thermal insulation film, comprising: a first step of forming an anode oxidation coating film on an aluminum-based wall surface, the anode oxidation coating film including micro-pores each having a diameter of micrometer-scale and nano-pores each having a diameter of nanometer-scale; a second step of abrading a surface of the anode oxidation coating film with abrasive powders to a prescribed depth to form an abraded surface and bringing the abrasive powders into the micro-pores located at the abraded surface; and a third step of forming a protection film on the abraded surface to produce a thermal insulation film including the anode oxidation coating film and the protection film, wherein the abrading reduces a thickness of the anode oxidation coating film in a direction from the surface of the anode oxidation coating film toward the aluminum-based wall surface. 2. The forming method of a thermal insulation film according to claim 1 , wherein the micro-pores at the abraded surface formed in the second step have a depth in a range from 1 to 10 μm, and the abrasive powders have an average particle size in a range below 1 μm. 3. The forming method of a thermal insulation film according to claim 2 , wherein the average particle size of the abrasive powders is above 100 nm. 4. The forming method of a thermal insulation film according to claim 1 , wherein in the third step, a polymer containing Si is coated on the abraded surface, and is fired to be converted into silicon dioxide, so as to form the protection film. 5. The forming method of a thermal insulation film according to claim 1 , wherein the abrasive powders brought into the micro-pores are adhered to each other by the protection film. 6. The forming method of a thermal insulation film according to claim 1 , wherein the aluminum-based wall surface is a wall surface of a combustion chamber of an internal combustion engine. 7. The forming method of a thermal insulation film according to claim 1 , wherein the reduction of the thickness is in the order of micrometers.
for sealing layers · CPC title
After-treatment, e.g. pore-sealing · CPC title
of aluminium or alloys based thereon · CPC title
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