Fine concavo-convex structure product, heat-reactive resist material for dry etching, mold manufacturing method and mold

US9701044B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9701044-B2
Application numberUS-201514656012-A
CountryUS
Kind codeB2
Filing dateMar 12, 2015
Priority dateJan 27, 2012
Publication dateJul 11, 2017
Grant dateJul 11, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A fine concavo-convex structure product ( 10 ) is provided with an etching layer ( 11 ), and a resist layer ( 12 ) comprised of a heat-reactive resist material for dry etching provided on the etching layer ( 11 ), a concavo-convex structure associated with opening portions ( 12 a ) formed in the resist layer ( 12 ) is formed in the etching layer ( 11 ), a pattern pitch P of a fine pattern of the concavo-convex structure ranges from 1 nm to 10 μm, a pattern depth H of the fine pattern ranges from 1 nm to 10 μm, and a pattern cross-sectional shape of the fine pattern is a trapezoid, a triangle or a mixed shape thereof. The heat-reactive resist material for dry etching has, as a principal constituent element, at least one species selected from the group consisting of Cu, Nb, Sn, Mn, oxides thereof, nitrides thereof and NiBi.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of manufacturing a fine concavo-convex structure product provided with an etching layer and a resist layer including a heat-reactive resist material for dry etching provided on the etching layer, said method comprising: selecting said heat-reactive resist material, for dry etching, out of at least one species from a group consisting of Cr, Fe, Co, Al, Ga, In, Hf, Pb, oxides thereof and nitrides thereof; forming openings in said resist layer by exposure; forming concave portions corresponding to said openings in said etching layer by dry etching, thereby forming a fine pattern of a concavo-convex structure, wherein a pattern pitch P of said fine pattern of said concavo-convex structure ranges from 1nm to 10 μm, wherein a cross-sectional shape of said concave portions is a trapezoid or a triangle, and wherein when said dry etching is carried out, side surfaces of said concave portions of said concavo-convex structure of said etching layer are coated with fluorocarbons while forming a taper surface on said side surfaces due to a side wall protection effect produced by said fluorocarbons while maintaining a predetermined opening width of said openings in said resist layer. 2. The method of manufacturing a fine concavo-convex structure product according to claim 1 , wherein in any one of a plurality of concave portions forming the concavo-convex structure, when boundaries between an opening portion of a concave portion and a surface on an upper side of the etching layer are two lines and the two lines do not cross each other, one point on one of the two lines and one point on the other one having the shortest distance therebetween are made two highest points, and the pattern cross-sectional shape is a shape drawn by connecting, with straight lines, the two highest points and one point when the lowest point of the concave portion is the one point, or two points having the longest distance when lowest points of the concave portion are two or more in a cross section obtained by cutting the fine concavo-convex structure product along a thickness direction of the etching layer so as to include these two highest points. 3. The method of manufacturing a fine concavo-convex structure product according to claim 1 , wherein in any one of a plurality of concave portions forming the concavo-convex structure, when a boundary between an opening portion of a concave portion and a surface on the upper side of the etching layer is one line and both ends are connected and closed, two points on the one line having the longest distance therebetween are made two highest points, and the pattern cross-sectional shape is a shape drawn by connecting, with straight lines, the two highest points and one point when the lowest point of the concave portion is the one point, or two points having the longest distance when lowest points of the concave portion are two or more in a cross section obtained by cutting the fine concavo-convex structure product along a thickness direction of the etching layer so as to include these two highest points. 4. The method of manufacturing a fine concavo-convex structure product according to claim 1 , wherein in any one of a plurality of convex portions forming the concavo-convex structure, the pattern cross-sectional shape is a shape drawn by connecting, with straight lines, one highest point or two highest points and two lowest points having the longest distance among lowest points of a convex portion, in a cross section obtained by cutting the fine concavo-convex structure product along a thickness direction of the etching layer, so as to include the one highest point when the highest point of the convex portion is the one point, or include the two highest points that are two points on one line and that have the longest distance when the highest points of the convex portion are two or more in the case where a boundary between a surface on the upper side and a side wall surface of the etching layer is the one line and both ends are connected and closed. 5. The method of manufacturing a fine concavo-convex structure product according to claim 1 , wherein the pattern cross-sectional shape meets Equation (1) or Equation (2): 0<T 0 =B 1 <T 1 ≦10 μm  Eq. (1) 0≦B 1 <T 0 =T 1 <10 μm  Eq. (2) T 0 : Width of the opening portion of the resist layer before dry etching T 1 : Width of the concave portion on the highest portion side formed in the etching layer after dry etching B 1 : Width of the concave portion on the deepest portion side formed in the etching layer after dry etching. 6. The method of manufacturing a fine concavo-convex structure product according to claim 1 , wherein the pattern pitch P ranges from 1 nm to 1 μm. 7. The method of manufacturing a fine concavo-convex structure product according to claim 5 , wherein the fine pattern meets Equation (1). 8. The method of manufacturing a fine concavo-convex structure product according to claim 5 , wherein the fine pattern meets Equation (2).

Assignees

Inventors

Classifications

  • characterised by the processes involved to create the masks · CPC title

  • Electricity · mapped topic

  • Component parts, details or accessories; Auxiliary operations · CPC title

  • Etching, surface-brightening or pickling compositions (for glass C03C15/00, {C03C25/66; for mortars, concrete, artificial or natural stone or ceramics C04B41/5338}; for metallic material C23F, C23G1/00, C25F1/00; {for semi-conductors H10P52/40}) · CPC title

  • G03F7/0002Primary

    Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

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What does patent US9701044B2 cover?
A fine concavo-convex structure product ( 10 ) is provided with an etching layer ( 11 ), and a resist layer ( 12 ) comprised of a heat-reactive resist material for dry etching provided on the etching layer ( 11 ), a concavo-convex structure associated with opening portions ( 12 a ) formed in the resist layer ( 12 ) is formed in the etching layer ( 11 ), a pattern pitch P of a fine pattern of …
Who is the assignee on this patent?
Asahi Chemical Ind
What technology area does this patent fall under?
Primary CPC classification G03F7/0002. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jul 11 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).