Circular support plate, nonwoven fabric polishing roll, roll assembly, and polishing method

US9700994B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9700994-B2
Application numberUS-201314654124-A
CountryUS
Kind codeB2
Filing dateDec 19, 2013
Priority dateDec 27, 2012
Publication dateJul 11, 2017
Grant dateJul 11, 2017

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A nonwoven fabric polishing roll having a through hole into which a rotating shaft of a polishing machine is inserted, that includes a polishing portion formed by stacking a plurality of circular nonwoven fabrics having an aperture that forms the through hole; and two circular support plates located one at each of both ends in the stacking direction of the polishing portion, having an aperture that forms the through hole, and having an external diameter that is substantially the same as that of the circular non-woven fabric; wherein, the circular support plates include nonwoven fabric that is hardened in a compressed state.

First claim

Opening claim text (preview).

What is claimed is: 1. A nonwoven fabric polishing roll having a through hole into which a rotating shaft of a polishing machine is inserted, comprising: a polishing portion formed by stacking a plurality of circular nonwoven fabrics having an aperture that forms the through hole; and two circular support plates located one at each of both ends in the stacking direction of the polishing portion, having an aperture that forms the through hole, and having an external diameter that is substantially the same as that of the circular nonwoven fabric; wherein, the circular support plates include nonwoven fabric that is hardened in a compressed state. 2. The nonwoven fabric polishing roll according to claim 1 , wherein: an area of the circular support plate contacting a flange that joins the nonwoven fabric polishing roll and the rotating shaft is S 1 (m 2 ), compressive stress applied from the polishing portion is T 1 (N), and a deformation rate, calculated therefrom, in the thickness direction of the circular support plate with respect to the compressive stress per unit area T 1 /S 1 (N/m 2 ) is not more than 20%. 3. The nonwoven fabric polishing roll according to claim 1 , wherein: the nonwoven fabric included in the circular support plate is hardened by an adhesive, and a content of the adhesive is in a range from 5 to 30 mass % of the nonwoven fabric. 4. The nonwoven fabric polishing roll according to claim 1 , wherein a thickness of the circular support plate is in a range from 3 to 25% of the external diameter of the circular support plate. 5. The nonwoven fabric polishing roll according to claim 1 , wherein the circular support plate includes a laminate that has been hardened while compressed in the stacking direction, and the laminate includes a plurality of stacked circular nonwoven fabrics. 6. The nonwoven fabric polishing roll according to claim 1 , wherein the polishing portion includes a plurality of stacked circular plates having an aperture that forms the through hole, and an external diameter that is not greater than the external diameter of the circular nonwoven fabrics. 7. The nonwoven fabric polishing roll according to claim 6 , wherein: the circular plate comprises a nonwoven fabric that is hardened in a compressed state, and the external diameter of the circular plate is substantially the same as the external diameter of the circular nonwoven fabrics. 8. A roll assembly comprising: a nonwoven fabric polishing roll described in claim 1 ; a rotating shaft that is inserted into the through hole; and two flanges that join the rotating shaft and the nonwoven fabric polishing roll at both ends of the nonwoven fabric polishing roll. 9. A circular support plate located at an end portion of a polishing portion in a nonwoven fabric polishing roll that includes a polishing portion formed by stacking a plurality of circular nonwoven fabrics having an aperture that forms a through hole into which a rotating shaft of a polishing machine is inserted, wherein the circular support plate comprises an aperture that forms the through hole, the circular support plate has an external diameter that is substantially the same as that of the circular nonwoven fabrics, and the circular support plate includes a nonwoven fabric that is hardened in a compressed state. 10. A polishing method comprising a step of: bringing an object to be polished into contact with the polishing portion of the roll assembly described in claim 8 , which is rotated by the rotating shaft.

Assignees

Inventors

Classifications

  • B24B29/00Primary

    Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents (polishing tools in general B24D13/00) · CPC title

  • B24D13/08Primary

    comprising annular or circular sheets packed side by side · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9700994B2 cover?
A nonwoven fabric polishing roll having a through hole into which a rotating shaft of a polishing machine is inserted, that includes a polishing portion formed by stacking a plurality of circular nonwoven fabrics having an aperture that forms the through hole; and two circular support plates located one at each of both ends in the stacking direction of the polishing portion, having an aperture …
Who is the assignee on this patent?
3M Innovative Properties Co
What technology area does this patent fall under?
Primary CPC classification B24B29/00. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jul 11 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).